A high-density hydrogen plasma with a plasma density higher than 1010 cm−3 is produced by a radio-frequency magnetized capacitively coupled discharge using a hollow cathode, i.e., a cylindrical hole inside the powered electrode surrounded by eight cylindrical neodymium magnets. The magnetic field is calculated to discuss the electron magnetization, i.e., the Hall parameter and Larmor radius of electrons. It is found that for 3 Pa of hydrogen gas pressure the maximum of plasma density estimated from the ion saturation current measured by a Langmuir probe at the center of the hollow trench, which is surrounded by the magnets, is approximately 1.7 times higher than that without the magnets. The addition of magnets results in an expansion of the high-density plasma region inside the trench. The uniformity of the radial profile of the plasma density is better in the presence of the magnets than that without the magnets.
Skip Nav Destination
Article navigation
Research Article|
April 18 2024
Production of a high-density hydrogen plasma in a capacitively coupled RF discharge with a hollow cathode enclosed by magnets
Yasunori Ohtsu
;
Yasunori Ohtsu
a)
(Writing – original draft)
1
Department of Electrical and Electronic Engineering, Saga University
, 1 Honjo-machi, Saga 840-8502, Japan
a)Author to whom correspondence should be addressed: ohtsuy@cc.saga-u.ac.jp
Search for other works by this author on:
Takeshi Uchida
;
Takeshi Uchida
(Formal analysis)
1
Department of Electrical and Electronic Engineering, Saga University
, 1 Honjo-machi, Saga 840-8502, Japan
Search for other works by this author on:
Ryohei Kuno
;
Ryohei Kuno
(Data curation)
1
Department of Electrical and Electronic Engineering, Saga University
, 1 Honjo-machi, Saga 840-8502, Japan
Search for other works by this author on:
Julian Schulze
Julian Schulze
(Writing – review & editing)
2
Chair of Applied Electrodynamics and Plasma Technology, Ruhr-University Bochum
, Bochum D-44780, Germany
Search for other works by this author on:
a)Author to whom correspondence should be addressed: ohtsuy@cc.saga-u.ac.jp
J. Vac. Sci. Technol. A 42, 033011 (2024)
Article history
Received:
January 11 2024
Accepted:
March 27 2024
Citation
Yasunori Ohtsu, Takeshi Uchida, Ryohei Kuno, Julian Schulze; Production of a high-density hydrogen plasma in a capacitively coupled RF discharge with a hollow cathode enclosed by magnets. J. Vac. Sci. Technol. A 1 May 2024; 42 (3): 033011. https://doi.org/10.1116/6.0003448
Download citation file:
Sign in
Don't already have an account? Register
Sign In
You could not be signed in. Please check your credentials and make sure you have an active account and try again.
Pay-Per-View Access
$40.00
340
Views
Citing articles via
Low-resistivity molybdenum obtained by atomic layer deposition
Kees van der Zouw, Bernhard Y. van der Wel, et al.
Many routes to ferroelectric HfO2: A review of current deposition methods
Hanan Alexandra Hsain, Younghwan Lee, et al.
Observation of an abrupt 3D-2D morphological transition in thin Al layers grown by MBE on InGaAs surface
A. Elbaroudy, B. Khromets, et al.