Although 10 years have passed since the initial report of ferroelectricity in hafnia (HfO2), researchers are still intensely fascinated by this material system and the promise it holds for future applications. A wide variety of deposition methods have been deployed to create ferroelectric HfO2 thin films such as atomic layer deposition, chemical solution deposition, and physical vapor deposition methods such as sputtering and pulsed laser deposition. Process and design parameters such as deposition temperature, precursor choice, target source, vacuum level, reactive gases, substrate strain, and many others are often integral in stabilizing the polar orthorhombic phase and ferroelectricity. We examine processing parameters across four main different deposition methods and their effect on film microstructure, phase evolution, defect concentration, and resultant electrical properties. The goal of this review is to integrate the process knowledge collected over the past 10 years in the field of ferroelectric HfO2 into a single comprehensive guide for the design of future HfO2-based ferroelectric materials and devices.
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Many routes to ferroelectric HfO2: A review of current deposition methods
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January 2022
Review Article|
December 01 2021
Many routes to ferroelectric HfO2: A review of current deposition methods
Hanan Alexandra Hsain
;
Hanan Alexandra Hsain
1
Department of Materials Science and Engineering, North Carolina State University
, Raleigh, North Carolina 276952
NaMLab gGmbH
, Noethnitzer Str. 64a, 01187 Dresden, Germany
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Younghwan Lee
;
Younghwan Lee
1
Department of Materials Science and Engineering, North Carolina State University
, Raleigh, North Carolina 27695
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Monica Materano
;
Monica Materano
2
NaMLab gGmbH
, Noethnitzer Str. 64a, 01187 Dresden, Germany
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Terence Mittmann
;
Terence Mittmann
2
NaMLab gGmbH
, Noethnitzer Str. 64a, 01187 Dresden, Germany
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Alexis Payne
;
Alexis Payne
1
Department of Materials Science and Engineering, North Carolina State University
, Raleigh, North Carolina 276953
Sensors and Electron Devices Directorate, US CCDC Army Research Laboratory
, Adelphi, Maryland 20783
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Thomas Mikolajick
;
Thomas Mikolajick
2
NaMLab gGmbH
, Noethnitzer Str. 64a, 01187 Dresden, Germany
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Uwe Schroeder
;
Uwe Schroeder
2
NaMLab gGmbH
, Noethnitzer Str. 64a, 01187 Dresden, Germany
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Gregory N. Parsons
;
Gregory N. Parsons
4
Department of Chemical and Biomolecular Engineering, North Carolina State University
, Raleigh, North Carolina 27695
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Jacob L. Jones
Jacob L. Jones
a)
1
Department of Materials Science and Engineering, North Carolina State University
, Raleigh, North Carolina 27695
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a)
Electronic mail: [email protected]
J. Vac. Sci. Technol. A 40, 010803 (2022)
Article history
Received:
July 27 2021
Accepted:
November 09 2021
Citation
Hanan Alexandra Hsain, Younghwan Lee, Monica Materano, Terence Mittmann, Alexis Payne, Thomas Mikolajick, Uwe Schroeder, Gregory N. Parsons, Jacob L. Jones; Many routes to ferroelectric HfO2: A review of current deposition methods. J. Vac. Sci. Technol. A 1 January 2022; 40 (1): 010803. https://doi.org/10.1116/6.0001317
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