Atomic layer deposition has been shown to provide high quality single layer moisture barrier films on polymer substrates, but conventional pulse-based processes are too slow to be commercially feasible. One way to overcome this speed limitation is to avoid the need to pulse and purge precursors by moving the substrate between zones containing the precursors, passing through intermediate purge zones. Recently, several groups have reported various approaches to accomplishing this, including the approach discussed here in which the flexible web is passed between precursor zones in a serpentine pattern. Al2O3 and TiO2 barrier films 12 to 20 nm thick with water vapor transmission rates in the range of 10−4 g/m2/day have been demonstrated for web speeds in excess of 1 m/s on 100 mm wide polyethylene terephthalate web. Scale-up of this process to 300 mm wide web in a system capable of depositing 10–20 nm of film in a single pass is currently under way. This scale-up effort and the potential for very high volume, low cost moisture barrier production utilizing this technique are discussed.
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Research Article| January 24 2012
High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films
Eric Dickey, William A. Barrow; High rate roll to roll atomic layer deposition, and its application to moisture barriers on polymer films. J. Vac. Sci. Technol. A 1 March 2012; 30 (2): 021502. https://doi.org/10.1116/1.3678486
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