In this work, the authors developed a simple and efficient two-step deposition process for the realization of an x-ray absorption grating: ALD (atomic layer deposition) of a conductive seed layer, followed by electroplating of the absorbing metal with a pulse current mode. An Si grating with a high aspect ratio of 1:40 was fabricated by deep reactive ion etching on an 8 in. Si wafer. In order to form a conductive seed layer on the Si grating with such a high aspect ratio over an area of 10 × 10 cm2, Ru was conformally deposited by a thermal ALD process with O2 reactant gas. The authors analyzed the results of electroplating performed in different bias modes to fill Au in a high aspect ratio Si grating structure. It was found that electroplating in the pulse current mode (duty cycle: 5%, current density: 1.7 mA/cm2) for 79 h allowed Au to uniformly fill the entire grating area, whereas in the direct current mode, severe step coverage on top of the grating was observed. The authors successfully tested the grating fabricated by the suggested two-step deposition process as an absorption grating (G2) for a high x-ray energy Talbot-Lau grating interferometer.
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Research Article|
April 02 2019
Evaluation of grating realized via pulse current electroplating combined with atomic layer deposition as an x-ray grating interferometer
Special Collection:
2019 Special Collection on Atomic Layer Deposition (ALD)
Tae-Eun Song
;
Tae-Eun Song
a)
1
National NanoFab Center
, 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea
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Seho Lee;
Seho Lee
a)
2
School of Mechanical Engineering, Pusan National University
, Busandaehak-ro 63 Beon-gil 2, Busan 46241, Republic of Korea
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Hee Han;
Hee Han
1
National NanoFab Center
, 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea
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Soonyoung Jung;
Soonyoung Jung
3
School of Materials Science and Engineering, Yeungnam University
, 280 Dae-hak-ro, Dae-dong, Gyeongsan-si, Gyeongsangbuk-do 38541, Republic of Korea
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Soo-Hyun Kim;
Soo-Hyun Kim
3
School of Materials Science and Engineering, Yeungnam University
, 280 Dae-hak-ro, Dae-dong, Gyeongsan-si, Gyeongsangbuk-do 38541, Republic of Korea
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Min Jun Kim;
Min Jun Kim
4
Department of Mechanical Engineering, Lyle School of Engineering, Southern Methodist University,
3101 Dyer Street, Dallas, Texas 75205
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Seung Wook Lee;
Seung Wook Lee
b)
2
School of Mechanical Engineering, Pusan National University
, Busandaehak-ro 63 Beon-gil 2, Busan 46241, Republic of Korea
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Chi Won Ahn
Chi Won Ahn
b)
1
National NanoFab Center
, 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea
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a)
T. E. Song and S. Lee contributed equally to this work.
Note: This paper is part of the 2019 special collection on Atomic Layer Deposition (ALD).
J. Vac. Sci. Technol. A 37, 030903 (2019)
Article history
Received:
November 12 2018
Accepted:
March 04 2019
Citation
Tae-Eun Song, Seho Lee, Hee Han, Soonyoung Jung, Soo-Hyun Kim, Min Jun Kim, Seung Wook Lee, Chi Won Ahn; Evaluation of grating realized via pulse current electroplating combined with atomic layer deposition as an x-ray grating interferometer. J. Vac. Sci. Technol. A 1 May 2019; 37 (3): 030903. https://doi.org/10.1116/1.5080954
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