Self-powered solar-blind ultraviolet photodetectors are considered for potential applications in secure communication and space detection. However, high-quality p-type wide bandgap semiconductors are nonexistent due to the self-compensation effect, which makes the design of p-n homojunction photodetectors a challenging proposition to date. In this work, a self-powered solar-blind ultraviolet photodetector is fabricated and discussed, based on a novel heterojunction of (InxGa1−x)2O3 ternary alloy films with two different compositions, which has a flexible design and can be easily fabricated for different applications. The heterojunction consists of an amorphous (In0.23Ga0.77)2O3 on the top of a bixbyite (In0.67Ga0.33)2O3 film prepared by radio frequency magnetron sputtering. The amorphous (In0.23Ga0.77)2O3/bixbyite (In0.67Ga0.33)2O3 heterojunction photodetector exhibits a responsivity of 5.78 mA/W, a detectivity of 1.69 × 1011 cm Hz1/2 W−1, and a high solar-blind UV (248 nm)/visible light (450 nm) rejection ratio of 1.39 × 103 at zero bias, suggesting decent spectral selectivity and high performance. The responsivity and peak wavelength of this photodetector can be tuned by the film thickness of the amorphous (In0.23Ga0.77)2O3. This work provides a new design for self-powered solar-blind UV detectors based on ternary alloy heterojunctions.

Solar-blind ultraviolet (200–280 nm) photodetectors have attracted significant attention because of their potential applications in many important fields and activities such as missile tracking, flame detection, nonline-of-sight optical communication, biomedicine, ultraviolet radiation monitoring below the ozone hole, and so on.1–3 Particularly, they attracted attention for their high precision and accuracy of weak signal detection ability in sunlight due to the absence of solar-blind region irradiation at the Earth’s surface.4,5 Commercial solar-blind ultraviolet photodetectors are mainly based on the photoelectric effect (photomultiplier tubes), which are limited due to their bulky structure and fragility, along with the requirement of a large bias voltage. Current research studies in solar-blind ultraviolet photodetectors focus mostly on wide bandgap semiconductors such as AlGaN, ZnMgO, diamond, and Ga2O3.6–9 However, there are obvious disadvantages in these structures; for example, the epitaxial quality of the AlGaN film deteriorates dramatically with increasing Al concentration, the single wurtzite phase of the MgZnO film breaks down with increasing Mg content, and the bandgap of diamond cannot be tuned. Ga2O3 is considered as an ideal candidate for its wide bandgap (4.5–5.1 eV), which lies sharply in the solar-blind ultraviolet region and exhibits a flexible tunability in the bandgap by alloying with different materials.10 Furthermore, self-powered and zero power consumption type photodetectors are strongly desirable within the background of a green, resource-saving society. Certainly, homostructured p-n junctions are the first choice. However, due to the self-compensation effect of wide bandgap semiconductors and the high ionization energy of acceptor dopants, the preparation of high-quality p-type wide bandgap semiconductors still remains a challenge. As an alternative, heterostructured photodetectors have gradually entered the public domain. Heterostructured photodetectors with different structures and materials have been widely studied. Currently, Ga2O3 and various materials are being used to prepare heterostructured self-powered photodetectors, such as GaN, ZnO, SiC, MoS2, Si, etc., which are widely reported in the field of solar-blind ultraviolet detection and visible-blind ultraviolet detection.11–20 Indium doping can reduce the bandgap of Ga2O3 and expand its absorption range, making Ga2O3 more suitable for solar-blind ultraviolet detection. However, only a few works have reported about an (InxGa1−x)2O3 heterojunction photodetector and its advantages, such as that the (InxGa1−x)2O3/Si heterostructure exhibits self-powered photodetection ability in the solar-blind ultraviolet range.21 

The bandgap of the (InxGa1−x)2O3 ternary alloy films can be modified by different In concentrations and various crystal phases. Therefore, constructing a heterostructure using two different In concentrations and various crystal phase (InxGa1−x)2O3 thin films also gives rise to the possibility of self-powered photodetection. More importantly, different In concentrations and various crystal phase (InxGa1−x)2O3 heterostructured photodetectors have their unique advantages: on the one hand, (InxGa1−x)2O3 heterostructured photodetectors with different In concentrations and various crystal phases are easy to prepare. Particularly, for magnetron sputtering, In content in the films can be easily controlled by the sputtering parameters of In2O3 and Ga2O3 simultaneously without replacing other targets.22 On the other hand, the crystal phase of (InxGa1−x)2O3 could be controlled by In content and postannealing conditions. The design of the detector is also flexible. According to different wavelength detection requirements, two suitable In concentrations and various crystal phase of materials can be selected to form a heterostructured photodetector.

