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Adsorption and decomposition of diethylsilane and diethylgermane on Si(100): Surface reactions for an atomic layer epitaxial approach to column IV epitaxy

B. K. Kellerman; A. Mahajan; N. M. Russell; J. G. Ekerdt; S. K. Banerjee; A. F. Tasch; A. Campion; J. M. White; D. J. Bonser

J. Vac. Sci. Technol. A 13, 1819–1825 (1995) https://doi.org/10.1116/1.579665

Abstract

View articletitled, Adsorption and decomposition of diethylsilane and diethylgermane on Si(100): Surface reactions for an atomic layer epitaxial approach to column IV epitaxy

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Matrix effect of bombardment‐induced Gibbsian segregation on Cu depletion at a Cu_XNi_100−X subsurface

Li‐Ping Zheng; Ri‐Sheng Li; Xi‐Qing Xia; Min‐Qian Li; Ming‐Yao Li

J. Vac. Sci. Technol. A 13, 1826–1830 (1995) https://doi.org/10.1116/1.579666

Abstract

View articletitled, Matrix effect of bombardment‐induced Gibbsian segregation on Cu depletion at a CuXNi100−X subsurface

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GaN patterned film synthesis: Carbon depletion by hydrogen atoms produced from NH₃ activated by electron impact

A. Hübner; S. R. Lucas; W. D. Partlow; W. J. Choyke; J. A. Schaefer; J. T. Yates, Jr.

J. Vac. Sci. Technol. A 13, 1831–1836 (1995) https://doi.org/10.1116/1.579667

Abstract

View articletitled, GaN patterned film synthesis: Carbon depletion by hydrogen atoms produced from NH3 activated by electron impact

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Sulfur layer formation on GaAs(100) by thermal and photochemical H₂S dissociation

Matthew G. Nooney; Vladimir Liberman; Richard M. Martin

J. Vac. Sci. Technol. A 13, 1837–1846 (1995) https://doi.org/10.1116/1.579668

Abstract

View articletitled, Sulfur layer formation on GaAs(100) by thermal and photochemical H2S dissociation

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Importance of the surface oxide layer in the reduction of outgassing from stainless steels

Yuichi Ishikawa; Toshihiko Yoshimura

J. Vac. Sci. Technol. A 13, 1847–1852 (1995) https://doi.org/10.1116/1.579669

Abstract

View articletitled, Importance of the surface oxide layer in the reduction of outgassing from stainless steels

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H₂O adsorption kinetics on Si(111)7×7 and Si(111)7×7 modified by laser annealing

M. L. Wise; L. A. Okada; O. Sneh; S. M. George

J. Vac. Sci. Technol. A 13, 1853–1860 (1995) https://doi.org/10.1116/1.579670

Abstract

View articletitled, H2O adsorption kinetics on Si(111)7×7 and Si(111)7×7 modified by laser annealing

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Molecular dynamics simulations of fluorine molecules interacting with a Si{100}(2×1) surface at 1000 K

T. A. Schoolcraft; A. M. Diehl; A. B. Steel; B. J. Garrison

J. Vac. Sci. Technol. A 13, 1861–1866 (1995) https://doi.org/10.1116/1.579671

Abstract

View articletitled, Molecular dynamics simulations of fluorine molecules interacting with a Si{100}(2×1) surface at 1000 K

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Thermal‐ and electron‐stimulated chemistry of a cyclotriphosphazene lubricant on a magnetic disk with a hard carbon overcoat

Jong‐Liang Lin; John T. Yates, Jr.

J. Vac. Sci. Technol. A 13, 1867–1871 (1995) https://doi.org/10.1116/1.579672

Abstract

View articletitled, Thermal‐ and electron‐stimulated chemistry of a cyclotriphosphazene lubricant on a magnetic disk with a hard carbon overcoat

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Modeling of water outgassing from metal surfaces (III)

Minxu Li; H. F. Dylla

J. Vac. Sci. Technol. A 13, 1872–1878 (1995) https://doi.org/10.1116/1.579673

Abstract

View articletitled, Modeling of water outgassing from metal surfaces (III)

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Synchrotron radiation induced reactions of a condensed layer of silicon alkoxide on Si

Koji Kinashi; Michio Niwano; Jun‐ichi Sawahata; Fumikazu Shimoshikiryo; Nobuo Miyamoto

