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Rational pattern design for in vitro cellular networks using surface photochemistry
James J. Hickman; Suresh K. Bhatia; Judy N. Quong; Paul Shoen; David A. Stenger; Christian J. Pike; Carl W. Cotman
J. Vac. Sci. Technol. A 12, 607–616 (1994)
https://doi.org/10.1116/1.578844
Simulation of surface topography evolution during plasma etching by the method of characteristics
J. Vac. Sci. Technol. A 12, 620–635 (1994)
https://doi.org/10.1116/1.578846
Dynamics of ion‐assisted etching in the Si(100)/XeF2/Ar+ system on a time scale 100 μs–1000 s
J. Vac. Sci. Technol. A 12, 636–647 (1994)
https://doi.org/10.1116/1.578847
Etching of Si surfaces with hot chlorine beams: Translational and vibrational excitation of the incident chlorine particles
J. Vac. Sci. Technol. A 12, 648–657 (1994)
https://doi.org/10.1116/1.578848
Fluorocarbon high density plasma. V. Influence of aspect ratio on the etch rate of silicon dioxide in an electron cyclotron resonance plasma
J. Vac. Sci. Technol. A 12, 658–664 (1994)
https://doi.org/10.1116/1.578849
Combined instrument for the on‐line investigation of plasma deposited or etched surfaces by monochromatized x‐ray photoelectron spectroscopy and time‐of‐flight secondary ion mass spectrometry
P. W. Jahn; F. M. Petrat; D. Wolany; M. Deimel; T. Gantenfort; C. Schmerling; H. Wensing; L. Wiedmann; A. Benninghoven
J. Vac. Sci. Technol. A 12, 671–676 (1994)
https://doi.org/10.1116/1.578851
Adverse effects on plasma polymerized films due to previous oxygen etching in an ‘‘electrodeless’’ reactor
J. Vac. Sci. Technol. A 12, 677–680 (1994)
https://doi.org/10.1116/1.578852
Synchrotron radiation (5–50 eV) induced degradation of fluorinated polymers
J. Vac. Sci. Technol. A 12, 681–689 (1994)
https://doi.org/10.1116/1.578853
Study of the NF3 plasma cleaning of reactors for amorphous silicon deposition
J. Vac. Sci. Technol. A 12, 690–698 (1994)
https://doi.org/10.1116/1.578854
Chemical and morphological changes on silver surfaces produced by microwave generated atomic oxygen
J. Vac. Sci. Technol. A 12, 699–706 (1994)
https://doi.org/10.1116/1.578855
Characterization of silver films deposited by radio frequency magnetron sputtering
J. Vac. Sci. Technol. A 12, 707–713 (1994)
https://doi.org/10.1116/1.578856
CdTe oxide films grown by radio frequency sputtering utilizing argon–nitrous oxide plasma
J. Vac. Sci. Technol. A 12, 714–717 (1994)
https://doi.org/10.1116/1.578811
Study of the time dependence of differentially sputtered currents from multiphase powder targets
J. Vac. Sci. Technol. A 12, 718–722 (1994)
https://doi.org/10.1116/1.578812
Planar magnetron glow discharge on copper: Empirical and semiempirical relations
J. Vac. Sci. Technol. A 12, 723–726 (1994)
https://doi.org/10.1116/1.578813
Thickness‐dependent stress in sputtered carbon films
J. Vac. Sci. Technol. A 12, 727–732 (1994)
https://doi.org/10.1116/1.578814
Properties of TiCN coatings prepared by magnetron sputtering
J. Vac. Sci. Technol. A 12, 733–736 (1994)
https://doi.org/10.1116/1.578815
Loss of selectivity during W chemical vapor deposition on Si using the WF6/SiH4 process
J. Vac. Sci. Technol. A 12, 737–745 (1994)
https://doi.org/10.1116/1.578816
Adhesion between polycarbonate substrate and SiO2 film formed from silane and nitrous oxide by plasma‐enhanced chemical vapor deposition
J. Vac. Sci. Technol. A 12, 746–750 (1994)
https://doi.org/10.1116/1.578817
Preparation of amorphous BaTiO3 thin films on indium tin oxide‐coated soda lime glass by metalorganic chemical vapor deposition
J. Vac. Sci. Technol. A 12, 751–753 (1994)
https://doi.org/10.1116/1.578818
