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Volume 13, Issue 1

January 1995

All Issues

ISSN 0734-2101

EISSN 1520-8559

Adsorption and decomposition of trichlorosilane and trichlorogermane on porous silicon and Si(100)2×1 surfaces

A. C. Dillon; M. L. Wise; M. B. Robinson; S. M. George

J. Vac. Sci. Technol. A 13, 1–10 (1995) https://doi.org/10.1116/1.579436

Abstract

View articletitled, Adsorption and decomposition of trichlorosilane and trichlorogermane on porous silicon and Si(100)2×1 surfaces

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Photoelectron spectroscopy from atomic layer epitaxially grown ZnTe/ZnSe heterostructures

P. Link; G. Grobbel; M. Wörz; S. Bauer; H. Berger; W. Gebhardt; J. J. Paggel; K. Horn

J. Vac. Sci. Technol. A 13, 11–16 (1995) https://doi.org/10.1116/1.579423

Abstract

View articletitled, Photoelectron spectroscopy from atomic layer epitaxially grown ZnTe/ZnSe heterostructures

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Studies of Ag films deposited using partially ionized beam deposition

Zhong‐Min Ren; Yuan‐Cheng Du; Mao‐Qi He; Zhi‐Feng Ying; Xia‐Xing Xiong; Fu‐Ming Li; Yi Su; Liang‐Yao Chen; W. L. Brown

J. Vac. Sci. Technol. A 13, 17–20 (1995) https://doi.org/10.1116/1.579435

Abstract

View articletitled, Studies of Ag films deposited using partially ionized beam deposition

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Nuclear microprobe analysis of Hg_1−xCd_xTe metal–semiconductor–metal detectors on substrates of GaAs and GaAs/Si

Patrick W. Leech; Lachlan A. Witham; Sean P. Dooley; David N. Jamieson

J. Vac. Sci. Technol. A 13, 21–25 (1995) https://doi.org/10.1116/1.579437

Abstract

View articletitled, Nuclear microprobe analysis of Hg1−xCdxTe metal–semiconductor–metal detectors on substrates of GaAs and GaAs/Si

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Desorption of positive and negative fluorine ions from BaF₂ surfaces by core level excitation under electron bombardment

M. Petravić; J. S. Williams

J. Vac. Sci. Technol. A 13, 26–29 (1995) https://doi.org/10.1116/1.579438

Abstract

View articletitled, Desorption of positive and negative fluorine ions from BaF2 surfaces by core level excitation under electron bombardment

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Carbon dioxide jet spray cleaning of molecular contaminants

M. M. Hills

J. Vac. Sci. Technol. A 13, 30–34 (1995) https://doi.org/10.1116/1.579439

Abstract

View articletitled, Carbon dioxide jet spray cleaning of molecular contaminants

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Adsorption and decomposition of dichlorosilane on porous silicon surfaces

M. B. Robinson; A. C. Dillon; S. M. George

J. Vac. Sci. Technol. A 13, 35–41 (1995) https://doi.org/10.1116/1.579440

Abstract

View articletitled, Adsorption and decomposition of dichlorosilane on porous silicon surfaces

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Direct analysis of contamination in submicron contact holes by thermal desorption spectroscopy

Hidemitsu Aoki; Yuden Teraoka; Eiji Ikawa; Takamaro Kikkawa; Iwao Nishiyama

J. Vac. Sci. Technol. A 13, 42–46 (1995) https://doi.org/10.1116/1.579441

Abstract

View articletitled, Direct analysis of contamination in submicron contact holes by thermal desorption spectroscopy

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Study of tunneling current oscillation dependence on SiO₂ thickness and Si roughness at the Si/SiO₂ interface

S. Zafar; Q. Liu; E. A. Irene

J. Vac. Sci. Technol. A 13, 47–53 (1995) https://doi.org/10.1116/1.579442

Abstract

View articletitled, Study of tunneling current oscillation dependence on SiO2 thickness and Si roughness at the Si/SiO2 interface

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Kinetics and mechanism of plasma oxidation of tantalum silicides

R. Gómez‐San Román; R. Pérez‐Casero; J. Perrière; J. P. Enard; J. M. Martínez‐Duart

J. Vac. Sci. Technol. A 13, 54–62 (1995) https://doi.org/10.1116/1.579443

Abstract

View articletitled, Kinetics and mechanism of plasma oxidation of tantalum silicides

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Dry etching of palladium thin films in fluorine containing plasmas: X‐ray photoelectron spectroscopy investigation

F. Fracassi; R. d’Agostino; A. Cacucci

J. Vac. Sci. Technol. A 13, 63–66 (1995) https://doi.org/10.1116/1.579444

Abstract

View articletitled, Dry etching of palladium thin films in fluorine containing plasmas: X‐ray photoelectron spectroscopy investigation

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Reactive ion etching induced damage with gas mixtures CHF₃/O₂ and SF₆/O₂

