The impact of electrode spacing, power supply voltage, radio frequency, and gas pressure on capacitively coupled plasma discharge under both weak and strong magnetic fields is investigated by using a one-dimensional implicit particle-in-cell/Monte Carlo collision simulation. Simulation results indicate that under both weak and strong magnetic field conditions, plasma density increases with the increase in these discharge parameters. However, the principle of density increase under weak and strong magnetic field conditions is slightly different. The strong magnetic field plays a crucial role in strongly constraining electrons. Under weak magnetic field conditions, the mutual transition between stochastic heating and ohmic heating can be observed, while under strong magnetic field conditions, ohmic heating predominantly prevails. Furthermore, the simulation results also indicate that a strong magnetic field can effectively reduce the voltage threshold for the transition from the mode to the mode. The strong magnetic field strongly confines secondary electrons near the sheath, allowing them to interact multiple times with the sheath and acquire higher energy, thereby making the mode more likely to occur.
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September 2024
Research Article|
September 04 2024
Numerical study of the effects of discharge parameters on capacitively coupled plasma in a magnetic field
Minghan Yan
;
Minghan Yan
(Writing – original draft)
1
College of Science, University of Shanghai for Science and Technology
, Shanghai 200093, China
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Huanhuan Wu
;
Huanhuan Wu
(Writing – original draft)
1
College of Science, University of Shanghai for Science and Technology
, Shanghai 200093, China
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Hao Wu
;
Hao Wu
(Writing – original draft)
2
School of Electronics and Information Engineering, Hubei University of Science and Technology
, Xianning 437100, China
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Yanli Peng
;
Yanli Peng
(Writing – original draft)
3
School of Science, East China University of Technology
, Nanchang 330013, China
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Shali Yang
Shali Yang
a)
(Writing – original draft)
1
College of Science, University of Shanghai for Science and Technology
, Shanghai 200093, China
a)Author to whom correspondence should be addressed: yangshali@usst.edu.cn
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a)Author to whom correspondence should be addressed: yangshali@usst.edu.cn
J. Vac. Sci. Technol. A 42, 053007 (2024)
Article history
Received:
April 16 2024
Accepted:
August 12 2024
Citation
Minghan Yan, Huanhuan Wu, Hao Wu, Yanli Peng, Shali Yang; Numerical study of the effects of discharge parameters on capacitively coupled plasma in a magnetic field. J. Vac. Sci. Technol. A 1 September 2024; 42 (5): 053007. https://doi.org/10.1116/6.0003692
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