Scientific breakthroughs in silicon surface passivation have enabled commercial high-efficiency photovoltaic devices making use of the black silicon nanostructure. In this study, the authors report on factors that influence the passivation stability of black silicon realized with industrially viable spatial atomic layer deposited (SALD) aluminum oxide (AlOx) under damp heat exposure and light soaking. Damp heat exposure conditions are 85 °C and 85% relative humidity, and light soaking is performed with 0.6 sun illumination at 75 °C. It is demonstrated that reasonably thick (20 nm) passivation films are required for both black and planar surfaces in order to provide stable surface passivation over a period of 1000 h under both testing conditions. Both surface textures degrade at similar rates with 5 and 2 nm thick films. The degradation mechanism under damp heat exposure is found to be different from that in light soaking. During damp heat exposure, the fixed charge density of AlOx is reduced, which decreases the amount of field-effect passivation. Degradation under light soaking, on the other hand, is likely to be related to interface defects between silicon and the passivating film. Finally, a thin chemically grown SiOx layer at the interface between the AlOx film and the silicon surface is shown to significantly increase the passivation stability under both light soaking and damp heat exposure. The results of this study provide valuable insights into surface passivation degradation mechanisms on nanostructured silicon surfaces and pave the way for the industrial production of highly stable black silicon devices.
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March 2020
Research Article|
January 08 2020
AlOx surface passivation of black silicon by spatial ALD: Stability under light soaking and damp heat exposure Available to Purchase
Special Collection:
Special Topic Collection on Atomic Layer Deposition (ALD)
Ismo T. S. Heikkinen
;
Ismo T. S. Heikkinen
a)
1
Department of Electronics and Nanoengineering, Aalto University
, Tietotie 3, FI-02150 Espoo, Finland
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George Koutsourakis;
George Koutsourakis
2
National Physical Laboratory
, Hampton Road, Teddington TW11 0LW, United Kingdom
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Sauli Virtanen;
Sauli Virtanen
3
Beneq Oy
, Olarinluoma 9, FI-02200 Espoo, Finland
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Marko Yli-Koski;
Marko Yli-Koski
1
Department of Electronics and Nanoengineering, Aalto University
, Tietotie 3, FI-02150 Espoo, Finland
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Sebastian Wood
;
Sebastian Wood
2
National Physical Laboratory
, Hampton Road, Teddington TW11 0LW, United Kingdom
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Ville Vähänissi;
Ville Vähänissi
1
Department of Electronics and Nanoengineering, Aalto University
, Tietotie 3, FI-02150 Espoo, Finland
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Emma Salmi;
Emma Salmi
3
Beneq Oy
, Olarinluoma 9, FI-02200 Espoo, Finland
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Fernando A. Castro
;
Fernando A. Castro
2
National Physical Laboratory
, Hampton Road, Teddington TW11 0LW, United Kingdom
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Hele Savin
Hele Savin
1
Department of Electronics and Nanoengineering, Aalto University
, Tietotie 3, FI-02150 Espoo, Finland
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Ismo T. S. Heikkinen
1,a)
George Koutsourakis
2
Sauli Virtanen
3
Marko Yli-Koski
1
Sebastian Wood
2
Ville Vähänissi
1
Emma Salmi
3
Fernando A. Castro
2
Hele Savin
1
1
Department of Electronics and Nanoengineering, Aalto University
, Tietotie 3, FI-02150 Espoo, Finland
2
National Physical Laboratory
, Hampton Road, Teddington TW11 0LW, United Kingdom
3
Beneq Oy
, Olarinluoma 9, FI-02200 Espoo, Finland
a)
Electronic mail: [email protected]
Note: This paper is part of the 2020 Special Topic Collection on Atomic Layer Deposition (ALD).
J. Vac. Sci. Technol. A 38, 022401 (2020)
Article history
Received:
October 29 2019
Accepted:
December 13 2019
Citation
Ismo T. S. Heikkinen, George Koutsourakis, Sauli Virtanen, Marko Yli-Koski, Sebastian Wood, Ville Vähänissi, Emma Salmi, Fernando A. Castro, Hele Savin; AlOx surface passivation of black silicon by spatial ALD: Stability under light soaking and damp heat exposure. J. Vac. Sci. Technol. A 1 March 2020; 38 (2): 022401. https://doi.org/10.1116/1.5133896
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