Deposition of amorphous hydrogenated silicon carbide films using organosilanes in an argon/hydrogen plasma
J. Vac. Sci. Technol. A 12, 754–759 (1994)
https://doi.org/10.1116/1.578819
Comparison of argon electron‐cyclotron‐resonance plasmas in three magnetic field configurations. II. Energy distribution of argon ions
J. Vac. Sci. Technol. A 12, 760–768 (1994)
https://doi.org/10.1116/1.578820
Valence‐band structure of PMDA‐ODA polyimide studied by x‐ray photoelectron spectroscopy and theoretical calculations*
J. Vac. Sci. Technol. A 12, 772–782 (1994)
https://doi.org/10.1116/1.578822
Characterization by Auger spectroscopy of niobium–aluminum oxide–niobium sandwiches for Josephson junctions
J. Vac. Sci. Technol. A 12, 783–789 (1994)
https://doi.org/10.1116/1.578823
Dependence of resolution on sample material in rotational Auger depth profiling
J. Vac. Sci. Technol. A 12, 794–801 (1994)
https://doi.org/10.1116/1.578825
Metallization of Teflon PFA. II. Interactions of Ti, Ag, and Au measured by x‐ray photoelectron spectroscopy
J. Vac. Sci. Technol. A 12, 807–812 (1994)
https://doi.org/10.1116/1.578827
Reduction of photodesorption yield by oxygen discharge cleaning
J. Vac. Sci. Technol. A 12, 826–830 (1994)
https://doi.org/10.1116/1.578830
Two‐photon laser‐induced fluorescence measurements of absolute atomic hydrogen densities and powder formation in a silane discharge
J. Vac. Sci. Technol. A 12, 831–834 (1994)
https://doi.org/10.1116/1.578831
Precise property determinations of arsenosilicate glass thin films using infrared spectroscopy
J. Vac. Sci. Technol. A 12, 835–838 (1994)
https://doi.org/10.1116/1.578832
Infrared absorption spectroscopy for monitoring condensible gases in chemical vapor deposition applications
J. Vac. Sci. Technol. A 12, 839–845 (1994)
https://doi.org/10.1116/1.578833
Gas desorption from an oxygen free high conductivity copper vacuum chamber by synchrotron radiation photons
J. Vac. Sci. Technol. A 12, 846–853 (1994)
https://doi.org/10.1116/1.579265
Pumping of helium and hydrogen by sputter‐ion pumps. II. Hydrogen pumping
J. Vac. Sci. Technol. A 12, 861–866 (1994)
https://doi.org/10.1116/1.579267
Thermal outgassing behavior and photoemission studies of Haynes Alloy 214
J. Vac. Sci. Technol. A 12, 867–872 (1994)
https://doi.org/10.1116/1.579268
New technique for coprecipitation of organic dye with polymer under high vacuum
J. Vac. Sci. Technol. A 12, 876–878 (1994)
https://doi.org/10.1116/1.579270
Vacuum ultraviolet emission from microwave plasmas of hydrogen and its mixtures with helium and oxygen
J. Vac. Sci. Technol. A 12, 879–882 (1994)
https://doi.org/10.1116/1.579271
In situ bend fixture for deformation and fracture studies in the environmental scanning electron microscope
J. Vac. Sci. Technol. A 12, 883–885 (1994)
https://doi.org/10.1116/1.579272
Effect of anode bias on plasma confinement in direct current magnetron discharges
J. Vac. Sci. Technol. A 12, 886–888 (1994)
https://doi.org/10.1116/1.579273
Instrument for the measurement of adhesion forces in ultrahigh vacuum surface analysis apparatuses
J. Vac. Sci. Technol. A 12, 889–891 (1994)
https://doi.org/10.1116/1.579274
Perspective on improving the quality of surface and material data analysis in the scientific literature with a focus on x-ray photoelectron spectroscopy (XPS)
George H. Major, Joshua W. Pinder, et al.
Low-resistivity molybdenum obtained by atomic layer deposition
Kees van der Zouw, Bernhard Y. van der Wel, et al.
Machine-learning-enabled on-the-fly analysis of RHEED patterns during thin film deposition by molecular beam epitaxy
Tiffany C. Kaspar, Sarah Akers, et al.