We studied heteroleptic Hf precursors with a linked amido-cyclopentadienyl ligand by density functional theory (DFT) calculation to enable high-temperature atomic layer deposition processes. The thermolysis and hydrolysis of Hf precursors were simulated to expect thermal stability and reactivity with hydroxyl groups. The effects of alkyl groups in the precursors were also investigated. We constructed the hydroxylated HfO2 surface and then simulated the surface reactions of the precursors. The precursors with the linked ligand showed higher activation energies for thermolysis and lower activation energies for hydrolysis as compared with CpHf(NMe2)3. The precursors with the linked ligand also showed low activation energies for the serial ligand exchange reactions on the HfO2 surface, significantly lower than those of CpHf(NMe2)3. Therefore, the DFT calculation suggests that the Hf precursors with the linked ligand are promising due to their thermal stability and reactivity better than CpHf(NMe2)3.
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Research Article|
March 23 2021
Surface reaction of the hafnium precursor with a linked amido-cyclopentadienyl ligand: A density functional theory study
Special Collection:
Atomic Layer Deposition (ALD)
Romel Hidayat
;
Romel Hidayat
1
Department of Nanotechnology and Advanced Materials Engineering, Sejong University
, Seoul 05006, Republic of Korea
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Hye-Lee Kim
;
Hye-Lee Kim
1
Department of Nanotechnology and Advanced Materials Engineering, Sejong University
, Seoul 05006, Republic of Korea
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Hohoon Kim;
Hohoon Kim
2
MAPS Institute, Chemical Division, Mecaro Co., Ltd.
, Eumseong-gun, Chungbuk 27721, South Korea
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Younghun Byun;
Younghun Byun
2
MAPS Institute, Chemical Division, Mecaro Co., Ltd.
, Eumseong-gun, Chungbuk 27721, South Korea
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Jongsoo Lee;
Jongsoo Lee
2
MAPS Institute, Chemical Division, Mecaro Co., Ltd.
, Eumseong-gun, Chungbuk 27721, South Korea
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Won-Jun Lee
Won-Jun Lee
a)
1
Department of Nanotechnology and Advanced Materials Engineering, Sejong University
, Seoul 05006, Republic of Korea
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a)
Electronic mail: wjlee@sejong.ac.kr
Note: This paper is part of the 2021 Special Topic Collection on Atomic Layer Deposition (ALD).
J. Vac. Sci. Technol. A 39, 032410 (2021)
Article history
Received:
November 18 2020
Accepted:
March 01 2021
Citation
Romel Hidayat, Hye-Lee Kim, Hohoon Kim, Younghun Byun, Jongsoo Lee, Won-Jun Lee; Surface reaction of the hafnium precursor with a linked amido-cyclopentadienyl ligand: A density functional theory study. J. Vac. Sci. Technol. A 1 May 2021; 39 (3): 032410. https://doi.org/10.1116/6.0000796
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