Eight new atomic layer deposition (ALD) precursors were synthesized using a ligand that is new to the field of ALD: (tBuNH)SiMe2NMe2. Complexes containing Mg, V, Mn, Fe, Co, Ni, and Zn were found to be tetrahedral, and Li complexes form more complex structures. These compounds performed exceptionally well by thermogravimetric analysis (TGA). All compounds except for one Li species and the Fe complex left residual masses below 5%, similar or better than the analogous amidinate complexes. In particular, the Co(II) complex is very thermally robust and performs very well during a TGA stress test, surpassing temperatures above 200 °C. These compounds are the first of a family of precursors containing this type of monoanionic N–Si–N ligand and are prime candidates for ALD process development.
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Research Article|
March 22 2021
(tBuN)SiMe2NMe2—A new N,N′-κ2-monoanionic ligand for atomic layer deposition precursors
Special Collection:
Atomic Layer Deposition (ALD)
Matthew B. E. Griffiths
;
Matthew B. E. Griffiths
a)
1
Department of Chemistry, Carleton University
, 1125 Colonel By Drive, Ottawa, Ontario K1S 5B6, Canada
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David Zanders
;
David Zanders
1
Department of Chemistry, Carleton University
, 1125 Colonel By Drive, Ottawa, Ontario K1S 5B6, Canada
2
Inorganic Materials Chemistry, Faculty of Chemistry and Biochemistry, Ruhr University Bochum
, Universitätsstraße 150, Bochum 44780, Germany
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Michael A. Land
;
Michael A. Land
1
Department of Chemistry, Carleton University
, 1125 Colonel By Drive, Ottawa, Ontario K1S 5B6, Canada
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Jason D. Masuda
;
Jason D. Masuda
3Department of Chemistry,
Saint Mary’s University
, 923 Robie Street, Halifax, Nova Scotia B3H 3C3, Canada
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Anjana Devi
;
Anjana Devi
2
Inorganic Materials Chemistry, Faculty of Chemistry and Biochemistry, Ruhr University Bochum
, Universitätsstraße 150, Bochum 44780, Germany
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Seán T. Barry
Seán T. Barry
1
Department of Chemistry, Carleton University
, 1125 Colonel By Drive, Ottawa, Ontario K1S 5B6, Canada
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a)
Electronic mail: mbgriffi016@gmail.com
Note: This paper is part of the 2021 Special Topic Collection on Atomic Layer Deposition (ALD).
J. Vac. Sci. Technol. A 39, 032409 (2021)
Article history
Received:
November 18 2020
Accepted:
March 01 2021
Citation
Matthew B. E. Griffiths, David Zanders, Michael A. Land, Jason D. Masuda, Anjana Devi, Seán T. Barry; (tBuN)SiMe2NMe2—A new N,N′-κ2-monoanionic ligand for atomic layer deposition precursors. J. Vac. Sci. Technol. A 1 May 2021; 39 (3): 032409. https://doi.org/10.1116/6.0000795
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