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Real‐time determination of the direction of wafer temperature change by spatially resolved infrared laser interferometric thermometry

V. M. Donnelly

J. Vac. Sci. Technol. A 11, 2393–2397 (1993) https://doi.org/10.1116/1.578583

View articletitled, Real‐time determination of the direction of wafer temperature change by spatially resolved infrared laser interferometric thermometry

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Real‐time in situ ellipsometric control of antireflection coatings for semiconductor laser amplifiers using SiO_x

I‐Fan Wu; J. B. Dottellis; Mario Dagenais

J. Vac. Sci. Technol. A 11, 2398–2406 (1993) https://doi.org/10.1116/1.578584

Abstract

View articletitled, Real‐time in situ ellipsometric control of antireflection coatings for semiconductor laser amplifiers using SiOx

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Growth mechanism and surface alloy formation of Ni on Pt(110) surface

T. I. Fu; P. C. Liao; C. S. Shern

J. Vac. Sci. Technol. A 11, 2407–2410 (1993) https://doi.org/10.1116/1.578585

Abstract

View articletitled, Growth mechanism and surface alloy formation of Ni on Pt(110) surface

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Interfacial reactions between aluminum and BPDA‐PDA

A. Chenite; A. Selmani; B. Lamontagne; A. Yelon

J. Vac. Sci. Technol. A 11, 2411–2418 (1993) https://doi.org/10.1116/1.578586

Abstract

View articletitled, Interfacial reactions between aluminum and BPDA‐PDA

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Ultrahigh vacuum metalorganic chemical vapor deposition growth and in situ characterization of epitaxial TiO₂ films

Samuel Chen; M. G. Mason; H. J. Gysling; G. R. Paz‐Pujalt; T. N. Blanton; T. Castro; K. M. Chen; C. P. Fictorie; W. L. Gladfelter; A. Franciosi; P. I. Cohen; J. F. Evans

J. Vac. Sci. Technol. A 11, 2419–2429 (1993) https://doi.org/10.1116/1.578587

Abstract

View articletitled, Ultrahigh vacuum metalorganic chemical vapor deposition growth and in situ characterization of epitaxial TiO2 films

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Comparative study of the crystal structure of synthesized CuGa_1−yIn_yTe₂ compounds

M. León; J. M. Merino; J. L. Martin De Vidales

J. Vac. Sci. Technol. A 11, 2430–2436 (1993) https://doi.org/10.1116/1.578588

Abstract

View articletitled, Comparative study of the crystal structure of synthesized CuGa1−yInyTe2 compounds

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Aluminum nitride thin film sensor for force, acceleration, and acoustic emission sensing

L. Zheng; S. Ramalingam; T. Shi; R. L. Peterson

J. Vac. Sci. Technol. A 11, 2437–2446 (1993) https://doi.org/10.1116/1.578589

Abstract

View articletitled, Aluminum nitride thin film sensor for force, acceleration, and acoustic emission sensing

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Instability of the metal microcrystal surface at intense electron emission*

V. E. Ptitsin

J. Vac. Sci. Technol. A 11, 2447–2451 (1993) https://doi.org/10.1116/1.578590

Abstract

View articletitled, Instability of the metal microcrystal surface at intense electron emission*

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Material properties of a ZrN_x film on silicon prepared by ion‐assisted deposition method

Susumu Horita; Tetuya Tujikawa; Hiroshi Akahori; Mituru Kobayashi; Tomonobu Hata

J. Vac. Sci. Technol. A 11, 2452–2457 (1993) https://doi.org/10.1116/1.578591

Abstract

View articletitled, Material properties of a ZrNx film on silicon prepared by ion‐assisted deposition method

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Mesh pattern of Ge islands grown using solid phase epitaxy

H. Hibino; N. Shimizu; Y. Shinoda

J. Vac. Sci. Technol. A 11, 2458–2462 (1993) https://doi.org/10.1116/1.578592

Abstract

View articletitled, Mesh pattern of Ge islands grown using solid phase epitaxy

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Investigation of the kinetics of digermane chemisorption and reaction product desorption in thin film growth of germanium