J. Vac. Sci. Technol. A 13, 1879–1884 (1995) https://doi.org/10.1116/1.579674

Abstract

View articletitled, Synchrotron radiation induced reactions of a condensed layer of silicon alkoxide on Si

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Photodecomposition of poly(methylmethacrylate) thin films by monochromatic soft x‐ray radiation

Marcia C. K. Tinone; Kenichiro Tanaka; Nobuo Ueno

J. Vac. Sci. Technol. A 13, 1885–1892 (1995) https://doi.org/10.1116/1.579675

Abstract

View articletitled, Photodecomposition of poly(methylmethacrylate) thin films by monochromatic soft x‐ray radiation

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X‐ray photoelectron spectroscopy and transmission electron microscopy studies of the NiAl/Al₂O₃ interfacial chemical compatibility

J. F. Silvain; J. C. Bihr; M. Alnot; J. Lambert; J. J. Ehrhardt

J. Vac. Sci. Technol. A 13, 1893–1900 (1995) https://doi.org/10.1116/1.579676

Abstract

View articletitled, X‐ray photoelectron spectroscopy and transmission electron microscopy studies of the NiAl/Al2O3 interfacial chemical compatibility

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Optical emission study of reaction mechanisms in the deposition of nitrogen‐containing amorphous hydrogenated carbon films

Steven F. Durrant; Elidiane C. Rangel; Mário A. Bica de Moraes

J. Vac. Sci. Technol. A 13, 1901–1906 (1995) https://doi.org/10.1116/1.579677

Abstract

View articletitled, Optical emission study of reaction mechanisms in the deposition of nitrogen‐containing amorphous hydrogenated carbon films

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A study of the interaction between thermally deposited aluminum films and fluoropolymer substrates

Yuezhong Du; Joseph A. Gardella, Jr.

J. Vac. Sci. Technol. A 13, 1907–1912 (1995) https://doi.org/10.1116/1.579678

Abstract

View articletitled, A study of the interaction between thermally deposited aluminum films and fluoropolymer substrates

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Surface dielectric function of CdTe(110) obtained by polarized surface differential reflectivity data

A. Cricenti; A. C. Felici

J. Vac. Sci. Technol. A 13, 1913–1916 (1995) https://doi.org/10.1116/1.579679

Abstract

View articletitled, Surface dielectric function of CdTe(110) obtained by polarized surface differential reflectivity data

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Characterization of substrate temperature and damage in diamond growth plasmas by multichannel spectroellipsometry

M. Wakagi; Byungyou Hong; Hien V. Nguyen; R. W. Collins; W. Drawl; R. Messier

J. Vac. Sci. Technol. A 13, 1917–1923 (1995) https://doi.org/10.1116/1.579680

Abstract

View articletitled, Characterization of substrate temperature and damage in diamond growth plasmas by multichannel spectroellipsometry

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Formation of secondary phases in evaporated CuInS₂ thin films: A surface analytical study

R. Scheer; H.‐J. Lewerenz

J. Vac. Sci. Technol. A 13, 1924–1929 (1995) https://doi.org/10.1116/1.579631

Abstract

View articletitled, Formation of secondary phases in evaporated CuInS2 thin films: A surface analytical study

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In situ diagnostic for etch uniformity

M. J. Buie; J. T. Pender; J. Soniker; M. L. Brake; M. Elta

J. Vac. Sci. Technol. A 13, 1930–1934 (1995) https://doi.org/10.1116/1.579632

Abstract

View articletitled, In situ diagnostic for etch uniformity

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Mass spectrometric studies of remote helium plasma dissociation of silane

Joseph M. Jasinski

J. Vac. Sci. Technol. A 13, 1935–1940 (1995) https://doi.org/10.1116/1.579633

Abstract

View articletitled, Mass spectrometric studies of remote helium plasma dissociation of silane

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In situ production of very low density microporous polymeric foams

J. W. Falconer; W. Nazarov; C. J. Horsfield

J. Vac. Sci. Technol. A 13, 1941–1944 (1995) https://doi.org/10.1116/1.579634

Abstract

View articletitled, In situ production of very low density microporous polymeric foams

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Excimer laser ablation mass spectrometry of inorganic solids: Chemical, matrix, and sampling effects on polyatomic ion yields

