A high-density hydrogen plasma with a plasma density higher than 1010 cm−3 is produced by a radio-frequency magnetized capacitively coupled discharge using a hollow cathode, i.e., a cylindrical hole inside the powered electrode surrounded by eight cylindrical neodymium magnets. The magnetic field is calculated to discuss the electron magnetization, i.e., the Hall parameter and Larmor radius of electrons. It is found that for 3 Pa of hydrogen gas pressure the maximum of plasma density estimated from the ion saturation current measured by a Langmuir probe at the center of the hollow trench, which is surrounded by the magnets, is approximately 1.7 times higher than that without the magnets. The addition of magnets results in an expansion of the high-density plasma region inside the trench. The uniformity of the radial profile of the plasma density is better in the presence of the magnets than that without the magnets.
Skip Nav Destination
Production of a high-density hydrogen plasma in a capacitively coupled RF discharge with a hollow cathode enclosed by magnets
,
,
,
Article navigation
Research Article|
April 18 2024
Production of a high-density hydrogen plasma in a capacitively coupled RF discharge with a hollow cathode enclosed by magnets
Yasunori Ohtsu
;
Yasunori Ohtsu
a)
(Writing – original draft)
1
Department of Electrical and Electronic Engineering, Saga University
, 1 Honjo-machi, Saga 840-8502, Japan
a)Author to whom correspondence should be addressed: [email protected]
Search for other works by this author on:
Takeshi Uchida
;
Takeshi Uchida
(Formal analysis)
1
Department of Electrical and Electronic Engineering, Saga University
, 1 Honjo-machi, Saga 840-8502, Japan
Search for other works by this author on:
Ryohei Kuno
;
Ryohei Kuno
(Data curation)
1
Department of Electrical and Electronic Engineering, Saga University
, 1 Honjo-machi, Saga 840-8502, Japan
Search for other works by this author on:
Julian Schulze
Julian Schulze
(Writing – review & editing)
2
Chair of Applied Electrodynamics and Plasma Technology, Ruhr-University Bochum
, Bochum D-44780, Germany
Search for other works by this author on:
Yasunori Ohtsu
1,a)
Takeshi Uchida
1
Ryohei Kuno
1
Julian Schulze
2
1
Department of Electrical and Electronic Engineering, Saga University
, 1 Honjo-machi, Saga 840-8502, Japan
2
Chair of Applied Electrodynamics and Plasma Technology, Ruhr-University Bochum
, Bochum D-44780, Germany
a)Author to whom correspondence should be addressed: [email protected]
J. Vac. Sci. Technol. A 42, 033011 (2024)
Article history
Received:
January 11 2024
Accepted:
March 27 2024
Citation
Yasunori Ohtsu, Takeshi Uchida, Ryohei Kuno, Julian Schulze; Production of a high-density hydrogen plasma in a capacitively coupled RF discharge with a hollow cathode enclosed by magnets. J. Vac. Sci. Technol. A 1 May 2024; 42 (3): 033011. https://doi.org/10.1116/6.0003448
Download citation file:
Pay-Per-View Access
$40.00
Sign In
You could not be signed in. Please check your credentials and make sure you have an active account and try again.
Citing articles via
Machine-learning-enabled on-the-fly analysis of RHEED patterns during thin film deposition by molecular beam epitaxy
Tiffany C. Kaspar, Sarah Akers, et al.
Recent trends in thermal atomic layer deposition chemistry
Georgi Popov, Miika Mattinen, et al.
Low-resistivity molybdenum obtained by atomic layer deposition
Kees van der Zouw, Bernhard Y. van der Wel, et al.
Related Content
Characteristics of a hybrid radio frequency capacitively and inductively coupled plasma using hydrogen gas
J. Vac. Sci. Technol. B (July 2024)
Temporal evolution of the ion flux to the target in rotational RF multimagnetron plasma
J. Vac. Sci. Technol. A (August 2022)
Vacuum ultraviolet-absorption spectroscopy and delocalized plasma-induced emission used for the species detection in a down-stream soft-etch plasma reactor
J. Vac. Sci. Technol. A (June 2020)