Gyula Eres; J. W. Sharp

J. Vac. Sci. Technol. A 11, 2463–2471 (1993) https://doi.org/10.1116/1.578593

Abstract

View articletitled, Investigation of the kinetics of digermane chemisorption and reaction product desorption in thin film growth of germanium

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Production of a dense metal‐ion stream for ion coating by a pulsed vacuum arc in a strong magnetic field

Yoshiro Nakagawa; Masao Itami

J. Vac. Sci. Technol. A 11, 2472–2476 (1993) https://doi.org/10.1116/1.578594

Abstract

View articletitled, Production of a dense metal‐ion stream for ion coating by a pulsed vacuum arc in a strong magnetic field

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Synthesis of carborane and boron‐rich films from solid diborane using synchrotron radiation

M. W. Ruckman; M. F. Murray; J. K. Mowlem; D. R. Strongin

J. Vac. Sci. Technol. A 11, 2477–2482 (1993) https://doi.org/10.1116/1.578595

Abstract

View articletitled, Synthesis of carborane and boron‐rich films from solid diborane using synchrotron radiation

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Spin correlation effects on the bonding character of alkali/silicon interfaces: An extended Hubbard model

J. M. López‐Sancho; M. C. Refolio; M. P. López‐Sancho; J. Rubio

J. Vac. Sci. Technol. A 11, 2483–2486 (1993) https://doi.org/10.1116/1.578596

Abstract

View articletitled, Spin correlation effects on the bonding character of alkali/silicon interfaces: An extended Hubbard model

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Novel radio‐frequency induction plasma processing techniques

John H. Keller; John C. Forster; Michael S. Barnes

J. Vac. Sci. Technol. A 11, 2487–2491 (1993) https://doi.org/10.1116/1.578597

Abstract

View articletitled, Novel radio‐frequency induction plasma processing techniques

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Reactive ion etching of SiGe alloys using fluorine‐containing plasmas*

Ying Zhang; Gottlieb S. Oehrlein; Edouard de Frésart; James W. Corbett

J. Vac. Sci. Technol. A 11, 2492–2495 (1993) https://doi.org/10.1116/1.578598

Abstract

View articletitled, Reactive ion etching of SiGe alloys using fluorine‐containing plasmas*

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Dual‐function remote plasma etching/cleaning system applied to selective etching of SiO₂ and removal of polymeric residues

T. Yasuda; G. Lucovsky

J. Vac. Sci. Technol. A 11, 2496–2507 (1993) https://doi.org/10.1116/1.578599

Abstract

View articletitled, Dual‐function remote plasma etching/cleaning system applied to selective etching of SiO2 and removal of polymeric residues

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Moving‐coil waveguide discharge for inner coating of metal tubes

R. Hytry; W. Möller; R. Wilhelm; A. v. Keudell

J. Vac. Sci. Technol. A 11, 2508–2517 (1993) https://doi.org/10.1116/1.578600

Abstract

View articletitled, Moving‐coil waveguide discharge for inner coating of metal tubes

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Oxygen discharge cleaning method for aluminum storage ring vacuum chambers

Masao Saitoh; Ken‐ichi Kanazawa; Takashi Momose; Hajime Ishimaru; Nobuhiko Ota; Jōshin Uramoto

J. Vac. Sci. Technol. A 11, 2518–2524 (1993) https://doi.org/10.1116/1.578601

Abstract

View articletitled, Oxygen discharge cleaning method for aluminum storage ring vacuum chambers

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Correlation of plasma and surface chemistry during electron cyclotron resonance hydrogen etching of native silicon oxide

W. Tsai; M. Delfino; M. E. Day; T. Sheng; B. C. Chung; S. Salimian

J. Vac. Sci. Technol. A 11, 2525–2529 (1993) https://doi.org/10.1116/1.578602

Abstract

View articletitled, Correlation of plasma and surface chemistry during electron cyclotron resonance hydrogen etching of native silicon oxide

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Etching of a‐C:H films by an atomic oxygen beam