John K. Gibson

J. Vac. Sci. Technol. A 13, 1945–1958 (1995) https://doi.org/10.1116/1.579635

Abstract

View articletitled, Excimer laser ablation mass spectrometry of inorganic solids: Chemical, matrix, and sampling effects on polyatomic ion yields

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Quantitative analysis of borophosphosilicate glass films on silicon using infrared external reflection–absorption spectroscopy

James E. Franke; Lizhong Zhang; Thomas M. Niemczyk; David M. Haaland; Kenneth J. Radigan

J. Vac. Sci. Technol. A 13, 1959–1966 (1995) https://doi.org/10.1116/1.579636

Abstract

View articletitled, Quantitative analysis of borophosphosilicate glass films on silicon using infrared external reflection–absorption spectroscopy

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Photoemission studies of K‐promoted nitridation and oxidation of the InP(100) surface using synchrotron radiation

T. X. Zhao; H. Ji; Q. Liang; X. P. Wang; P. S. Xu; E. D. Lu; J. X. Wu; C. C. Hsu

J. Vac. Sci. Technol. A 13, 1967–1969 (1995) https://doi.org/10.1116/1.579637

Abstract

View articletitled, Photoemission studies of K‐promoted nitridation and oxidation of the InP(100) surface using synchrotron radiation

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Competitive halogenation of silicon surfaces in HBr/Cl₂ plasmas studied with x‐ray photoelectron spectroscopy and in situ, real‐time, pulsed laser‐induced thermal desorption

C. C. Cheng; K. V. Guinn; I. P. Herman; V. M. Donnelly

J. Vac. Sci. Technol. A 13, 1970–1976 (1995) https://doi.org/10.1116/1.579638

Abstract

View articletitled, Competitive halogenation of silicon surfaces in HBr/Cl2 plasmas studied with x‐ray photoelectron spectroscopy and in situ, real‐time, pulsed laser‐induced thermal desorption

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A morphology study of the thermal oxidation of rough silicon surfaces

Q. Liu; L. Spanos; C. Zhao; E. A. Irene

J. Vac. Sci. Technol. A 13, 1977–1983 (1995) https://doi.org/10.1116/1.579639

Abstract

View articletitled, A morphology study of the thermal oxidation of rough silicon surfaces

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Measurements of reflected electron energy loss spectrometry and x‐ray photoelectron spectroscopy spectra for derivations of the energy loss function and source function for Au 4f photoelectrons

Hideki Yoshikawa; Yoshihiro Irokawa; Ryuichi Shimizu

J. Vac. Sci. Technol. A 13, 1984–1989 (1995) https://doi.org/10.1116/1.579640

Abstract

View articletitled, Measurements of reflected electron energy loss spectrometry and x‐ray photoelectron spectroscopy spectra for derivations of the energy loss function and source function for Au 4f photoelectrons

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Surface type conversion of CuInSe₂ with H₂S plasma exposure: A photoemission investigation

Art J. Nelson; Sean P. Frigo; Richard Rosenberg

J. Vac. Sci. Technol. A 13, 1990–1993 (1995) https://doi.org/10.1116/1.579641

Abstract

View articletitled, Surface type conversion of CuInSe2 with H2S plasma exposure: A photoemission investigation

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¹⁵N hydrogen depth profiling measurements of candidate superconducting supercollider beam pipe materials

M. W. Ruckman; Myron Strongin; W. A. Lanford; W. C. Turner

J. Vac. Sci. Technol. A 13, 1994–1998 (1995) https://doi.org/10.1116/1.579642

Abstract

View articletitled, 15N hydrogen depth profiling measurements of candidate superconducting supercollider beam pipe materials

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Study of ion mixing during Auger depth profiling of Ge–Si multilayer system. II. Low ion energy (0.2–2 keV) range

M. Menyhard; A. Barna; J. P. Biersack; K. Järrendahl; J.‐E. Sundgren

J. Vac. Sci. Technol. A 13, 1999–2004 (1995) https://doi.org/10.1116/1.579643

Abstract

View articletitled, Study of ion mixing during Auger depth profiling of Ge–Si multilayer system. II. Low ion energy (0.2–2 keV) range

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Methods to enhance absorption signals in infrared reflectance spectroscopy: A comparison using optical simulations

