The one-step deposition of spatially differentiated crystalline vanadium oxide coatings (V2O5) using an atmospheric pressure dielectric barrier discharge is reported. This feasibility study uses an original combination of immobilized filaments inside the plasma and an inductive heating device. Preliminary results show that thick crystalline deposits are achieved under the immobilized filaments, whether the interfilament spacing leads to much thinner deposits, with a different chemical composition. The gas flow inside the reactor, combined to the filament reactivity, leads to local depletions of reactants.

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