E. B. D. Bourdon; A. Raveh; S. C. Gujrathi; L. Martinu

J. Vac. Sci. Technol. A 11, 2530–2535 (1993) https://doi.org/10.1116/1.578603

Abstract

View articletitled, Etching of a‐C:H films by an atomic oxygen beam

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Surface characterization of GaAs after the reactive ion etching of GeMoW ohmic contact in radio frequency SF₆–O₂ plasma

A. Campo; Ch. Cardinaud; G. Turban; C. Dubon‐Chevallier; V. Amarger; J. Etrillard

J. Vac. Sci. Technol. A 11, 2536–2542 (1993) https://doi.org/10.1116/1.578604

Abstract

View articletitled, Surface characterization of GaAs after the reactive ion etching of GeMoW ohmic contact in radio frequency SF6–O2 plasma

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Role of contaminants in electron cyclotron resonance plasmas

M. J. Goeckner; J. A. Meyer; G.‐H. Kim; J.‐S. Jenq; A. Matthews; J. W. Taylor; R. A. Breun

J. Vac. Sci. Technol. A 11, 2543–2552 (1993) https://doi.org/10.1116/1.578605

Abstract

View articletitled, Role of contaminants in electron cyclotron resonance plasmas

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Thermal desorption of ultraviolet–ozone oxidized Ge(001) for substrate cleaning

X.‐J. Zhang; G. Xue; A. Agarwal; R. Tsu; M.‐A. Hasan; J. E. Greene; A. Rockett

J. Vac. Sci. Technol. A 11, 2553–2561 (1993) https://doi.org/10.1116/1.578606

Abstract

View articletitled, Thermal desorption of ultraviolet–ozone oxidized Ge(001) for substrate cleaning

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Monte Carlo simulation of surface kinetics during plasma enhanced chemical vapor deposition of SiO₂ using oxygen/tetraethoxysilane chemistry

Phillip J. Stout; Mark J. Kushner

J. Vac. Sci. Technol. A 11, 2562–2571 (1993) https://doi.org/10.1116/1.578607

Abstract

View articletitled, Monte Carlo simulation of surface kinetics during plasma enhanced chemical vapor deposition of SiO2 using oxygen/tetraethoxysilane chemistry

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Wave propagation and plasma uniformity in an electron cyclotron resonance plasma

Seiji Samukawa

J. Vac. Sci. Technol. A 11, 2572–2576 (1993) https://doi.org/10.1116/1.578608

Abstract

View articletitled, Wave propagation and plasma uniformity in an electron cyclotron resonance plasma

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Excimer laser reactive ablation: An efficient approach for the deposition of high quality TiN films

I. N. Mihailescu; N. Chitica; V. S. Teodorescu; M. Luisa De Giorgi; G. Leggieri; A. Luches; M. Martino; A. Perrone; B. Dubreuil

J. Vac. Sci. Technol. A 11, 2577–2582 (1993) https://doi.org/10.1116/1.578609

Abstract

View articletitled, Excimer laser reactive ablation: An efficient approach for the deposition of high quality TiN films

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Comparison of TiAlN coatings grown by unbalanced magnetron and arc bond sputtering techniques

W.‐D. Münz; T. Hurkmans; G. Keiren; T. Trinh

J. Vac. Sci. Technol. A 11, 2583–2589 (1993) https://doi.org/10.1116/1.578610

Abstract

View articletitled, Comparison of TiAlN coatings grown by unbalanced magnetron and arc bond sputtering techniques

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Surface characterization of fluorinated polyimide films grown by vapor deposition polymerization

Yasuko Yamada Maruo; Yasuko Andoh; Shigekuni Sasaki

J. Vac. Sci. Technol. A 11, 2590–2596 (1993) https://doi.org/10.1116/1.578611

Abstract

View articletitled, Surface characterization of fluorinated polyimide films grown by vapor deposition polymerization

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Time‐of‐flight secondary ion mass spectrometry study of P₂S₅/(NH₄)₂S‐ and ultraviolet/ozone‐treated GaAs

J. Bennett; J. A. Dagata

J. Vac. Sci. Technol. A 11, 2597–2602 (1993) https://doi.org/10.1116/1.578612

Abstract

View articletitled, Time‐of‐flight secondary ion mass spectrometry study of P2S5/(NH4)2S‐ and ultraviolet/ozone‐treated GaAs

