High-temperature β-Ga2O3:Cr2O3-based sensors sensitive to oxygen- and hydrogen-containing gases have been developed and studied. Magnetron cosputtering is the method of choice for the thin film synthesis as an industry-compatible technique. The composition-structure-properties relationship has been revealed. An introduction of 0.04–0.14 wt. % Cr leads to a significant increase in the response of the O2 sensors over the temperature range 250–400 °C. The highest response in the above-mentioned temperature range has been achieved for a Cr addition of 0.14 wt. %. An increase in the Cr content from 0.04 to 0.22 wt. % leads to a decrease in the β-Ga2O3-based sensors’ response time, especially for low O2 concentrations (≤10 vol. %). Reliable control of the β-Ga2O3:Cr2O3-based sensors’ selectivity to industry-relevant reducing gases—hydrogen, carbon monoxide, and toluene—is demonstrated. β-Ga2O3 films with a Cr incorporation content of 0.04 and 0.06 wt. % have a high response to toluene at operating temperatures 300–500 °C, while the films with 0.14 and 0.22 wt. % Cr have a high response to H2 in the range 400–500 °C. Regardless of the Cr content in β-Ga2O3 thin films, all sensors considered demonstrate a weak response to CO within the operating temperature range 250–500 °C. The results attained are of certain technological importance, i.e., in terms of the development of cost-effective methods for the synthesis of materials and systems for monitoring and control of industry-relevant gases for an environmentally friendly and sustainable growth.
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March 2021
Research Article|
January 27 2021
Impact of Cr2O3 additives on the gas-sensitive properties of β-Ga2O3 thin films to oxygen, hydrogen, carbon monoxide, and toluene vapors
Special Collection:
Gallium Oxide Materials and Devices
Aleksei V. Almaev
;
Aleksei V. Almaev
a)
1
Research and Development Center for Advanced Technologies in Microelectronics, National Research Tomsk State University
, 36 Lenin Avenue, Tomsk 634050, Russia
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Evgeny V. Chernikov;
Evgeny V. Chernikov
1
Research and Development Center for Advanced Technologies in Microelectronics, National Research Tomsk State University
, 36 Lenin Avenue, Tomsk 634050, Russia
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Vadim V. Novikov
;
Vadim V. Novikov
1
Research and Development Center for Advanced Technologies in Microelectronics, National Research Tomsk State University
, 36 Lenin Avenue, Tomsk 634050, Russia
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Bogdan O. Kushnarev;
Bogdan O. Kushnarev
1
Research and Development Center for Advanced Technologies in Microelectronics, National Research Tomsk State University
, 36 Lenin Avenue, Tomsk 634050, Russia
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Nikita N. Yakovlev;
Nikita N. Yakovlev
1
Research and Development Center for Advanced Technologies in Microelectronics, National Research Tomsk State University
, 36 Lenin Avenue, Tomsk 634050, Russia
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Ekaterina V. Chuprakova;
Ekaterina V. Chuprakova
1
Research and Development Center for Advanced Technologies in Microelectronics, National Research Tomsk State University
, 36 Lenin Avenue, Tomsk 634050, Russia
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Vladimir L. Oleinik
;
Vladimir L. Oleinik
1
Research and Development Center for Advanced Technologies in Microelectronics, National Research Tomsk State University
, 36 Lenin Avenue, Tomsk 634050, Russia
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Anastasiya D. Lozinskaya;
Anastasiya D. Lozinskaya
1
Research and Development Center for Advanced Technologies in Microelectronics, National Research Tomsk State University
, 36 Lenin Avenue, Tomsk 634050, Russia
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Daniela S. Gogova
Daniela S. Gogova
2
Lobachevsky State University of Nizhny Novgorod
, 23 Gagarin Avenue, Nizhny Novgorod 603950, Russia
3
Department of Physics, Center for Materials Science and Nanotechnology, University of Oslo
, PO Box 1048, Blindern, NO-0316 Oslo, Norway
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a)
Electronic mail: almaev_alex@mail.ru
Note: This paper is part of the Special Topic Collection on Gallium Oxide Materials and Devices.
J. Vac. Sci. Technol. A 39, 023405 (2021)
Article history
Received:
October 16 2020
Accepted:
January 11 2021
Citation
Aleksei V. Almaev, Evgeny V. Chernikov, Vadim V. Novikov, Bogdan O. Kushnarev, Nikita N. Yakovlev, Ekaterina V. Chuprakova, Vladimir L. Oleinik, Anastasiya D. Lozinskaya, Daniela S. Gogova; Impact of Cr2O3 additives on the gas-sensitive properties of β-Ga2O3 thin films to oxygen, hydrogen, carbon monoxide, and toluene vapors. J. Vac. Sci. Technol. A 1 March 2021; 39 (2): 023405. https://doi.org/10.1116/6.0000723
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