In this work, an amorphous (In0.23Ga0.77)2O3/bixbyite (In0.67Ga0.33)2O3 heterostructured photodetector [a-(In0.23Ga0.77)2O3/b-(In0.67Ga0.33)2O3 PDs] has been prepared using magnetron sputtering, which exhibits excellent self-powered solar-blind ultraviolet detection performance. The peak wavelength of the photodetector can be adjusted by changing the thickness of the a-(In0.23Ga0.77)2O3 layer. This work has verified the feasibility of the (InxGa1−x)2O3 ternary alloy heterojunction with different compositions, providing new ideas for the design of (InxGa1−x)2O3 heterostructured self-powered solar-blind ultraviolet detectors.

A heterostructure with different In concentrations (InxGa1−x)2O3 was prepared using magnetron sputtering. Before sputtering, the base vacuum chamber pressure was depressed to 6 × 10−4 Pa, and the target-substrate distance was kept at 10 cm. First, a layer of the (In0.67Ga0.33)2O3 film was deposited on a single-side polished c-plane sapphire substrate. During sputtering, the substrate was heated under 600 °C to fabricate bixbyite (In0.67Ga0.33)2O3 (b-(In0.67Ga0.33)2O3). Then, a mask was used to cover a part of the film, and a layer of an amorphous (In0.23Ga0.77)2O3 [a-(In0.23Ga0.77)2O3] film was grown. During deposition for a-(In0.23Ga0.77)2O3 and b-(In0.67Ga0.33)2O3, sputtering power was kept at 100 W, while sputtering pressure was maintained at 1.0 Pa, with O2 and Ar gas mixed with flow rates of 8 and 40 SCCM, as reported in our previous works.23,24 Finally, a semitransparent Au and In electrode with a diameter of ∼3 mm was deposited on the a-(In0.23Ga0.77)2O3 and b-(In0.67Ga0.33)2O3 films, respectively, using vacuum evaporation, thus constructing the a-(In0.23Ga0.77)2O3/b-(In0.67Ga0.33)2O3 heterojunction photodetector.

The crystal structure and quality of the (InxGa1−x)2O3 films were investigated by x-ray diffraction (XRD, Rigaku D/max-2600/PC) using Cu-Kα radiation (λ = 0.15418 nm). The film thicknesses were analyzed by using a scanning electron microscope (SEM, Hitachi, SU70). The optical transmittance spectra were characterized by using a TU-1901 double-beam UV-vis spectrophotometer. The compositions of the films were obtained by x-ray photoelectron spectroscopy (XPS, ThermoFisher, ESCLAB 250Xi). The photoelectric test system, comprising a Xe lamp, a monochromator, an optical chopper, and the FS-pro380 semiconductor analyzer, was used to measure the light response of the devices (I-V and I-t characteristics).

The a-(In0.23Ga0.77)2O3/b-(In0.67Ga0.33)2O3 heterojunction formed on the sapphire substrate is a bixbyite phase (In0.67Ga0.33)2O3 and amorphous (In0.23Ga0.77)2O3, determined by XRD (JCPDS, No. 06-0416) and shown in Fig. 1(a). Because of the concentration of In in the (In0.67Ga0.33)2O3 film is greater than 50%, the formation enthalpy of the monoclinic phase is larger than that of the bixbyite phase. Thus, (In0.67Ga0.33)2O3 films could only form a bixbyite structure, which is consistent with previous research studies.25,26 The obtained heterojunction has a thickness of 350 nm for a-(In0.23Ga0.77)2O3 and 280 nm for b-(In0.67Ga0.33)2O3 estimated from the cross-sectional FE-SEM image of the heterojunction, as shown in Fig. 1(b). The a-(In0.23Ga0.77)2O3 shows a strong absorption in the solar-blind ultraviolet region and b-(In0.67Ga0.33)2O3 shows obvious absorption in the ultraviolet-visible region, as indicated in Fig. 1(c). The bandgap of the (InxGa1−x)2O3 films was calculated by extrapolating the linear region of the plot of (αhν)2 versus hν and taking into account the intercept on the hν-axis, as shown in Fig. 1(d). The estimated bandgap was about 4.06 eV for b-(In0.67Ga0.33)2O3 and 4.84 eV for a-(In0.23Ga0.77)2O3.

