Reaction mechanisms in the Ti(NMe2)2(OiPr)2-D2O and Ti(OiPr)3[MeC(NiPr)2] [also written Ti(OiPr)3(NiPr-Me-amd)]-D2O atomic layer deposition processes were studied in situ with quartz crystal microbalance (QCM) and quadrupole mass spectrometry (QMS) at 275 °C. For the Ti(NMe2)2(OiPr)2-D2O process, both QCM and QMS results indicated adsorption of the Ti(NMe2)2(OiPr)2 molecule through an exchange of at least one of its –NMe2 ligands with surface hydroxyl groups. Regarding the Ti(OiPr)3(NiPr-Me-amd)-D2O process, a mismatch between the QCM and QMS results revealed more complex reactions: the decomposition of the [MeC(NiPr)2] [also written (NiPr-Me-amd)] ligand is suggested by the shape of the QCM data and the intensity of the QMS signals belonging to fragments of the [MeC(NiPr)2] [also written (NiPr-Me-amd)] ligand. A simple calculation model associating the growth rate per cycle of a crystalline film and the surface area taken by the ligands remaining after saturation was also used to support the decomposition of the [MeC(NiPr)2] [also written (NiPr-Me-amd)] ligand. The observed high growth rate is incompatible with the whole [MeC(NiPr)2] (also written [NiPr-Me-amd)] ligand remaining on the surface.

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