Multispectral zinc sulfide (MS-ZnS) is an important broadband optical material used in various imaging and sensing technologies. To address the challenge of withstanding aerodynamic loads during operational use, surface hardening treatments of MS-ZnS using Ga2S3 have demonstrated effectiveness while preserving optimal optical properties. Secondary ion mass spectrometry (SIMS) is particularly well-suited for analyzing Ga incorporation in the subsurface of post-treated ZnS windows. Herein, we report the determination of the relative sensitivity factor (RSF) for Ga in a ZnS matrix to calibrate Ga concentration profiles. The RSFs of 69Ga in ZnS were obtained from multiple SIMS measurements on three 69Ga-implanted ZnS coupons at doses of 0.5 × 1015, 2.5 × 1015, and 5.1 × 1015 (at. cm−2). We found that the elemental RSF values are 1.78 × 1020 (±17%), 1.76 × 1020 (±21%), and 1.48 × 1020 (±13%) (at.  cm−3), indicating a proportional relationship with the amount of Ga as deduced from standard analysis versus the ratio of 69Ga and 64Zn count rates. These RSF determinations provide a reliable tool for analytical and process optimization purposes.

1.
H.
Soufiani
,
A.
Kostogiannes
,
C. R.
Baleine
,
K. A.
Richardson
, and
R.
Gaume
,
Proceedings of 2023 Window and Dome Technologies and Materials XVII Conference
,
Orlando, FL
,
2–4 May (SPIE Digital Library, 2023)
.
2.
A. A.
Galuska
and
G. H.
Morrison
,
Pure Appl. Chem.
59
,
229
(
1987
).
3.
A.
Laufer
,
N.
Volbers
,
S.
Eisermann
,
K.
Potzger
,
S.
Geburt
,
C.
Ronning
, and
B. K.
Meyer
,
J. Appl. Phys.
110
,
094906
(
2011
).
4.
L. J.
Cabri
and
G.
Momahon
,
Canad. Mineral.
33
,
349
(
1995
).
5.
F. A.
Stevie
,
Secondary Ion Mass Spectrometry Applications for Depth Profiling and Surface Characterization
(
Momentum, LLC
,
New York
,
2016
).
6.
D. L.
Phinney
, in
9th European Workshop on Modern Developments & Applications in Microbeam Analysis
,
Florence, Italy
(European Materials Research Society,
2005
).
7.
8.
H. W.
Werner
,
Surf. Interface Anal.
2
,
56
(
1980
).
9.
R. G.
Wilson
and
S. W.
Novak
,
J. Appl. Phys.
69
,
466
(
1991
).
10.
ASTM E 1505-92 (American Society for Testing and Materials
, Conshohocken, PA, 2001).
11.
R. G.
Wilson
,
F. A.
Stevie
, and
C. W.
Magee
, “
Quantification
,” in
Secondary ion Mass Spectrometry: A Practical Handbook for Depth Profiling and Bulk Impurity Analysis
(
Wiley
,
New York
,
1989
), Vol. 86.
12.
J. F.
Ziegler
and
J. P.
Biersack
,
SRIM
(
2013 SRIM Co.
,
Chester, MD
,
2013
).
13.
P. E. Inc.
,
SIMetric
(
1.5.1.6 Physical Electronics Inc.
,
Chigasaki, Japan, 2005)
.
14.
R. C. J.
Steele
,
V. S.
Heber
, and
K. D.
McKeegana
,
GCA
201
,
245
(
2016
).
15.
W. H.
Gries
, “
Quantitative ion implantation
,”
Ph.D. thesis
(
The University of Stellenbosch
,
1976
).
16.
J. A.
Kilner
,
G. P.
Beyer
, and
R. J.
Chater
,
Nucl. Instrum. Methods Phys. Res., B
84
, 176 (
1994
).
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