W. Wu; P. K. McLarty

J. Vac. Sci. Technol. A 13, 67–72 (1995) https://doi.org/10.1116/1.579445

Abstract

View articletitled, Reactive ion etching induced damage with gas mixtures CHF3/O2 and SF6/O2

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Atomic layer molecular beam epitaxy growth of GaAs_1−xP_x layers: Study of P₂ incorporation by the reflectance difference technique

Y. González; L. González; F. Briones

J. Vac. Sci. Technol. A 13, 73–77 (1995) https://doi.org/10.1116/1.579446

Abstract

View articletitled, Atomic layer molecular beam epitaxy growth of GaAs1−xPx layers: Study of P2 incorporation by the reflectance difference technique

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Growth modes of Pd, Ag, and Si thin films on B

Patrick A. Kearney; J. M. Slaughter; Dian Hong Shen; Charles M. Falco

J. Vac. Sci. Technol. A 13, 78–82 (1995) https://doi.org/10.1116/1.579447

Abstract

View articletitled, Growth modes of Pd, Ag, and Si thin films on B

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Auger electron spectroscopy as a real‐time compositional probe in molecular beam epitaxy

S. A. Chambers; T. T. Tran; T. A. Hileman

J. Vac. Sci. Technol. A 13, 83–91 (1995) https://doi.org/10.1116/1.579448

Abstract

View articletitled, Auger electron spectroscopy as a real‐time compositional probe in molecular beam epitaxy

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Preparation and characterization of ZnO films by an evaporating method

Jin Ma; Feng Ji; Hong‐lei Ma; Shu‐ying Li

J. Vac. Sci. Technol. A 13, 92–94 (1995) https://doi.org/10.1116/1.579449

Abstract

View articletitled, Preparation and characterization of ZnO films by an evaporating method

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Effects of surface structures of MgO(100) single crystal substrates on ferroelectric PbTiO₃ thin films grown by radio frequency sputtering

Sangsub Kim; Sunggi Baik

J. Vac. Sci. Technol. A 13, 95–100 (1995) https://doi.org/10.1116/1.579392

Abstract

View articletitled, Effects of surface structures of MgO(100) single crystal substrates on ferroelectric PbTiO3 thin films grown by radio frequency sputtering

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Monte Carlo simulation of the thermalization of sputtered atoms and reflected atoms in the magnetron sputtering discharge

Y. Yamamura; M. Ishida

J. Vac. Sci. Technol. A 13, 101–112 (1995) https://doi.org/10.1116/1.579874

Abstract

View articletitled, Monte Carlo simulation of the thermalization of sputtered atoms and reflected atoms in the magnetron sputtering discharge

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Secondary electrons in liquid metal ion sources

Wojciech Czarczynski

J. Vac. Sci. Technol. A 13, 113–116 (1995) https://doi.org/10.1116/1.579421

Abstract

View articletitled, Secondary electrons in liquid metal ion sources

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Structure and ordering dynamics for Au deposition on Au(110) (1×2)

L. Barbier; B. Salanon; J. Sprösser

J. Vac. Sci. Technol. A 13, 117–121 (1995) https://doi.org/10.1116/1.579422

Abstract

View articletitled, Structure and ordering dynamics for Au deposition on Au(110) (1×2)

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Properties of aluminum overlayers on chemically modified TiO₂(110) surfaces

L. S. Dake; R. J. Lad

J. Vac. Sci. Technol. A 13, 122–126 (1995) https://doi.org/10.1116/1.579424

Abstract

View articletitled, Properties of aluminum overlayers on chemically modified TiO2(110) surfaces

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Modification of aluminum thin films

M. Park; K. R. Lane; J. M. Parpia; M. S. Isaacson

J. Vac. Sci. Technol. A 13, 127–131 (1995) https://doi.org/10.1116/1.579425

Abstract

View articletitled, Modification of aluminum thin films

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Obtaining extremely high vacuum using sintered fine copper powder as a cryosorbent

Minsheng Xu; Yutaka Matsui

J. Vac. Sci. Technol. A 13, 132–135 (1995) https://doi.org/10.1116/1.579426

Abstract

View articletitled, Obtaining extremely high vacuum using sintered fine copper powder as a cryosorbent

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Waterjet cutting of cross‐linked glass

Fang Yuan; John A. Johnson; David D. Allred; Robert H. Todd

J. Vac. Sci. Technol. A 13, 136–139 (1995) https://doi.org/10.1116/1.579427

Abstract

View articletitled, Waterjet cutting of cross‐linked glass

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Electroless nickel plated aluminum alloy ConFlat flange and chamber

Fumio Watanabe; Yasuki Koyatsu; Kazunari Fujimori; Hirofumi Miki; Akinari Kasai; Takafumi Sato; Kazuo Miyamoto

J. Vac. Sci. Technol. A 13, 140–142 (1995) https://doi.org/10.1116/1.579428

View articletitled, Electroless nickel plated aluminum alloy ConFlat flange and chamber

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Optimum beam energy for high depth resolution secondary ion mass spectrometry