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Accurate determination of delay time and length of flight path for a time‐of‐flight modulated molecular beam apparatus

P. K. Wu; J. B. Hudson

J. Vac. Sci. Technol. A 11, 2603–2609 (1993) https://doi.org/10.1116/1.578613

Abstract

View articletitled, Accurate determination of delay time and length of flight path for a time‐of‐flight modulated molecular beam apparatus

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Photoirradiation‐charge compensation for secondary ion mass spectrometers analysis of semiconductors

Shun‐ichi Hayashi; Yoshihiro Hashiguchi

J. Vac. Sci. Technol. A 11, 2610–2613 (1993) https://doi.org/10.1116/1.578614

Abstract

View articletitled, Photoirradiation‐charge compensation for secondary ion mass spectrometers analysis of semiconductors

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Photoion detection with a wide dynamic range using a quadrupole mass spectrometer for nonresonant multiphoton ionization of sputtered neutrals

T. Maruo; Y. Higashi; T. Tanaka; Y. Homma

J. Vac. Sci. Technol. A 11, 2614–2618 (1993) https://doi.org/10.1116/1.578615

Abstract

View articletitled, Photoion detection with a wide dynamic range using a quadrupole mass spectrometer for nonresonant multiphoton ionization of sputtered neutrals

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Photoelectron spectroscopic studies on interfacial reactions in Zr/2×1(100)Si and Zr/SiO₂/(100)Si systems

T. Yamauchi; H. Kitamura; N. Wakai; S. Zaima; Y. Koide; Y. Yasuda

J. Vac. Sci. Technol. A 11, 2619–2622 (1993) https://doi.org/10.1116/1.578616

Abstract

View articletitled, Photoelectron spectroscopic studies on interfacial reactions in Zr/2×1(100)Si and Zr/SiO2/(100)Si systems

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Correlation of outgassing of stainless steel and aluminum with various surface treatments

H. F. Dylla; D. M. Manos; P. H. LaMarche

J. Vac. Sci. Technol. A 11, 2623–2636 (1993) https://doi.org/10.1116/1.578617

Abstract

View articletitled, Correlation of outgassing of stainless steel and aluminum with various surface treatments

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Hydrogen desorption behavior of aluminium materials used for extremely high vacuum chamber

Yuko Hirohata; Satoshi Fujimoto; Tomoaki Hino; Toshiro Yamashina

J. Vac. Sci. Technol. A 11, 2637–2641 (1993) https://doi.org/10.1116/1.578618

Abstract

View articletitled, Hydrogen desorption behavior of aluminium materials used for extremely high vacuum chamber

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Structural change of titanium oxide evaporated films during in situ heating in an electron microscope

Y. Yamada; I. Shiota; K. Yoshida

J. Vac. Sci. Technol. A 11, 2642–2648 (1993) https://doi.org/10.1116/1.578619

Abstract

View articletitled, Structural change of titanium oxide evaporated films during in situ heating in an electron microscope

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Surface structure of SrTiO₃(001) with various surface treatments

Tokihisa Hikita; Takashi Hanada; Masahiro Kudo; Maki Kawai

J. Vac. Sci. Technol. A 11, 2649–2654 (1993) https://doi.org/10.1116/1.578620

Abstract

View articletitled, Surface structure of SrTiO3(001) with various surface treatments

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Extremely high vacuum system for dynamical surface analysis

Katsuyuki Tsukui; Kazuhiko Endo; Ryu Hasunuma; Toshiaki Osaka; Iwao Ohdomari; Nobuaki Yagi; Hajime Aihara

J. Vac. Sci. Technol. A 11, 2655–2658 (1993) https://doi.org/10.1116/1.578621

Abstract

View articletitled, Extremely high vacuum system for dynamical surface analysis

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Auger electron angular distributions from Al(100): Resolution of an apparent contradiction

Oliver M. R. Chyan; Douglas G. Frank; Charles A. Doyle; Arthur T. Hubbard

J. Vac. Sci. Technol. A 11, 2659–2664 (1993) https://doi.org/10.1116/1.578622

Abstract

View articletitled, Auger electron angular distributions from Al(100): Resolution of an apparent contradiction

