Mass ablated controlled laser induced V₂O₅ plasma parameters for controllable VO₂ films growth

The effect of the laser fluence on V₂O₅ plasma dynamics, composition, and ionization state was studied. By combining three plasma diagnostic techniques, fast imaging, optical emission spectroscopy, and Langmuir probe, two ablation regimes have been identified. These ablation regimes depend on the evolution of the amount of the ablated mass that was measured by the method of mass loss. The transition between the two regimes at 1.3 J cm⁻². For fluences lower than this threshold value, the expansion velocity of the plasma elements, the plasma dimensions, and the ionic current increase rapidly, unlike the fluences higher than the threshold fluence. Reverse behavior was observed for the ablated mass. This effect of the ablated mass would have a significant impact on the control of the properties of vanadium dioxide layers deposited by pulsed laser deposition in a reactive atmosphere of oxygen.