Trends in device miniaturization have driven the adoption of new materials that, in turn, have enabled significant advancements in the field of process engineering and integration for semiconductor technology. Continued progress for device scaling is necessary and can be enabled by advances in lithographic techniques and deposition schemes. Thin-film deposition for spacers and etch stop layers has become a mainstay to enable and extend traditional 2D scaling into the 3D realm for fabricating advanced semiconductor devices. For processing 3D structures, controlled film deposition with subnanometer resolution in high aspect ratio features is desired. Area selective deposition (ASD) can be a powerful response to such a challenge. ASD is a type of thin-film deposition technique scheme that can be used to eliminate the need for several expensive and time-consuming lithography steps with fewer performance penalties. In this work, we show ASD of ruthenium (Ru) on 3D molybdenum (Mo)–silicon oxide (SiO2) stacks by utilizing the inherent substrate preference of the Ru precursor to a H-terminated surface. In the best selectivity condition, our results show growth of ∼5 nm Ru on Mo, with no film growth on SiO2. Changes in Ru growth kinetics were observed after dilute hydrofluoric acid (DHF) treatment for both surfaces. Post-DHF treatment, the Ru growth rate on Mo was reduced by 5%. However, on SiO2 (after incubation delay), the growth rate was reduced by 94% compared to untreated surfaces. This translates to a very high difference in the growth rate of Ru on Mo vs SiO2, even after considering the incubation delay. Finally, by using 3D topologies with high aspect ratio holes, we have highlighted that it is important to deconvolute the effects of precursor depletion and selectivity. To the best of our knowledge, this is the first demonstration of ASD of Ru on 3D structures without the use of any blocking layers. Therefore, these results demonstrate a new paradigm for ASD in 3D features.
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Area selective deposition of ruthenium on 3D structures
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December 2022
Research Article|
November 17 2022
Area selective deposition of ruthenium on 3D structures
Special Collection:
Area Selective Deposition
Kartik Sondhi
;
Kartik Sondhi
(Data curation, Investigation, Methodology, Software, Writing – original draft, Writing – review & editing)
1
Silicon Technology and Manufacturing, Western Digital
, Milpitas, California 95035
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Rahul Sharangpani
;
Rahul Sharangpani
(Conceptualization, Funding acquisition, Investigation, Methodology, Project administration, Supervision, Writing – original draft, Writing – review & editing)
1
Silicon Technology and Manufacturing, Western Digital
, Milpitas, California 95035
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Ramy Nashed Bassely Said
;
Ramy Nashed Bassely Said
(Conceptualization, Investigation, Methodology, Writing – original draft, Writing – review & editing)
1
Silicon Technology and Manufacturing, Western Digital
, Milpitas, California 95035
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Joyeeta Nag
;
Joyeeta Nag
(Investigation, Methodology, Writing – review & editing)
2
Non-Volatile Memory Research, Western Digital
, San Jose, California 95119
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Michael Gribelyuk
;
Michael Gribelyuk
(Investigation)
3
Analytical Sciences Laboratory, Western Digital
, San Jose, California 95119
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Senaka Kanakamedala
;
Senaka Kanakamedala
(Investigation, Methodology, Writing – review & editing)
1
Silicon Technology and Manufacturing, Western Digital
, Milpitas, California 95035
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Raghuveer S. Makala
Raghuveer S. Makala
a)
(Conceptualization, Funding acquisition, Investigation, Project administration, Supervision, Writing – review & editing)
1
Silicon Technology and Manufacturing, Western Digital
, Milpitas, California 95035a)Author to whom correspondence should be addressed: raghuveer.makala@wdc.com
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a)Author to whom correspondence should be addressed: raghuveer.makala@wdc.com
Note: This paper is a part of the Special Topic Collection on Area Selective Deposition.
J. Vac. Sci. Technol. A 40, 062412 (2022)
Article history
Received:
August 08 2022
Accepted:
November 01 2022
Citation
Kartik Sondhi, Rahul Sharangpani, Ramy Nashed Bassely Said, Joyeeta Nag, Michael Gribelyuk, Senaka Kanakamedala, Raghuveer S. Makala; Area selective deposition of ruthenium on 3D structures. J. Vac. Sci. Technol. A 1 December 2022; 40 (6): 062412. https://doi.org/10.1116/6.0002148
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