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Photoelectron spectroscopy studies of Tm silicide films on Si(111)

C. Wigren; J. N. Andersen; R. Nyholm; U. O. Karlsson

J. Vac. Sci. Technol. A 11, 2665–2671 (1993) https://doi.org/10.1116/1.578623

Abstract

View articletitled, Photoelectron spectroscopy studies of Tm silicide films on Si(111)

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Scanning tunneling microscopy study of carbon and hydrogen reactions with Si(111) in ultrahigh vacuum

D. Rogers; T. Tiedje

J. Vac. Sci. Technol. A 11, 2672–2675 (1993) https://doi.org/10.1116/1.578624

Abstract

View articletitled, Scanning tunneling microscopy study of carbon and hydrogen reactions with Si(111) in ultrahigh vacuum

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In situ observation of growing surface of oxide films by reflection high‐energy electron diffraction beam excited Auger electron spectroscopy

Hidehiko Nonaka; Takashi Shimizu; Shingo Ichimura; Kazuo Arai

J. Vac. Sci. Technol. A 11, 2676–2680 (1993) https://doi.org/10.1116/1.578625

Abstract

View articletitled, In situ observation of growing surface of oxide films by reflection high‐energy electron diffraction beam excited Auger electron spectroscopy

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Surface composition of AlN powders studied by x‐ray photoelectron spectroscopy and bremsstrahlung‐excited Auger electron spectroscopy

H. M. Liao; R. N. S. Sodhi; T. W. Coyle

J. Vac. Sci. Technol. A 11, 2681–2686 (1993) https://doi.org/10.1116/1.578626

Abstract

View articletitled, Surface composition of AlN powders studied by x‐ray photoelectron spectroscopy and bremsstrahlung‐excited Auger electron spectroscopy

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Oxygen detection in thin silicon dioxide layers by low‐energy x‐ray fluorescence spectrometry

Robert E. Kirby; David Wherry; Michael Madden

J. Vac. Sci. Technol. A 11, 2687–2693 (1993) https://doi.org/10.1116/1.578627

Abstract

View articletitled, Oxygen detection in thin silicon dioxide layers by low‐energy x‐ray fluorescence spectrometry

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X‐ray fluorescence measurements of x‐ray absorption near edge structure at the Si, P, and S L edges

Masoud Kasrai; Zhanfeng Yin; G. Michael Bancroft; Kim H. Tan

J. Vac. Sci. Technol. A 11, 2694–2699 (1993) https://doi.org/10.1116/1.578628

Abstract

View articletitled, X‐ray fluorescence measurements of x‐ray absorption near edge structure at the Si, P, and S L edges

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Hydrogen atom detection by H⁻ conversion

E. C. Samano; W. E. Carr

J. Vac. Sci. Technol. A 11, 2700–2706 (1993) https://doi.org/10.1116/1.578629

Abstract

View articletitled, Hydrogen atom detection by H− conversion

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X‐ray photoelectron spectroscopy study of growth of thin cerium films on polypropylene

M. Heuberger; G. Dietler; S. Nowak; L. Schlapbach

J. Vac. Sci. Technol. A 11, 2707–2713 (1993) https://doi.org/10.1116/1.578630

Abstract

View articletitled, X‐ray photoelectron spectroscopy study of growth of thin cerium films on polypropylene

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Thermal stability of two‐dimensional atomic structures of Au–Ag adsorbates on Si(111) surfaces

J. Yuhara; M. Inoue; K. Morita

J. Vac. Sci. Technol. A 11, 2714–2717 (1993) https://doi.org/10.1116/1.578631

Abstract

View articletitled, Thermal stability of two‐dimensional atomic structures of Au–Ag adsorbates on Si(111) surfaces

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Gas adsorption studies of sputtered amorphous hydrogenated carbon films

P. J. Pigram; R. N. Lamb; R. E. Collins; B. A. Pailthorpe

J. Vac. Sci. Technol. A 11, 2718–2724 (1993) https://doi.org/10.1116/1.578632

Abstract

View articletitled, Gas adsorption studies of sputtered amorphous hydrogenated carbon films

