Radio-frequency-sputtered CaTa4O11:Eu3+ thin films were obtained on sapphire substrates at 300 °C, with subsequent annealing at various temperatures. The CaTa4O11:Eu3+ thin films heat treated at 900 and 1000 °C exhibited a hexagonal phase with a dominant (111) peak, which is in contrast with the samples as-grown and annealed at 800 °C that exhibited an amorphous structure. The 280 nm-thick CaTa4O11:Eu3+ thin film heat treated at 900 °C exhibited numerous pebblelike particles, and the average grain size increased significantly at 1000 °C. Under 273 nm excitation, the CaTa4O11:Eu3+ thin films produced a dominant emission band at 614 nm, suggesting that the Eu3+ ions were located at sites without a center of inversion. The strongest emission intensity was observed for the thin film heat treated at 1000 °C, with a 4.48 eV bandgap. These results indicate that 1000 °C is the optimal temperature for annealing red light-emitting CaTa4O11:Eu3+ thin films.
Effect of heat treatment on the optical, structural, and morphological properties of Eu3+-doped CaTa4O11 thin films
Note: This paper is a part of the Special Collection Honoring Dr. Scott Chambers' 70th Birthday and His Leadership in the Science and Technology of Oxide Thin Films.
Shinho Cho; Effect of heat treatment on the optical, structural, and morphological properties of Eu3+-doped CaTa4O11 thin films. J. Vac. Sci. Technol. A 1 January 2022; 40 (1): 013406. https://doi.org/10.1116/6.0001440
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