FIG. 1.

(a) X-ray diffraction patterns of the (InxGa1−x)2O3 thin films; (b) cross-sectional FE-SEM image of the heterojunction; (c) transmittance spectra of the (InxGa1−x)2O3 thin films; (d) optical bandgap of the (InxGa1−x)2O3 thin films by Tauc-plot.

FIG. 1.

(a) X-ray diffraction patterns of the (InxGa1−x)2O3 thin films; (b) cross-sectional FE-SEM image of the heterojunction; (c) transmittance spectra of the (InxGa1−x)2O3 thin films; (d) optical bandgap of the (InxGa1−x)2O3 thin films by Tauc-plot.

Close modal

The structure of the a-(In0.23Ga0.77)2O3/b-(In0.67Ga0.33)2O3 heterojunction photodetector is shown in Fig. 2(a). The I-V curves of Au-(In0.23Ga0.77)2O3 and In-(In0.67Ga0.33)2O3 contacts are shown in Fig. 2(b) with a linear relationship, indicating that Au and a-(In0.23Ga0.77)2O3 as well as In and b-(In0.67Ga0.33)2O3 are ohmic contacts. Figures 2(c) and 2(d) present significant rectification characteristics of I-V curves for the photodetector under dark and solar-blind ultraviolet light illumination conditions with a self-powered characteristic. The photocurrent of the photodetector is 35 nA under 280 nm light illumination at zero bias, and the photo-to-dark current ratio (PDCR) is 158, indicating that the a-(In0.23Ga0.77)2O3/b-(In0.67Ga0.33)2O3 heterojunction detector exhibits excellent self-powered detection performance.

FIG. 2.

(a) Schematic graph of the a-(In0.23Ga0.77)2O3/b-(In0.67Ga0.33)2O3 heterojunction photodetector; (b) Ohmic contact of Au-amorphous (In0.23Ga0.77)2O3 and In-bixbyite (In0.67Ga0.33)2O3; (c) I-V curves of the a-(In0.23Ga0.77)2O3/b-(In0.67Ga0.33)2O3 heterojunction photodetector under dark and under 280 nm illumination; (d) self-powered characteristic of the a-(In0.23Ga0.77)2O3/b-(In0.67Ga0.33)2O3 heterojunction photodetector.

FIG. 2.

(a) Schematic graph of the a-(In0.23Ga0.77)2O3/b-(In0.67Ga0.33)2O3 heterojunction photodetector; (b) Ohmic contact of Au-amorphous (In0.23Ga0.77)2O3 and In-bixbyite (In0.67Ga0.33)2O3; (c) I-V curves of the a-(In0.23Ga0.77)2O3/b-(In0.67Ga0.33)2O3 heterojunction photodetector under dark and under 280 nm illumination; (d) self-powered characteristic of the a-(In0.23Ga0.77)2O3/b-(In0.67Ga0.33)2O3 heterojunction photodetector.

