Room-temperature atomic layer deposition (RT-ALD) of iron oxide is developed with a precursor of bis(N, N′-diisopropyl-propionamidinate)iron [(DIPPA)2Fe] and plasma excited humidified Ar. Saturated conditions of (DIPPA)2Fe and plasma excited humidified Ar exposures at room temperature (23–25 °C) are investigated by in situ IR absorption spectroscopy for finding the RT-ALD process condition. Using the designated process, the growth per cycle of the iron oxide RT-ALD is confirmed as 0.15 nm/cycle based on the film thicknesses measured by the spectroscopic ellipsometer. The x-ray photoelectron spectroscopy suggests that the stoichiometry of the deposited iron oxide is closed to that of Fe2O3. The grown film is composed of partly crystallized iron oxides, confirmed by cross-sectional TEM and AFM. The RT deposited iron oxide exhibits a magnetic volume susceptibility of 1.52, which implies the applicability of the present coating for magnetic drug delivery. We discuss the surface reaction with the IR absorption spectroscopy and the quartz crystal microbalance. The (DIPPA)2Fe molecule is suggested to adsorb on the Fe2O3 surface with mixed first- and second-order reactions at RT. It is also suggested that amidinate ligands in (DIPPA)2Fe are released in the course of the adsorption and the remaining ligands are oxidized by the plasma excited humidified Ar. The RT iron oxide deposition is demonstrated, and the reaction mechanism of room-temperature ALD is discussed in this paper.
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March 2022
Research Article|
February 25 2022
Room-temperature atomic layer deposition of iron oxide using plasma excited humidified argon
Special Collection:
Atomic Layer Deposition (ALD)
Kazuki Yoshida;
Kazuki Yoshida
Graduate School of Science and Engineering, Yamagata University
, 4-3-16 Jonan, Yonezawa, Yamagata 992-8510, Japan
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Issei Nagata;
Issei Nagata
Graduate School of Science and Engineering, Yamagata University
, 4-3-16 Jonan, Yonezawa, Yamagata 992-8510, Japan
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Kentaro Saito;
Kentaro Saito
Graduate School of Science and Engineering, Yamagata University
, 4-3-16 Jonan, Yonezawa, Yamagata 992-8510, Japan
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Masanori Miura;
Masanori Miura
Graduate School of Science and Engineering, Yamagata University
, 4-3-16 Jonan, Yonezawa, Yamagata 992-8510, Japan
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Kensaku Kanomata;
Kensaku Kanomata
Graduate School of Science and Engineering, Yamagata University
, 4-3-16 Jonan, Yonezawa, Yamagata 992-8510, Japan
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Bashir Ahmmad
;
Bashir Ahmmad
Graduate School of Science and Engineering, Yamagata University
, 4-3-16 Jonan, Yonezawa, Yamagata 992-8510, Japan
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Shigeru Kubota;
Shigeru Kubota
Graduate School of Science and Engineering, Yamagata University
, 4-3-16 Jonan, Yonezawa, Yamagata 992-8510, Japan
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Fumihiko Hirose
Fumihiko Hirose
a)
Graduate School of Science and Engineering, Yamagata University
, 4-3-16 Jonan, Yonezawa, Yamagata 992-8510, Japan
a)Author to whom correspondence should be addressed: fhirose@yz.yamagata-u.ac.jp
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a)Author to whom correspondence should be addressed: fhirose@yz.yamagata-u.ac.jp
Note: This paper is part of the 2022 Special Topic Collection on Atomic Layer Deposition (ALD).
J. Vac. Sci. Technol. A 40, 022408 (2022)
Article history
Received:
November 12 2021
Accepted:
February 04 2022
Citation
Kazuki Yoshida, Issei Nagata, Kentaro Saito, Masanori Miura, Kensaku Kanomata, Bashir Ahmmad, Shigeru Kubota, Fumihiko Hirose; Room-temperature atomic layer deposition of iron oxide using plasma excited humidified argon. J. Vac. Sci. Technol. A 1 March 2022; 40 (2): 022408. https://doi.org/10.1116/6.0001622
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