Thin films of silver were deposited on nonalkali glass substrates at substrate temperatures ranging from room temperature (28 °C) to 150, 200, 300, 400, and 500 °C at discharge pressures of 0.40, 1.20, and 2.00 Pa using direct current magnetron sputtering. On the basis of the measured cross-sectional and surface morphologies, crystallographic structures, and film properties, I discuss the dependence of the film structure and properties on the substrate temperature. The x-ray diffraction measurements showed that the <111> orientation was preferred for all deposition conditions. Scanning electron microscope observations revealed a microstructure of convex-shaped fine grains for a substrate at room temperature, while laterally growing, mound-shaped grains with flat-topped surfaces appeared at substrate temperatures of 400 and 500 °C. Atomic force microscopy also showed an increase in the lateral size and height of the mound-shaped structures with increasing substrate temperature. The lateral grain size evaluated from the areal particle density obtained from atomic force microscopy increased significantly with increasing substrate temperature, reaching 600–800 nm at a substrate temperature of 500 °C. The film stress also changed from compressive to tensile with increasing substrate temperature. The relative density, defined as the ratio of the deposited amount-of-substance to the physical-thickness, decreased significantly with increasing substrate temperature and, at a substrate temperature of 500 °C, was approximately 0.6 times as large as that obtained for thin films deposited at room temperature. The high surface diffusivity of the Ag adatoms induces the growth of laterally growing, mound-shaped grains. Besides, the energy accumulated in the thin films during sputter deposition induces the void formation to increase the efficiency of energy release in the form of heat.
Skip Nav Destination
Article navigation
January 2022
Research Article|
December 08 2021
Growth of flat-topped, mound-shaped grains with voids when depositing silver thin films at high substrate temperatures using direct-current magnetron sputtering
Eiji Kusano
Eiji Kusano
a)
Advanced Material Science Center, Kanazawa Institute of Technology, Yatsukaho
, Hakusan 9240838, Japan
a)Author to whom correspondence should be addressed: [email protected]
Search for other works by this author on:
a)Author to whom correspondence should be addressed: [email protected]
J. Vac. Sci. Technol. A 40, 013410 (2022)
Article history
Received:
September 20 2021
Accepted:
November 17 2021
Citation
Eiji Kusano; Growth of flat-topped, mound-shaped grains with voids when depositing silver thin films at high substrate temperatures using direct-current magnetron sputtering. J. Vac. Sci. Technol. A 1 January 2022; 40 (1): 013410. https://doi.org/10.1116/6.0001476
Download citation file:
Pay-Per-View Access
$40.00
Sign In
You could not be signed in. Please check your credentials and make sure you have an active account and try again.
Citing articles via
Surface passivation approaches for silicon, germanium, and III–V semiconductors
Roel J. Theeuwes, Wilhelmus M. M. Kessels, et al.
Growth and optical properties of NiO thin films deposited by pulsed dc reactive magnetron sputtering
Faezeh A. F. Lahiji, Samiran Bairagi, et al.
Novel high-efficiency plasma nitriding process utilizing a high power impulse magnetron sputtering discharge
A. P. Ehiasarian, P. Eh. Hovsepian
Related Content
Dependence of film structure on the film structure-independent equivalent film thickness in magnetron sputtering deposition of Ag thin films
J. Vac. Sci. Technol. A (September 2022)
Homologous substrate-temperature dependence of structure and properties of TiO2, ZrO2, and HfO2 thin films deposited by reactive sputtering
J. Vac. Sci. Technol. A (August 2019)
Experimental explanation of the formation mechanism of surface mound-structures by femtosecond laser on polycrystalline Ni60Nb40
Appl. Phys. Lett. (January 2016)
Evolution from mono-dispersed to mound-like structures of size-selected Ag-nanocluster films
AIP Conf. Proc. (November 2020)
Thickness effect on scaling law and surface properties of nano-dimensional SnTe thin films
J. Appl. Phys. (November 2021)