M. Katiyar; J. R. Abelson

J. Vac. Sci. Technol. A 13, 2005–2012 (1995) https://doi.org/10.1116/1.579644

Abstract

View articletitled, Methods to enhance absorption signals in infrared reflectance spectroscopy: A comparison using optical simulations

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Local density of states analysis by Auger electron spectroscopy

Huijian Zhou; Yuqi Wang; Wei Ho

J. Vac. Sci. Technol. A 13, 2013–2017 (1995) https://doi.org/10.1116/1.579645

Abstract

View articletitled, Local density of states analysis by Auger electron spectroscopy

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Boron nitride thin film deposition from solid borane ammonia using an electron cyclotron resonance microwave plasma source

C. R. Eddy, Jr.; B. D. Sartwell

J. Vac. Sci. Technol. A 13, 2018–2022 (1995) https://doi.org/10.1116/1.579646

Abstract

View articletitled, Boron nitride thin film deposition from solid borane ammonia using an electron cyclotron resonance microwave plasma source

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Remote plasma and ultraviolet–ozone modification of polystyrene

B. W. Callen; M. L. Ridge; S. Lahooti; A. W. Neumann; R. N. S. Sodhi

J. Vac. Sci. Technol. A 13, 2023–2029 (1995) https://doi.org/10.1116/1.579647

Abstract

View articletitled, Remote plasma and ultraviolet–ozone modification of polystyrene

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Compositionally gradient (Ti_1−xAl_x)N coatings made by plasma enhanced chemical vapor deposition

Sang‐Hyeob Lee; Jung‐Joong Lee

J. Vac. Sci. Technol. A 13, 2030–2034 (1995) https://doi.org/10.1116/1.579648

Abstract

View articletitled, Compositionally gradient (Ti1−xAlx)N coatings made by plasma enhanced chemical vapor deposition

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Electron cyclotron resonance plasma reactor for SiO₂ etching: Process diagnostics, end‐point detection, and surface characterization

Zhimin Wan; Jian Liu; H. Henry Lamb

J. Vac. Sci. Technol. A 13, 2035–2043 (1995) https://doi.org/10.1116/1.579649

Abstract

View articletitled, Electron cyclotron resonance plasma reactor for SiO2 etching: Process diagnostics, end‐point detection, and surface characterization

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Generation and behavior of particulates in a radio frequency excited CH₄ plasma

Chung‐Kyu Yeon; Ki‐Woong Whang

J. Vac. Sci. Technol. A 13, 2044–2050 (1995) https://doi.org/10.1116/1.579650

Abstract

View articletitled, Generation and behavior of particulates in a radio frequency excited CH4 plasma

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Negative ions in a CCl₂F₂ radio frequency discharge

E. Stoffels; W. W. Stoffels; D. Vender; G. M. W. Kroesen; F. J. de Hoog

J. Vac. Sci. Technol. A 13, 2051–2057 (1995) https://doi.org/10.1116/1.579651

Abstract

View articletitled, Negative ions in a CCl2F2 radio frequency discharge

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The chemistry of a CCl₂F₂ radio frequency discharge

W. W. Stoffels; E. Stoffels; M. Haverlag; G. M. W. Kroesen; F. J. de Hoog

J. Vac. Sci. Technol. A 13, 2058–2066 (1995) https://doi.org/10.1116/1.579652

Abstract

View articletitled, The chemistry of a CCl2F2 radio frequency discharge

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Effect of wall charging on an oxygen plasma created in a helicon diffusion reactor used for silica deposition

C. Charles; R. W. Boswell

J. Vac. Sci. Technol. A 13, 2067–2073 (1995) https://doi.org/10.1116/1.579522

Abstract

View articletitled, Effect of wall charging on an oxygen plasma created in a helicon diffusion reactor used for silica deposition

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Characterization of a slot antenna microwave plasma source for hydrogen plasma cleaning

D. Korzec; F. Werner; A. Brockhaus; J. Engemann; T. P. Schneider; R. J. Nemanich

J. Vac. Sci. Technol. A 13, 2074–2085 (1995) https://doi.org/10.1116/1.579523

Abstract

View articletitled, Characterization of a slot antenna microwave plasma source for hydrogen plasma cleaning

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Magnetically confined inductively coupled plasma etching reactor

