Photoelectron and Auger peaks are central to most of the important uses of x-ray photoelectron spectroscopy (XPS), and thus, they receive the most attention in many types of analysis. Quantitative chemical analysis using XPS requires the assessment of the intensities of the photoemission peaks of the elements detected. Determination of peak intensities requires separation of the photoelectron peak signals from the background on which the peaks rest. For the determination of peak area intensities, the background is subtracted from overall signal intensity. The spectral background is also critical when peak fitting is used to determine intensities of overlapping peaks, and the model of background used in this process can impact the results. In addition to the impact on quantitative analysis, information about the depth distribution of elements in the near surface region can often be obtained by visual inspection of the background and quantified using appropriate modeling. This introductory guide provides some basic information about backgrounds in the XPS analysis, describes the types of background models that are commonly used, suggests some of their strengths and weaknesses, and provides examples of their use and misuse. Although the fundamental nature of some components of the background signals in XPS is not understood, indicating that none of the models in use are fully correct and the area is subject to active research, appropriate good practices have been established for most routine analysis. The guide describes good practices, identifies errors that frequently appear in the literature, and uses examples to demonstrate the impacts of background selections on determinations of peak intensities.
Skip Nav Destination
Article navigation
December 2020
Research Article|
September 23 2020
Introductory guide to backgrounds in XPS spectra and their impact on determining peak intensities
Special Collection:
Special Topic Collection: Reproducibility Challenges and Solutions
Mark H. Engelhard
;
Mark H. Engelhard
a)
1
Environmental Molecular Sciences Laboratory, Pacific Northwest National Laboratory
, Richland, Washington 99354
Search for other works by this author on:
Donald R. Baer
;
Donald R. Baer
1
Environmental Molecular Sciences Laboratory, Pacific Northwest National Laboratory
, Richland, Washington 99354
Search for other works by this author on:
Alberto Herrera-Gomez
;
Alberto Herrera-Gomez
2
CINVESTAV—Unidad Queretaro
, Queretaro 76230, Mexico
Search for other works by this author on:
Peter M. A. Sherwood
Peter M. A. Sherwood
3
Department of Chemistry, University of Washington
, Box 351700, Seattle, Washington 98195
Search for other works by this author on:
a)
Electronic mail: [email protected]
Note: This paper is part of the Special Topic Collection on Reproducibility Challenges and Solutions.
J. Vac. Sci. Technol. A 38, 063203 (2020)
Article history
Received:
May 27 2020
Accepted:
August 31 2020
Citation
Mark H. Engelhard, Donald R. Baer, Alberto Herrera-Gomez, Peter M. A. Sherwood; Introductory guide to backgrounds in XPS spectra and their impact on determining peak intensities. J. Vac. Sci. Technol. A 1 December 2020; 38 (6): 063203. https://doi.org/10.1116/6.0000359
Download citation file:
Pay-Per-View Access
$40.00
Sign In
You could not be signed in. Please check your credentials and make sure you have an active account and try again.
Citing articles via
Surface passivation approaches for silicon, germanium, and III–V semiconductors
Roel J. Theeuwes, Wilhelmus M. M. Kessels, et al.
Growth and optical properties of NiO thin films deposited by pulsed dc reactive magnetron sputtering
Faezeh A. F. Lahiji, Samiran Bairagi, et al.
Novel high-efficiency plasma nitriding process utilizing a high power impulse magnetron sputtering discharge
A. P. Ehiasarian, P. Eh. Hovsepian
Related Content
Interface energetics at WOX/organic interfaces: The role of oxygen vacancies
Appl. Phys. Lett. (September 2013)
Electrochromic properties of electrodeposited tungsten oxide (WO3) thin film
AIP Conference Proceedings (June 2012)
Increasing soft x-ray reflectance of short-period W/Si multilayers using B4C diffusion barriers
J. Appl. Phys. (January 2023)
Uncertainties in photoemission peak fitting accounting for the covariance with background parameters
J. Vac. Sci. Technol. A (April 2020)
W/B short period multilayer structures for soft x-rays
AIP Advances (April 2020)