HfO2/TiO2/SiO2 periodic multilayer high reflection films deposited by an electron beam are post-treated by two-step post-treatment and thermal annealing post-treatment, respectively. The optical properties, microstructures, surface morphologies, and laser-induced damage threshold (LIDT) of the films are studied comparatively. The results show that the two-step post-treatment enhances the high reflection films’ density and reduces the film surface roughness and the defects of the film. The test results show that the LIDT of HfO2/TiO2/SiO2 high reflection films treated by two-step post-treatment reaches 32.8 J/cm2, which is 110.26% higher than that of the untreated film. Compared with the HfO2/TiO2/SiO2 high reflection films after thermal annealing post-treatment, the LIDT increased nearly 27.6% after two-step post-treatment. Two-step post-treatment of high reflection films can effectively remove the defects on the surface of the film, reduce the oxygen vacancies inside the film, and further increase the laser damage threshold of the high reflection films.
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November 2019
Research Article|
October 10 2019
Effect of two-step post-treatment on optical properties, microstructure, and nanosecond laser damage threshold of HfO2/TiO2/SiO2 multilayer high reflection films
Sida Mao;
Sida Mao
State Key Laboratory of High-power Semiconductor Laser, Changchun University of Science and Technology
, Changchun 130022, China
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Jie Fan
;
Jie Fan
a)
State Key Laboratory of High-power Semiconductor Laser, Changchun University of Science and Technology
, Changchun 130022, China
a)Author to whom correspondence should be addressed: fanjie@cust.edu.cn
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Yonggang Zou;
Yonggang Zou
State Key Laboratory of High-power Semiconductor Laser, Changchun University of Science and Technology
, Changchun 130022, China
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Yunping Lan;
Yunping Lan
State Key Laboratory of High-power Semiconductor Laser, Changchun University of Science and Technology
, Changchun 130022, China
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Yingtian Xu;
Yingtian Xu
State Key Laboratory of High-power Semiconductor Laser, Changchun University of Science and Technology
, Changchun 130022, China
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Jiabin Zhang;
Jiabin Zhang
State Key Laboratory of High-power Semiconductor Laser, Changchun University of Science and Technology
, Changchun 130022, China
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Jianing Dong;
Jianing Dong
State Key Laboratory of High-power Semiconductor Laser, Changchun University of Science and Technology
, Changchun 130022, China
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Xiaohui Ma
Xiaohui Ma
State Key Laboratory of High-power Semiconductor Laser, Changchun University of Science and Technology
, Changchun 130022, China
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a)Author to whom correspondence should be addressed: fanjie@cust.edu.cn
J. Vac. Sci. Technol. A 37, 061503 (2019)
Article history
Received:
June 24 2019
Accepted:
September 20 2019
Citation
Sida Mao, Jie Fan, Yonggang Zou, Yunping Lan, Yingtian Xu, Jiabin Zhang, Jianing Dong, Xiaohui Ma; Effect of two-step post-treatment on optical properties, microstructure, and nanosecond laser damage threshold of HfO2/TiO2/SiO2 multilayer high reflection films. J. Vac. Sci. Technol. A 1 November 2019; 37 (6): 061503. https://doi.org/10.1116/1.5116294
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