An ultralow coverage eight‐metal evaporator has been designed, built, tested, and put into use. Based on a geometric factor of 1:200, a metal coverage as low as 10−4 monolayer is reproducibly obtained with an error in coverage less than 20%. Various considerations during the design of the evaporator are discussed.
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Letter| July 01 1986
Design of an ultralow coverage metal evaporator based on a geometric factor
K. K. Chin;
K. K. Chin, P. McKernan, I. Lindau; Design of an ultralow coverage metal evaporator based on a geometric factor. J. Vac. Sci. Technol. A 1 July 1986; 4 (4): 1949–1951. https://doi.org/10.1116/1.573755
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