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Thin film properties of germanium oxide synthesized by pulsed laser sputtering in vacuum and oxygen environments

Paul J. Wolf; Thomas M. Christensen; Nathan G. Coit; Richard W. Swinford

J. Vac. Sci. Technol. A 11, 2725–2732 (1993) https://doi.org/10.1116/1.578633

Abstract

View articletitled, Thin film properties of germanium oxide synthesized by pulsed laser sputtering in vacuum and oxygen environments

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Comparison of magnetron sputter deposition conditions in neon, argon, krypton, and xenon discharges

I. Petrov; I. Ivanov; V. Orlinov; J.‐E. Sundgren

J. Vac. Sci. Technol. A 11, 2733–2741 (1993) https://doi.org/10.1116/1.578634

Abstract

View articletitled, Comparison of magnetron sputter deposition conditions in neon, argon, krypton, and xenon discharges

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Electronic and optical properties of room temperature sputter deposited indium tin oxide

S. B. Lee; J. C. Pincenti; A. Cocco; D. L. Naylor

J. Vac. Sci. Technol. A 11, 2742–2746 (1993) https://doi.org/10.1116/1.578635

Abstract

View articletitled, Electronic and optical properties of room temperature sputter deposited indium tin oxide

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Langmuir probe diagnostics of a radio frequency magnetron discharge for deposition of high T_c YBCO films

S. K. Mishra; A. Sarkar; S. K. Ray; D. Bhattacharya; K. L. Chopra; S. R. Das

J. Vac. Sci. Technol. A 11, 2747–2751 (1993) https://doi.org/10.1116/1.578636

Abstract

View articletitled, Langmuir probe diagnostics of a radio frequency magnetron discharge for deposition of high Tc YBCO films

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Radio‐frequency reactive sputter etching in magnetron fields

K. E. Davies; M. Gross; C. M. Horwitz

J. Vac. Sci. Technol. A 11, 2752–2757 (1993) https://doi.org/10.1116/1.578637

Abstract

View articletitled, Radio‐frequency reactive sputter etching in magnetron fields

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Interferometric measurements of the energy of sputtered copper atoms in a magnetron discharge

G. M. Turner; I. S. Falconer; B. W. James; D. R. McKenzie

J. Vac. Sci. Technol. A 11, 2758–2764 (1993) https://doi.org/10.1116/1.578638

Abstract

View articletitled, Interferometric measurements of the energy of sputtered copper atoms in a magnetron discharge

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Monte Carlo simulations of textured planar magnetron targets

F. Bouchard; M. B. Dittmar; B. Manring

J. Vac. Sci. Technol. A 11, 2765–2770 (1993) https://doi.org/10.1116/1.578639

Abstract

View articletitled, Monte Carlo simulations of textured planar magnetron targets

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Effect of substrate temperature on the orientations of radio frequency sputtered Ba₂Si₂TiO₈ thin films

Yi Li; William V. Youdelis; Benjamin S. Chao; Hisao Yamauchi

J. Vac. Sci. Technol. A 11, 2771–2777 (1993) https://doi.org/10.1116/1.578640

Abstract

View articletitled, Effect of substrate temperature on the orientations of radio frequency sputtered Ba2Si2TiO8 thin films

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Molecular dynamics modeling of microstructure and stresses in sputter‐deposited thin films

C. C. Fang; V. Prasad; F. Jones

J. Vac. Sci. Technol. A 11, 2778–2789 (1993) https://doi.org/10.1116/1.578641

Abstract

View articletitled, Molecular dynamics modeling of microstructure and stresses in sputter‐deposited thin films

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Reactive sputtering of Ta under gradient oxygen pressure

T. Niwa; T. Saito; A. Kinbara

J. Vac. Sci. Technol. A 11, 2790–2795 (1993) https://doi.org/10.1116/1.578642

Abstract

View articletitled, Reactive sputtering of Ta under gradient oxygen pressure

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Directionality of sputtered Cu atoms in a hollow cathode enhanced planar magnetron

