Summary Abstract: Surface analysis of amorphous Ta–Cu thin films deposited on GaAs

Pouch, J. J.; Alterovitz, S. A.; Woollam, J. A.; Oh, J. E.

doi:10.1116/1.575045

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Dissertation| May 01 1988

Summary Abstract: Surface analysis of amorphous Ta–Cu thin films deposited on GaAs

J. J. Pouch;

J. J. Pouch

NASA Lewis Research Center, Cleveland, Ohio 44135

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S. A. Alterovitz;

S. A. Alterovitz

NASA Lewis Research Center, Cleveland, Ohio 44135

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J. A. Woollam;

J. A. Woollam

Department of Electrical Engineering, University of Nebraska, Lincoln, Nebraska 68588‐0511

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J. E. Oh

Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, Michigan 48109‐2122

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J. Vac. Sci. Technol. A 6, 983–984 (1988)

https://doi.org/10.1116/1.575045

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Summary Abstract: Surface analysis of amorphous Ta–Cu thin films deposited on GaAs

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