C. Lai; B. Brunmeier; R. Claude Woods

J. Vac. Sci. Technol. A 13, 2086–2092 (1995) https://doi.org/10.1116/1.579524

Abstract

View articletitled, Magnetically confined inductively coupled plasma etching reactor

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On‐line studies of plasma surface interactions between a radio frequency plasma jet and 3 w/o boron doped graphite samples

R. Avni; J. Erin; D. Morvan; I. Mabille‐Rouger; J. Amouroux; J. Winter; H. Nickel

J. Vac. Sci. Technol. A 13, 2093–2098 (1995) https://doi.org/10.1116/1.579525

Abstract

View articletitled, On‐line studies of plasma surface interactions between a radio frequency plasma jet and 3 w/o boron doped graphite samples

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Control of radio‐frequency‐plasma process to improve the reproducibility of silicon oxynitride thin film preparation

D. M. Diatezua; P. A. Thiry; R. Caudano

J. Vac. Sci. Technol. A 13, 2099–2104 (1995) https://doi.org/10.1116/1.579526

Abstract

View articletitled, Control of radio‐frequency‐plasma process to improve the reproducibility of silicon oxynitride thin film preparation

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Electron cyclotron resonance plasma generation using a planar ring‐cusp magnetic field and a reentrant coaxial cavity

Toshiaki Yasui; Hirokazu Tahara; Takao Yoshikawa

J. Vac. Sci. Technol. A 13, 2105–2109 (1995) https://doi.org/10.1116/1.579527

Abstract

View articletitled, Electron cyclotron resonance plasma generation using a planar ring‐cusp magnetic field and a reentrant coaxial cavity

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Formation of C–N thin films by ion beam deposition

K. J. Boyd; D. Marton; S. S. Todorov; A. H. Al‐Bayati; J. Kulik; R. A. Zuhr; J. W. Rabalais

J. Vac. Sci. Technol. A 13, 2110–2122 (1995) https://doi.org/10.1116/1.579528

Abstract

View articletitled, Formation of C–N thin films by ion beam deposition

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Effect of residual gas on Cu film deposition by partially ionized beam

Seok‐Keun Koh; Zhegao Jin; Jiyun Lee; Hyung‐Jin Jung; Ki‐hwan Kim; Doo‐jin Choi

J. Vac. Sci. Technol. A 13, 2123–2127 (1995) https://doi.org/10.1116/1.579529

Abstract

View articletitled, Effect of residual gas on Cu film deposition by partially ionized beam

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Cluster beam deposition: Optimization of the cluster beam source

P. Gatz; O. F. Hagena

J. Vac. Sci. Technol. A 13, 2128–2132 (1995) https://doi.org/10.1116/1.579530

Abstract

View articletitled, Cluster beam deposition: Optimization of the cluster beam source

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Structuring of various materials using cluster ions

P. R. W. Henkes; B. Krevet

J. Vac. Sci. Technol. A 13, 2133–2137 (1995) https://doi.org/10.1116/1.579531

Abstract

View articletitled, Structuring of various materials using cluster ions

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Simple method for Fe⁺ ion production in a microwave ion source

Takahide Matsuo; Kiyoshi Miyake

J. Vac. Sci. Technol. A 13, 2138–2141 (1995) https://doi.org/10.1116/1.579532

Abstract

View articletitled, Simple method for Fe+ ion production in a microwave ion source

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Effect of Ni on graphite thin‐film formation from organic materials by chemical vapor deposition

Masako Yudasaka; Rie Kikuchi; Takeo Matsui; Kouji Tasaka; Yoshimasa Ohki; Susumu Yoshimura; Etsuro Ota

J. Vac. Sci. Technol. A 13, 2142–2145 (1995) https://doi.org/10.1116/1.579533

Abstract

View articletitled, Effect of Ni on graphite thin‐film formation from organic materials by chemical vapor deposition

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Etching of InP surface oxide with atomic hydrogen produced by electron cyclotron resonance

P. G. Hofstra; B. J. Robinson; D. A. Thompson; S. A. McMaster

J. Vac. Sci. Technol. A 13, 2146–2150 (1995) https://doi.org/10.1116/1.579534

Abstract

View articletitled, Etching of InP surface oxide with atomic hydrogen produced by electron cyclotron resonance

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Magnetic field in two‐dimensional magnetrons

