AlN and Al2O3 multilayer films intended as moisture barriers were deposited on polyethylene naphthalate films by remote-type plasma-enhanced atomic layer deposition. The deposition temperatures for AlN and Al2O3 were 160 and 20 °C, respectively. It was assumed that the AlN and Al2O3 interface would suppress the formation of dislocations and pinholes that lead to moisture diffusion. The AlN top layer was expected to act as a water-resistant layer. The surface morphology and the crystallinity of the deposited film were investigated by atomic force microscopy (AFM) and x-ray diffraction, respectively. The gas barrier property of the multilayer film was determined by the water vapor transmission rate, which was measured as 1.3 × 10−3 g/m2/day at a temperature of 40 °C and a relative humidity (RH) of 90%. The AFM image showed that the AlN top layer remained unchanged during water vapor contact for 120 h at 40 °C and 90% RH. The applicability of the multilayer film as a moisture barrier coating for compound semiconductor devices is discussed.
Moisture barrier coating of AlN and Al2O3 multilayer film prepared by low-temperature atomic layer deposition
Note: This paper is part of the 2023 Special Topic Collection on Atomic Layer Deposition (ALD).
K. Saito, K. Yoshida, M. Miura, K. Kanomata, B. Ahmmad, S. Kubota, F. Hirose; Moisture barrier coating of AlN and Al2O3 multilayer film prepared by low-temperature atomic layer deposition. J. Vac. Sci. Technol. A 1 December 2022; 40 (6): 062410. https://doi.org/10.1116/6.0002057
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