Molecular gas species for gas cluster ion beams (GCIBs), such as carbon dioxide and water, were examined with a range of beam energies and cluster sizes to compare with the “universal relation” of the sputter yield, Y, per cluster atom against incident beam energy, E, per cluster atom of Arn cluster beam using Irganox 1010. In this work, we compare Arn, (CO2)n, and (H2O)n gas clusters to the universal equations for Arn clusters. To discuss molecular gas species for GCIBs, energy per nucleon (E/N) needs to replace energy per atom. We monitored sputter rate, depth resolution, and secondary ion yield as a function of the beam parameters: gas species, beam energy, and cluster size. (H2O)n GCIB shows reduced sputter rates and improved depth resolution with high sensitivity compared to Arn and (CO2)n GCIBs. These initial results indicate the potential to achieve high-depth resolution with high sensitivity and suggest that (H2O)n cluster ion beam has the potential to play a significant role in surface analysis techniques with organic materials. Results also show that no single set of conditions will provide the “best gas cluster ion beam” for all applications. However, it is possible to choose a set of conditions that will be more or less optimal depending on the experimental goals, such as maximizing the sputter rate, depth resolution, and molecular ion yield. In this work, we recommend the following three guidelines for GCIB users to set their own conditions: (1) to maximize the sputter rate, select a smaller cluster (higher E/N), but be aware that this will increase fragmentation and reduce molecular ion yield; (2) to maximize the depth resolution, select a larger cluster (lower E/N), and use (H2O)n GCIB, if possible; and (3) to maximize the molecular ion signal, use the highest beam energy available, and select a cluster with 0.15–0.25 eV/nucleon for Ar and (CO2)n GCIBs or around 0.1 eV/nucleon if using (H2O)n GCIB. These results are valid for XPS, SIMS, and any technique that utilizes GCIBs.
Skip Nav Destination
Comparing sputter rates, depth resolution, and ion yields for different gas cluster ion beams (GCIB): A practical guide to choosing the best GCIB for every application
Article navigation
September 2023
Research Article|
July 28 2023
Comparing sputter rates, depth resolution, and ion yields for different gas cluster ion beams (GCIB): A practical guide to choosing the best GCIB for every application
N. Sano
;
N. Sano
a)
(Data curation, Formal analysis, Project administration, Validation, Visualization, Writing – original draft)
Ionoptika Ltd.
, Unit B6, Millbrook Close, Chandler’s Ford, Eastleigh SO53 4BZ, United Kingdom
a)Author to whom correspondence should be addressed: [email protected]
Search for other works by this author on:
A. Bellew
;
A. Bellew
(Supervision, Writing – review & editing)
Ionoptika Ltd.
, Unit B6, Millbrook Close, Chandler’s Ford, Eastleigh SO53 4BZ, United Kingdom
Search for other works by this author on:
P. Blenkinsopp
P. Blenkinsopp
(Supervision, Writing – review & editing)
Ionoptika Ltd.
, Unit B6, Millbrook Close, Chandler’s Ford, Eastleigh SO53 4BZ, United Kingdom
Search for other works by this author on:
a)Author to whom correspondence should be addressed: [email protected]
J. Vac. Sci. Technol. A 41, 053204 (2023)
Article history
Received:
June 01 2023
Accepted:
July 12 2023
Citation
N. Sano, A. Bellew, P. Blenkinsopp; Comparing sputter rates, depth resolution, and ion yields for different gas cluster ion beams (GCIB): A practical guide to choosing the best GCIB for every application. J. Vac. Sci. Technol. A 1 September 2023; 41 (5): 053204. https://doi.org/10.1116/6.0002864
Download citation file:
Pay-Per-View Access
$40.00
Sign In
You could not be signed in. Please check your credentials and make sure you have an active account and try again.
Citing articles via
Low-resistivity molybdenum obtained by atomic layer deposition
Kees van der Zouw, Bernhard Y. van der Wel, et al.
Low-temperature etching of silicon oxide and silicon nitride with hydrogen fluoride
Thorsten Lill, Mingmei Wang, et al.
Related Content
Ar-gas cluster ion beam in ToF-SIMS for peptide and protein analysis
Biointerphases (April 2020)
Improved mass resolution and mass accuracy in TOF-SIMS spectra and images using argon gas cluster ion beams
Biointerphases (February 2016)
Applications of ToF-SIMS for imaging and depth profiling commercial materials
J. Vac. Sci. Technol. B (April 2016)
X-ray enhanced sputter rates in argon cluster ion sputter-depth profiling of polymers
J. Vac. Sci. Technol. B (February 2013)
ToF-SIMS analysis of ion implanted standard to quantify insecticide in mosquito netting with cesium and argon gas cluster sputtering beams
J. Vac. Sci. Technol. B (February 2018)