A new process has been developed to deposit magnesium fluoride (MgF2) thin films via atomic layer deposition (ALD) for use as optical coatings in the ultraviolet. MgF2 was deposited in a showerhead style ALD reactor using bis(ethylcyclopentadienyl)magnesium and anhydrous hydrogen fluoride (HF) as precursors at substrate temperatures from 100 to 250 °C. The use of HF was observed to result in improved morphology and reduced impurity content compared to other reported MgF2 ALD approaches that use metal fluoride precursors as the fluorine-containing chemistry. Characterization of these films has been performed using spectroscopic ellipsometry, atomic force microscopy, and x-ray photoelectron spectroscopy for material deposited on silicon substrates. Films at all substrate temperatures were transparent at wavelengths down to 190 nm and the low deposition temperature combined with low surface roughness makes these coatings good candidates for a variety of optical applications in the far ultraviolet.
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January 2015
Research Article|
November 14 2014
Atomic layer deposition of magnesium fluoride via bis(ethylcyclopentadienyl)magnesium and anhydrous hydrogen fluoride
John Hennessy;
John Hennessy
a)
Jet Propulsion Laboratory,
California Institute of Technology
, 4800 Oak Grove Drive, Pasadena, California 91109
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April D. Jewell;
April D. Jewell
Jet Propulsion Laboratory,
California Institute of Technology
, 4800 Oak Grove Drive, Pasadena, California 91109
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Frank Greer;
Frank Greer
Jet Propulsion Laboratory,
California Institute of Technology
, 4800 Oak Grove Drive, Pasadena, California 91109
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Michael C. Lee;
Michael C. Lee
Jet Propulsion Laboratory,
California Institute of Technology
, 4800 Oak Grove Drive, Pasadena, California 91109
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Shouleh Nikzad
Shouleh Nikzad
Jet Propulsion Laboratory,
California Institute of Technology
, 4800 Oak Grove Drive, Pasadena, California 91109
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a)
Electronic mail: [email protected]
J. Vac. Sci. Technol. A 33, 01A125 (2015)
Article history
Received:
September 04 2014
Accepted:
November 03 2014
Citation
John Hennessy, April D. Jewell, Frank Greer, Michael C. Lee, Shouleh Nikzad; Atomic layer deposition of magnesium fluoride via bis(ethylcyclopentadienyl)magnesium and anhydrous hydrogen fluoride. J. Vac. Sci. Technol. A 1 January 2015; 33 (1): 01A125. https://doi.org/10.1116/1.4901808
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