Thin films of composition ZnOx, with 0.7<x<1, have been deposited by modified planar magnetron sputtering using an rf discharge at the substrate to control film stoichiometry. A decrease in resistivity from 0.02 to 0.002 Ω cm and an associated transition from an absorbing to transparent appearance was observed as the oxygen content of the films was increased. For all films, the optical constants n and k in the wavelength range 0.4–2.5 μm were deduced and the reflectivity was measured between 2.5 and 20 μm wavelength. The optical properties of transparent and absorbing films were modeled by a dielectric function incorporating the Drude theory of free electrons, the Lorentz theory of lattice absorption, and a Maxwell–Garnett description of zinc inclusions.

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