The need for advanced energy conversion and storage devices remains a critical challenge amid the growing worldwide demand for renewable energy. Metal fluoride thin films are of great interest for applications in lithium-ion and emerging rechargeable battery technologies, particularly for enhancing the stability of the electrode-electrolyte interface and thereby extending battery cyclability and lifetime. Reported within, sodium fluoride (NaF) thin films were synthesized via atomic layer deposition. NaF growth experiments were carried out at reactor temperatures between 175 and 250 °C using sodium tert-butoxide and HF-pyridine solution. The optimal deposition temperature range was 175–200 °C, and the resulting NaF films exhibited low roughness (Rq ≈ 1.6 nm for films of ∼8.5 nm), nearly stoichiometric composition (Na:F = 1:1.05) and a growth per cycle value of 0.85 Å/cycle on SiO2 substrates. These results are encouraging for future applications of NaF thin films in the development of improved energy capture and storage technologies.
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Atomic layer deposition of sodium fluoride thin films
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Research Article|
March 09 2021
Atomic layer deposition of sodium fluoride thin films
Special Collection:
Atomic Layer Deposition (ALD)
Sara Kuraitis
;
Sara Kuraitis
1
Micron School of Materials Science and Engineering, Boise State University
, 1910 University Dr., Boise, Idaho 83725
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Donghyeon Kang
;
Donghyeon Kang
2
Applied Materials Division, Argonne National Laboratory
, 9700 S. Cass Ave., Argonne, Illinois 60439
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Anil U. Mane;
Anil U. Mane
2
Applied Materials Division, Argonne National Laboratory
, 9700 S. Cass Ave., Argonne, Illinois 60439
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Hua Zhou
;
Hua Zhou
3
X-ray Science Division, Advanced Photon Source, Argonne National Laboratory
, Lemont, Illinois 60439
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Jake Soares;
Jake Soares
1
Micron School of Materials Science and Engineering, Boise State University
, 1910 University Dr., Boise, Idaho 83725
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Jeffrey W. Elam;
Jeffrey W. Elam
a)
2
Applied Materials Division, Argonne National Laboratory
, 9700 S. Cass Ave., Argonne, Illinois 60439
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Elton Graugnard
Elton Graugnard
b)
1
Micron School of Materials Science and Engineering, Boise State University
, 1910 University Dr., Boise, Idaho 83725
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a)
Electronic mail: [email protected]
b)
Electronic mail: [email protected]
Note: This paper is part of the 2021 Special Topic Collection on Atomic Layer Deposition (ALD).
J. Vac. Sci. Technol. A 39, 032405 (2021)
Article history
Received:
December 08 2020
Accepted:
February 08 2021
Citation
Sara Kuraitis, Donghyeon Kang, Anil U. Mane, Hua Zhou, Jake Soares, Jeffrey W. Elam, Elton Graugnard; Atomic layer deposition of sodium fluoride thin films. J. Vac. Sci. Technol. A 1 May 2021; 39 (3): 032405. https://doi.org/10.1116/6.0000847
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