G. M. Turner; S. M. Rossnagel; J. J. Cuomo

J. Vac. Sci. Technol. A 11, 2796–2801 (1993) https://doi.org/10.1116/1.578643

Abstract

View articletitled, Directionality of sputtered Cu atoms in a hollow cathode enhanced planar magnetron

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Microstructure of a sputtered Ti film on an indium tin oxide substrate

Hirofumi Yamashita; Tetsuya Yamaguchi; Ryohei Miyagawa

J. Vac. Sci. Technol. A 11, 2802–2807 (1993) https://doi.org/10.1116/1.578644

Abstract

View articletitled, Microstructure of a sputtered Ti film on an indium tin oxide substrate

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Physical properties of radio‐frequency magnetron sputtered Pb(Zr,Ti)O₃ thin films: Direct determination of oxygen composition by Rutherford backscattering spectroscopy and nuclear reaction analysis*

E. Cattan; B. Agius; H. Achard; J. C. Cheang Wong; C. Ortega; J. Siejka

J. Vac. Sci. Technol. A 11, 2808–2815 (1993) https://doi.org/10.1116/1.578645

Abstract

View articletitled, Physical properties of radio‐frequency magnetron sputtered Pb(Zr,Ti)O3 thin films: Direct determination of oxygen composition by Rutherford backscattering spectroscopy and nuclear reaction analysis*

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Influence of vacuum gauges on outgassing rate measurements

M. Saitoh; K. Shimura; T. Iwata; T. Momose; H. Ishimaru

J. Vac. Sci. Technol. A 11, 2816–2821 (1993) https://doi.org/10.1116/1.578646

Abstract

View articletitled, Influence of vacuum gauges on outgassing rate measurements

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Reflector atomic hydrogen source: A method for producing pure atomic hydrogen in ultrahigh vacuum

K. H. Bornscheuer; S. R. Lucas; W. J. Choyke; W. D. Partlow; J. T. Yates, Jr.

J. Vac. Sci. Technol. A 11, 2822–2826 (1993) https://doi.org/10.1116/1.578647

Abstract

View articletitled, Reflector atomic hydrogen source: A method for producing pure atomic hydrogen in ultrahigh vacuum

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Nuclear polarization of solid deuterium–tritium

P. C. Souers; R. T. Tsugawa; E. M. Fearon; G. W. Collins; J. L. Maienschein; R. A. Failor; E. R. Mapoles; P. A. Fedders

J. Vac. Sci. Technol. A 11, 2827–2836 (1993) https://doi.org/10.1116/1.578648

Abstract

View articletitled, Nuclear polarization of solid deuterium–tritium

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Development of foam shell with plastic ablator for cryogenic laser fusion target

M. Takagi; M. Ishihara; T. Norimatsu; T. Yamanaka; Y. Izawa; S. Nakai

J. Vac. Sci. Technol. A 11, 2837–2845 (1993) https://doi.org/10.1116/1.578649

Abstract

View articletitled, Development of foam shell with plastic ablator for cryogenic laser fusion target

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Reactive ion etching of niobium in SF₆/O₂ to produce sloped sidewall profiles

B. J. Curtis; H. Mantle

J. Vac. Sci. Technol. A 11, 2846–2848 (1993) https://doi.org/10.1116/1.578650

View articletitled, Reactive ion etching of niobium in SF6/O2 to produce sloped sidewall profiles

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Indium doping of silicon using an evaporated indium film source

S. V. Kolluri; A. N. Chandorkar; A. Dhaul

J. Vac. Sci. Technol. A 11, 2849–2850 (1993) https://doi.org/10.1116/1.578651

View articletitled, Indium doping of silicon using an evaporated indium film source

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Characterization of the virtual source in an electron‐beam evaporation system

Mark D. Miller; Peter J. Biltoft; Mike Benapfl

J. Vac. Sci. Technol. A 11, 2851–2853 (1993) https://doi.org/10.1116/1.578652

Abstract

View articletitled, Characterization of the virtual source in an electron‐beam evaporation system

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Easily made device for increasing the manipulation length of a high precision ultrahigh vacuum manipulator