Close modal
The I-t curve of the a-(In0.23Ga0.77)2O3/b-(In0.67Ga0.33)2O3 heterojunction photodetector is shown in Fig. 3(a). The rising time (tr) and decay time (td) are defined as the times it takes for the signal from 10% to 90% and from 90% to 10% of the stabilized photocurrent value, respectively. The tr and td of the detector were 0.48 and 1.38 s, respectively, under 280 nm illumination at zero bias, indicating the self-powered nature of the detector. Furthermore, the longer td also indicates the persistent photocurrent effect in the a-(In0.23Ga0.77)2O3/b-(In0.67Ga0.33)2O3 heterojunction photodetector due to amorphous (In0.23Ga0.77)2O3.27 Compared with the minutes response time in amorphous Ga2O3-based metal–semiconductor–metal photodetectors, the a-(In0.23Ga0.77)2O3/b-(In0.67Ga0.33)2O3 heterojunction photodetector exhibited a distinct suppression of persistent photocurrent effect and improved response speed.28 The response curve of the a-(In0.23Ga0.77)2O3/b-(In0.67Ga0.33)2O3 heterojunction detector is shown in Fig. 3(b). To characterize the optoelectronic performance in detail, the responsivity (R) is defined as
(1)
where P is the light power density. R exhibits an ability of photoelectric conversion, and the maximum value is up to 5.78 mA/W at 248 nm. The solar-blind UV (248 nm)/visible light (450 nm) rejection ratio of 1.39 × 103 suggests the high spectral selectivity. Another parameter to evaluate the performance of the device in detecting weak light signals is the specific detectivity (D*) based on the following equation:
(2)
Here, the value of the D* is 1.69 × 1011 cm Hz1/2 W−1, indicating that the detector has excellent weak signal detection capability.
FIG. 3.

(a) I-t curves of the a-(In0.23Ga0.77)2O3/b-(In0.67Ga0.33)2O3 heterojunction photodetector; (b) photoresponse curve of the a-(In0.23Ga0.77)2O3/b-(In0.67Ga0.33)2O3 heterojunction photodetector.

FIG. 3.

(a) I-t curves of the a-(In0.23Ga0.77)2O3/b-(In0.67Ga0.33)2O3 heterojunction photodetector; (b) photoresponse curve of the a-(In0.23Ga0.77)2O3/b-(In0.67Ga0.33)2O3 heterojunction photodetector.

Close modal
To investigate the self-powered detection mechanism of the a-(In0.23Ga0.77)2O3/b-(In0.67Ga0.33)2O3 photodetector, XPS testing as shown in Figs. 4(a)4(c) was used to measure the core energy levels and valence band maximum (VBM) of the a-(In0.23Ga0.77)2O3, b-(In0.67Ga0.33)2O3, and a-(In0.23Ga0.77)2O3/b-(In0.67Ga0.33)2O3 interfaces. According to the Kraut method, the valence band offset ( Δ E v) of the a-(In0.23Ga0.77)2O3/b-(In0.67Ga0.33)2O3 heterojunction can be calculated using the following equation:
(3)
FIG. 4.

Core energy levels and valence band maximum (VBM) of (a) a-(In0.23Ga0.77)2O3, (b) b-(In0.67Ga0.33)2O3, and (c) a-(In0.23Ga0.77)2O3/b-(In0.67Ga0.33)2O3 interfaces; (d) energy band of the a-(In0.23Ga0.77)2O3/b-(In0.67Ga0.33)2O3 heterojunction.

FIG. 4.

Core energy levels and valence band maximum (VBM) of (a) a-(In0.23Ga0.77)2O3, (b) b-(In0.67Ga0.33)2O3, and (c) a-(In0.23Ga0.77)2O3/b-(In0.67Ga0.33)2O3 interfaces; (d) energy band of the a-(In0.23Ga0.77)2O3/b-(In0.67Ga0.33)2O3 heterojunction.

Close modal
E Ga 3 d x = 0 .23 and E In 3 d 5 / 2 x = 0 .67 are core level of Ga 3d and In 3 d 5 / 2; E VBM x = 0 .23 and E VBM x = 0 .67 are the maxima values of valence band of a-(In0.23Ga0.77)2O3 and b-(In0.67Ga0.33)2O3 thin films; Δ E CL present E In 3 d 5 / 2 inter E Ga 3 d inter. Therefore, Δ E v is calculated as 0.49 eV. The conduction band offset ( Δ E c) of the heterojunction can be calculated through the following equation:
(4)