J. B. Clegg

J. Vac. Sci. Technol. A 13, 143–146 (1995) https://doi.org/10.1116/1.579429

Abstract

View articletitled, Optimum beam energy for high depth resolution secondary ion mass spectrometry

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In situ deoxidization/oxidization of a copper surface: A new concept for attaining ultralow outgassing rates from a vacuum wall

Fumio Watanabe; Maki Suemitsu; Nobuo Miyamoto

J. Vac. Sci. Technol. A 13, 147–150 (1995) https://doi.org/10.1116/1.579430

View articletitled, In situ deoxidization/oxidization of a copper surface: A new concept for attaining ultralow outgassing rates from a vacuum wall

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Evidence of a simple cubic phase in electron beam vacuum evaporated indium–oxide on a glass substrate

M. Abbas; I. A. Qazi; A. Samina; M. Masaood; A. Majeed; A. ul Haq

J. Vac. Sci. Technol. A 13, 151–152 (1995) https://doi.org/10.1116/1.579431

Abstract

View articletitled, Evidence of a simple cubic phase in electron beam vacuum evaporated indium–oxide on a glass substrate

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Real‐time monitoring of homoepitaxial and heteroepitaxial processes by p‐polarized reflectance spectroscopy

N. Dietz; A. Miller; K. J. Bachmann

J. Vac. Sci. Technol. A 13, 153–155 (1995) https://doi.org/10.1116/1.579432

Abstract

View articletitled, Real‐time monitoring of homoepitaxial and heteroepitaxial processes by p‐polarized reflectance spectroscopy

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Collimated magnetron sputter deposition with grazing angle ion bombardment

S. M. Rossnagel; R. Sward

J. Vac. Sci. Technol. A 13, 156–158 (1995) https://doi.org/10.1116/1.579433

Abstract

View articletitled, Collimated magnetron sputter deposition with grazing angle ion bombardment

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Simple design of electron beam evaporators for 3d transition metals

G. S. Dong; Y. Chen; M. Zhang; X. Jin

J. Vac. Sci. Technol. A 13, 159–160 (1995) https://doi.org/10.1116/1.579434

Abstract

View articletitled, Simple design of electron beam evaporators for 3d transition metals

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Chemical significance of x-ray photoelectron spectroscopy binding energy shifts: A Perspective

Materials characterization: Can artificial intelligence be used to address reproducibility challenges?

Low-resistivity molybdenum obtained by atomic layer deposition

Adsorption and decomposition of trichlorosilane and trichlorogermane on porous silicon and Si(100)2×1 surfaces

Photoelectron spectroscopy from atomic layer epitaxially grown ZnTe/ZnSe heterostructures

Studies of Ag films deposited using partially ionized beam deposition

Nuclear microprobe analysis of Hg_1−xCd_xTe metal–semiconductor–metal detectors on substrates of GaAs and GaAs/Si

Desorption of positive and negative fluorine ions from BaF₂ surfaces by core level excitation under electron bombardment

Carbon dioxide jet spray cleaning of molecular contaminants

Adsorption and decomposition of dichlorosilane on porous silicon surfaces

Direct analysis of contamination in submicron contact holes by thermal desorption spectroscopy

Study of tunneling current oscillation dependence on SiO₂ thickness and Si roughness at the Si/SiO₂ interface

Kinetics and mechanism of plasma oxidation of tantalum silicides

Dry etching of palladium thin films in fluorine containing plasmas: X‐ray photoelectron spectroscopy investigation

Reactive ion etching induced damage with gas mixtures CHF₃/O₂ and SF₆/O₂

Atomic layer molecular beam epitaxy growth of GaAs_1−xP_x layers: Study of P₂ incorporation by the reflectance difference technique

Growth modes of Pd, Ag, and Si thin films on B

Auger electron spectroscopy as a real‐time compositional probe in molecular beam epitaxy

Preparation and characterization of ZnO films by an evaporating method

Effects of surface structures of MgO(100) single crystal substrates on ferroelectric PbTiO₃ thin films grown by radio frequency sputtering

Monte Carlo simulation of the thermalization of sputtered atoms and reflected atoms in the magnetron sputtering discharge

Secondary electrons in liquid metal ion sources

Structure and ordering dynamics for Au deposition on Au(110) (1×2)

Properties of aluminum overlayers on chemically modified TiO₂(110) surfaces

Modification of aluminum thin films

Obtaining extremely high vacuum using sintered fine copper powder as a cryosorbent

Waterjet cutting of cross‐linked glass

Electroless nickel plated aluminum alloy ConFlat flange and chamber

Optimum beam energy for high depth resolution secondary ion mass spectrometry

In situ deoxidization/oxidization of a copper surface: A new concept for attaining ultralow outgassing rates from a vacuum wall

Evidence of a simple cubic phase in electron beam vacuum evaporated indium–oxide on a glass substrate

Real‐time monitoring of homoepitaxial and heteroepitaxial processes by p‐polarized reflectance spectroscopy

Collimated magnetron sputter deposition with grazing angle ion bombardment

Simple design of electron beam evaporators for 3d transition metals

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