G. Reisfeld; S. Rabi

J. Vac. Sci. Technol. A 11, 2854–2855 (1993) https://doi.org/10.1116/1.578653

View articletitled, Easily made device for increasing the manipulation length of a high precision ultrahigh vacuum manipulator

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Poor man’s scratch tester

R. A. MacGill; X. Y. Yao; R. A. Castro; M. R. Dickinson; I. G. Brown

J. Vac. Sci. Technol. A 11, 2856–2857 (1993) https://doi.org/10.1116/1.578654

Abstract

View articletitled, Poor man’s scratch tester

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Reactive ion etcher self‐bias voltage regulator

Jeff E. Schramm; Dubravko I. Babic; Evelyn L. Hu; James L. Merz

J. Vac. Sci. Technol. A 11, 2858–2859 (1993) https://doi.org/10.1116/1.578655

View articletitled, Reactive ion etcher self‐bias voltage regulator

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Performance of an ultrahigh‐vacuum sample transfer system for investigation of molecular‐beam epitaxy grown semiconductor surfaces

X.‐S. Wang; C. Huang; V. Bressler‐Hill; R. Maboudian; W. H. Weinberg

J. Vac. Sci. Technol. A 11, 2860–2862 (1993) https://doi.org/10.1116/1.578656

Abstract

View articletitled, Performance of an ultrahigh‐vacuum sample transfer system for investigation of molecular‐beam epitaxy grown semiconductor surfaces

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Simple, compact, high‐purity Cr evaporator for ultrahigh vacuum

J. J. McClelland; J. Unguris; R. E. Scholten; D. T. Pierce

J. Vac. Sci. Technol. A 11, 2863–2864 (1993) https://doi.org/10.1116/1.578657

Abstract

View articletitled, Simple, compact, high‐purity Cr evaporator for ultrahigh vacuum

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Use of a silicon strip doping source in chemical beam epitaxy

T. B. Joyce; T. J. Bullough

J. Vac. Sci. Technol. A 11, 2865–2866 (1993) https://doi.org/10.1116/1.578658

View articletitled, Use of a silicon strip doping source in chemical beam epitaxy

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Design of an ultrahigh vacuum direct‐drive, cryogenic sample manipulator providing two degrees of rotational freedom

Robert M. Braun; Nicholas Winograd

J. Vac. Sci. Technol. A 11, 2867–2870 (1993) https://doi.org/10.1116/1.578659

Abstract

View articletitled, Design of an ultrahigh vacuum direct‐drive, cryogenic sample manipulator providing two degrees of rotational freedom

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‘‘Drawbridge’’ fixture for folding rotary linear magnetic feedthroughs

J. T. Fitch; J. J. Sumakeris; G. Lucovsky

J. Vac. Sci. Technol. A 11, 2871–2873 (1993) https://doi.org/10.1116/1.578660

View articletitled, ‘‘Drawbridge’’ fixture for folding rotary linear magnetic feedthroughs

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Gold wire sealing method of stainless‐steel/aluminum‐alloy joint for thermal isolation at liquid‐nitrogen temperature

Fumikazu Shimoshikiryo; Yuji Takakuwa; Naoki Oyama; Nobuo Miyamoto

J. Vac. Sci. Technol. A 11, 2874–2875 (1993) https://doi.org/10.1116/1.578661

Abstract

View articletitled, Gold wire sealing method of stainless‐steel/aluminum‐alloy joint for thermal isolation at liquid‐nitrogen temperature

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Erratum: ‘‘Angle‐resolved x‐ray photoelectron spectroscopy method for the thickness measurement of metal oxide/metal ultrathin films’’ [J. Vac. Sci. Technol. A 11, 2303 (1993)]

Liangyu Chen; Richard W. Hoffman

J. Vac. Sci. Technol. A 11, 2876 (1993) https://doi.org/10.1116/1.578662

View articletitled, Erratum: ‘‘Angle‐resolved x‐ray photoelectron spectroscopy method for the thickness measurement of metal oxide/metal ultrathin films’’ [J. Vac. Sci. Technol. A 11, 2303 (1993)]

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