Transmissive multilayer optics have a potential application in the development of high‐resolution x‐ray microscope and spectrometer systems. Difficulties encountered in the sputter deposition of these multilayer optical structures can be overcome by careful control of the fabrication parameters. The deleterious effects of compressive or tensile intrinsic stresses can be minimized by optimizing both substrate temperature and working gas pressure during the deposition process. This study specifically considers the Al/Ta multilayer combination.

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