M. J. Murphy; D. C. Cameron; M. S. J. Hashmi

J. Vac. Sci. Technol. A 13, 2151–2156 (1995) https://doi.org/10.1116/1.579535

Abstract

View articletitled, Magnetic field in two‐dimensional magnetrons

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Ferromagnetic resonance in Ni films biased dc sputter deposited on MgO(001)

Hiroko Maruyama; Hong Qiu; Hisashi Nakai; Mituru Hashimoto

J. Vac. Sci. Technol. A 13, 2157–2160 (1995) https://doi.org/10.1116/1.579536

Abstract

View articletitled, Ferromagnetic resonance in Ni films biased dc sputter deposited on MgO(001)

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Monte Carlo calculations of gas rarefaction in a magnetron sputtering discharge

G. M. Turner

J. Vac. Sci. Technol. A 13, 2161–2169 (1995) https://doi.org/10.1116/1.579537

Abstract

View articletitled, Monte Carlo calculations of gas rarefaction in a magnetron sputtering discharge

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Preparation of Al–Ni alloy films by alternate sputter deposition

J.‐K. Ho; K.‐L. Lin

J. Vac. Sci. Technol. A 13, 2170–2176 (1995) https://doi.org/10.1116/1.579538

Abstract

View articletitled, Preparation of Al–Ni alloy films by alternate sputter deposition

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Characterization and analysis of ZnO:Al deposited by reactive magnetron sputtering

S. Zafar; C. S. Ferekides; D. L. Morel

J. Vac. Sci. Technol. A 13, 2177–2182 (1995) https://doi.org/10.1116/1.579539

Abstract

View articletitled, Characterization and analysis of ZnO:Al deposited by reactive magnetron sputtering

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Flux distributions and deposition profiles from hexagonal collimators during sputter deposition

Zhou Lin; Timothy S. Cale

J. Vac. Sci. Technol. A 13, 2183–2188 (1995) https://doi.org/10.1116/1.579540

Abstract

View articletitled, Flux distributions and deposition profiles from hexagonal collimators during sputter deposition

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Microstructural and morphological effects on the tribological properties of electron enhanced magnetron sputtered hard coatings

J. M. Schneider; A. A. Voevodin; C. Rebholz; A. Matthews

J. Vac. Sci. Technol. A 13, 2189–2193 (1995) https://doi.org/10.1116/1.579541

Abstract

View articletitled, Microstructural and morphological effects on the tribological properties of electron enhanced magnetron sputtered hard coatings

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Magnetic properties of ion‐beam sputter deposited NiFe ultrathin films

Masaki Ueno; Shuji Tanoue

J. Vac. Sci. Technol. A 13, 2194–2198 (1995) https://doi.org/10.1116/1.579542

Abstract

View articletitled, Magnetic properties of ion‐beam sputter deposited NiFe ultrathin films

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Role of oxygen partial pressure on the properties of doped silicon oxycarbide microcrystalline layers produced by spatial separation techniques

R. Martins; M. Vieira; I. Ferreira; E. Fortunato

J. Vac. Sci. Technol. A 13, 2199–2209 (1995) https://doi.org/10.1116/1.579543

Abstract

View articletitled, Role of oxygen partial pressure on the properties of doped silicon oxycarbide microcrystalline layers produced by spatial separation techniques

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Structures of Fe/TiC multilayers prepared by ion beam sputtering at room temperature

C. H. Liu; Wen‐Zhi Li; Heng‐De Li; Y. H. Li

J. Vac. Sci. Technol. A 13, 2210–2213 (1995) https://doi.org/10.1116/1.579544

Abstract

View articletitled, Structures of Fe/TiC multilayers prepared by ion beam sputtering at room temperature

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Crystallization of Pb(Zr,Ti)O₃ films prepared by radio frequency magnetron sputtering with a stoichiometric oxide target

Nasir Abdul Basit; Hong Koo Kim

J. Vac. Sci. Technol. A 13, 2214–2220 (1995) https://doi.org/10.1116/1.579545

Abstract

View articletitled, Crystallization of Pb(Zr,Ti)O3 films prepared by radio frequency magnetron sputtering with a stoichiometric oxide target

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Influence of angular distribution on the deposition rate of species sputtered from a multicomponent target in different configurations: Applications to mixed valence copper oxides

