Transparent thin films can now be site-selectively patterned and positioned on surface using mask-defined electrodeposition of one oxide and overcoating with a different solution-processed oxide, followed by thermal annealing. Annealing allows an interdiffusion process to create a new oxide that is entirely transparent. A primary electrodeposited oxide can be patterned and the secondary oxide coated over the entire substrate to form high color contrast coplanar thin film tertiary oxide. The authors also detail the phase formation and chemical state of the oxide and how the nature of the electrodeposited layer and the overlayer influence the optical clearing of the patterned oxide film.
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See supplementary material at http://dx.doi.org/10.1116/1.4968549 for full SiO2 and V-O-Na-Si surface morphology analysis, and further characterization data from electrodeposition and templated deposits.
© 2016 American Vacuum Society.
2016
American Vacuum Society
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