The bandgaps of a-(In0.23Ga0.77)2O3 and b-(In0.67Ga0.33)2O3 thin films are 4.84 and 4.04 eV as shown in Fig. 1(d), respectively. Then, the calculated conduction band offset Δ E c of the a-(In0.23Ga0.77)2O3/b-(In0.67Ga0.33)2O3 heterojunction is 0.29 eV. Combined with Δ E c, Δ E v, and the bandgaps of the thin films, the energy band diagram of the a-(In0.23Ga0.77)2O3/b-(In0.67Ga0.33)2O3 heterojunction is plotted as shown in Fig. 4(d). The Fermi level of the b-(In0.67Ga0.33)2O3 thin film is higher than that of the a-(In0.23Ga0.77)2O3 thin film, and electrons in the b-(In0.67Ga0.33)2O3 thin film diffuse into the a-(In0.23Ga0.77)2O3 thin film, forming a built-in electric field from the b-(In0.67Ga0.33)2O3 thin film to the a-(In0.23Ga0.77)2O3 thin film. When incident light is irradiated into the built-in electric field region, the photogenerated electrons and holes separate and drift toward the b-(In0.67Ga0.33)2O3 thin film and the a-(In0.23Ga0.77)2O3 thin film under the driven by built-in field, respectively, which leads to excellent solar-blind ultraviolet self-powered detection performance.

In self-powered detectors, the built-in electric field can separate photogenerated electron-hole pairs, making it an effective light absorption region for the detector as follows:
(5)
which shows the relationship between the width of the built-in electric field and the carrier concentration.29–31 As the carrier concentration increases, the width of the built-in electric field in the film decreases. The carrier concentration of the b-(In0.67Ga0.33)2O3 thin film is approximately 1017 cm−3, while the a-(In0.23Ga0.77)2O3 film is high resistance, as determined by Hall measurement.

Due to the bandgap of amorphous (In0.23Ga0.77)2O3 could be adjusted by film thickness, a-(In0.23Ga0.77)2O3/b-(In0.67Ga0.33)2O3 heterojunction detectors containing different thicknesses of a-(In0.23Ga0.77)2O3 were prepared, as shown in Figs. 5(a)5(d). The thicknesses of the a-(In0.23Ga0.77)2O3 thin films were approximately 223, 350, 416, and 522 nm, respectively, by adjusting different growth time. The response spectra of a-(In0.23Ga0.77)2O3/b-(In0.67Ga0.33)2O3 heterojunction detectors are shown in Figs. 5(e)5(h). The peak responsivities of the heterojunction detectors with different thicknesses of a-(In0.23Ga0.77)2O3 films are 3.73, 5.78, 0.31, and 0.03 mA/W, respectively. It can be seen that when the thickness of the a-(In0.23Ga0.77)2O3 thin film increases from 223 to 350 nm, the peak responsivity of the detector increases. However, when the thickness of the a-(In0.23Ga0.77)2O3 film further increases to 416 and 522 nm, the peak responsivity of the detector decreases significantly, only 5.4% and 0.5% of the responsivity of the detector with 350 nm-thickness a-(In0.23Ga0.77)2O3 film. Besides the influence of a-(In0.23Ga0.77)2O3 thickness on responsivity, the peak wavelength of the heterojunction detectors also shifts to longer wavelength, respectively, 240, 248, 260, and 272 nm for the thickness of a-(In0.23Ga0.77)2O3 with 223, 350, 416, and 522 nm.

FIG. 5.

Cross section graphs of SEM of a-(In0.23Ga0.77)2O3 with a film thickness of (a) 223, (b) 350, (c) 416, and (d) 522 nm; the responsivity of heterojunction photodetectors of a-(In0.23Ga0.77)2O3 with a film thickness of (e) 223, (f) 350, (g) 416, and (h) 522 nm.

FIG. 5.

Cross section graphs of SEM of a-(In0.23Ga0.77)2O3 with a film thickness of (a) 223, (b) 350, (c) 416, and (d) 522 nm; the responsivity of heterojunction photodetectors of a-(In0.23Ga0.77)2O3 with a film thickness of (e) 223, (f) 350, (g) 416, and (h) 522 nm.