Philippe Lecoeur; Bernard Mercey; Hugues Murray

J. Vac. Sci. Technol. A 13, 2221–2227 (1995) https://doi.org/10.1116/1.579546

Abstract

View articletitled, Influence of angular distribution on the deposition rate of species sputtered from a multicomponent target in different configurations: Applications to mixed valence copper oxides

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Creation of extreme high vacuum with a turbomolecular pumping system: A baking approach

Boklae Cho; Sangtae Lee; Sukmin Chung

J. Vac. Sci. Technol. A 13, 2228–2232 (1995) https://doi.org/10.1116/1.579547

Abstract

View articletitled, Creation of extreme high vacuum with a turbomolecular pumping system: A baking approach

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Unstable arc operation and cathode spot motion in a magnetically filtered vacuum‐arc deposition system

V. N. Zhitomirsky; R. L. Boxman; S. Goldsmith

J. Vac. Sci. Technol. A 13, 2233–2240 (1995) https://doi.org/10.1116/1.579548

Abstract

View articletitled, Unstable arc operation and cathode spot motion in a magnetically filtered vacuum‐arc deposition system

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Model of an 80 K liner vacuum system for the 4.2 K cold bore of the Superconducting Super Collider 20 TeV proton collider

W. C. Turner

J. Vac. Sci. Technol. A 13, 2241–2254 (1995) https://doi.org/10.1116/1.579549

Abstract

View articletitled, Model of an 80 K liner vacuum system for the 4.2 K cold bore of the Superconducting Super Collider 20 TeV proton collider

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Spherical aberration correction of electrostatic lenses using spherical meshes

M. Kato; T. Sekine

J. Vac. Sci. Technol. A 13, 2255–2260 (1995) https://doi.org/10.1116/1.579504

Abstract

View articletitled, Spherical aberration correction of electrostatic lenses using spherical meshes

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Spectroscopic studies of a solenoid filtered vacuum arc

Z. H. Wang; D. R. McKenzie; P. J. Martin; R. P. Netterfield

J. Vac. Sci. Technol. A 13, 2261–2265 (1995) https://doi.org/10.1116/1.579505

Abstract

View articletitled, Spectroscopic studies of a solenoid filtered vacuum arc

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Instability of the spatial electron current distribution in hot cathode ionization gauges as a source of sensitivity changes

K. Jousten; P. Röhl

J. Vac. Sci. Technol. A 13, 2266–2270 (1995) https://doi.org/10.1116/1.579506

Abstract

View articletitled, Instability of the spatial electron current distribution in hot cathode ionization gauges as a source of sensitivity changes

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The dependence of the characteristics of a rotating disk vacuum gauge on disk sizes and rotor speed

A. D. Chew; A. Chambers; G. J. Pert; A. P. Troup

J. Vac. Sci. Technol. A 13, 2271–2274 (1995) https://doi.org/10.1116/1.579507

Abstract

View articletitled, The dependence of the characteristics of a rotating disk vacuum gauge on disk sizes and rotor speed

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Hydrogen in thin films of CuInS₂ solar cell material

C. Dzionk; S. Hessler; H. J. Lewerenz; H.‐E. Mahnke; H. Metzner; J. Steiger

J. Vac. Sci. Technol. A 13, 2275–2277 (1995) https://doi.org/10.1116/1.579508

Abstract

View articletitled, Hydrogen in thin films of CuInS2 solar cell material

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Photoelectron spectroscopy of shallow core levels using He II(40.8 eV) excitation

D. Comedi; A. R. Zanatta; F. Alvarez; I. Chambouleyron

J. Vac. Sci. Technol. A 13, 2278–2280 (1995) https://doi.org/10.1116/1.579509

View articletitled, Photoelectron spectroscopy of shallow core levels using He II(40.8 eV) excitation

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Removing sulfur from gold using ultraviolet/ozone cleaning

Christopher G. Worley; Richard W. Linton

J. Vac. Sci. Technol. A 13, 2281–2284 (1995) https://doi.org/10.1116/1.579510

View articletitled, Removing sulfur from gold using ultraviolet/ozone cleaning

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Quantitative spectral measurement of air leaks into plasma reactors

Gabriel G. Barna

J. Vac. Sci. Technol. A 13, 2285–2287 (1995) https://doi.org/10.1116/1.579511

Abstract

View articletitled, Quantitative spectral measurement of air leaks into plasma reactors

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