Close modal

To explain its mechanism, the schematic diagrams of the built-in electric field distribution in the a-(In0.23Ga0.77)2O3/b-(In0.67Ga0.33)2O3 heterojunction with different thicknesses of a-(In0.23Ga0.77)2O3 thin films are shown in Fig. 6. The effective absorption thickness of the detector increases, and the peak responsivity of the detector increases from 3.73 to 5.78 mA/W, which indicates that the 223 nm film thickness of a-(In0.23Ga0.77)2O3 film is entirely within the built-in electric field region, as shown in Fig. 6(a). When the thickness of the a-(In0.23Ga0.77)2O3 film is further increased, the responsivity of the detector decreases sharply, which indicates that 416 and 552 nm have exceeded the critical thickness. It demonstrates that the nonbuilt-in electric field region already exceeds the critical thickness and weakens the light entering the built-in electric field region by acting as a natural filter, as shown in Figs. 6(c) and 6(d), resulting in the peak responsivity of the detector decreases.

FIG. 6.

Schematic diagrams of the built-in electric field distribution in the a-(In0.23Ga0.77)2O3/b-(In0.67Ga0.33)2O3 heterojunction with different thicknesses of a-(In0.23Ga0.77)2O3 thin films of (a) 223, (b) 350, (c) 416, and (d) 522 nm.

FIG. 6.

Schematic diagrams of the built-in electric field distribution in the a-(In0.23Ga0.77)2O3/b-(In0.67Ga0.33)2O3 heterojunction with different thicknesses of a-(In0.23Ga0.77)2O3 thin films of (a) 223, (b) 350, (c) 416, and (d) 522 nm.

Close modal

A self-powered solar-blind ultraviolet photodetector based on (InxGa1−x)2O3 alloy heterojunction with different indium composition and various crystal phase was presented. The a-(In0.23Ga0.77)2O3/b-(In0.67Ga0.33)2O3 detector exhibits an excellent solar-blind selectivity and self-powered detection performance with a responsivity of 5.78 mA/W and a detectivity of 1.69 × 1011 cm Hz1/2 W−1 under 248 nm illumination. Besides, the peak responsivity of the a-(In0.23Ga0.77)2O3/b-(In0.67Ga0.33)2O3 detectors could be shifted from 240m to 272 nm with enhanced film thickness from 223 to 522 nm of a-(In0.23Ga0.77)2O3, indicating the influence of a-(In0.23Ga0.77)2O3 film thickness on the performance of a-(In0.23Ga0.77)2O3/b-(In0.67Ga0.33)2O3 detectors. Thus, this work provides a new strategy to achieve a broadband a-(In0.23Ga0.77)2O3/b-(In0.67Ga0.33)2O3 ultraviolet photodetector with flexible and easy fabrication.

This work was financially supported by the National Key Research and Development Program of China (Nos. 2019YFA0705201 and 2019YFA0705204) and the National Natural Science Foundation of China (Grant No. 62174042).

The authors have no conflicts to disclose.

Yiyin Nie and Hongliang Lu contributed equally to this work.

Yiyin Nie: Data curation (equal); Formal analysis (equal); Investigation (equal); Writing – original draft (equal). Hongliang Lu: Data curation (equal); Formal analysis (equal); Investigation (equal). Shujie Jiao: Conceptualization (lead); Data curation (equal); Formal analysis (equal); Funding acquisition (equal); Investigation (equal); Methodology (equal); Project administration (equal); Resources (equal); Supervision (lead); Validation (equal); Writing – original draft (equal); Writing – review & editing (lead). Xianghu Wang: Conceptualization (equal); Data curation (equal); Resources (equal); Validation (equal); Writing – original draft (equal). Song Yang: Formal analysis (equal); Writing – review & editing (equal). Dongbo Wang: Formal analysis (equal); Writing – review & editing (equal). Shiyong Gao: Formal analysis (equal); Investigation (equal); Visualization (equal). Zhendong Fu: Formal analysis (equal); Investigation (equal); Visualization (equal). Aimin Li: Formal analysis (equal); Investigation (equal); Visualization (equal). Jinzhong Wang: Funding acquisition (lead); Methodology (equal); Project administration (lead); Supervision (equal).

The data that support the findings of this study are available from the corresponding authors upon reasonable request.

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