V2O5 xerogel films were fabricated by casting V2O5 sols onto fluorine-doped tin oxide glass substrates at room temperature. Five, ten and twenty atomic layers of Al2O3 were grown onto as-fabricated films respectively. The bare film and Al2O3-deposited films all exhibited hydrous V2O5 phase only. Electrochemical impedance spectroscopy study revealed increased surface charge-transfer resistance of V2O5 films as more Al2O3 atomic layers were deposited. Lithium-ion intercalation tests at 600 mAg−1 showed that bare V2O5 xerogel film possessed high initial discharge capacity of 219 mAhg−1 but suffered from severe capacity degradation, i.e., having only 136 mAhg−1 after 50 cycles. After deposition of ten atomic layers of Al2O3, the initial discharge capacity was 195 mAhg−1 but increased over cycles before stabilizing; after 50 cycles, the discharge capacity was as high as 225 mAhg−1. The noticeably improved cyclic stability of Al2O3-deposited V2O5 xerogel film could be attributed to the improved surface chemistry and enhanced mechanical strength. During repeated lithium-ion intercalation/de-intercalation, atomic layers of Al2O3 which were coated onto V2O5 surface could prevent V2O5 electrode dissolution into electrolyte by reducing direct contact between active electrode and electrolyte while at the same time acting as binder to maintain good mechanical contact between nanoparticles inside the film.
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January 2012
Research Article|
November 29 2011
Atomic layer deposition of Al2O3 on V2O5 xerogel film for enhanced lithium-ion intercalation stability Available to Purchase
Dawei Liu;
Dawei Liu
a)
Department of Materials Science and Engineering,
University of Washington
, Seattle, Washington 98195
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Yanyi Liu;
Yanyi Liu
Department of Materials Science and Engineering,
University of Washington
, Seattle, Washington 98195
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Stephanie L. Candelaria;
Stephanie L. Candelaria
Department of Materials Science and Engineering,
University of Washington
, Seattle, Washington 98195
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Guozhong Cao;
Guozhong Cao
b)
Department of Materials Science and Engineering,
University of Washington
, Seattle, Washington 98195
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Jun Liu;
Jun Liu
Pacific Northwest National Laboratories
, 902 Battelle Boulevard, P.O. Box 999, Richland, Washington 99352
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Yoon-Ha Jeong
Yoon-Ha Jeong
National Center for Nanomaterials Technology,
Pohang University of Science and Technology
, Pohang, South Korea
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Dawei Liu
a)
Department of Materials Science and Engineering,
University of Washington
, Seattle, Washington 98195
Yanyi Liu
Department of Materials Science and Engineering,
University of Washington
, Seattle, Washington 98195
Stephanie L. Candelaria
Department of Materials Science and Engineering,
University of Washington
, Seattle, Washington 98195
Guozhong Cao
b)
Department of Materials Science and Engineering,
University of Washington
, Seattle, Washington 98195
Jun Liu
Pacific Northwest National Laboratories
, 902 Battelle Boulevard, P.O. Box 999, Richland, Washington 99352
Yoon-Ha Jeong
National Center for Nanomaterials Technology,
Pohang University of Science and Technology
, Pohang, South Korea
a)
Present address: School of Engineering, Brown University, Providence, RI 02912.
b)
Author to whom correspondence should be addressed; electronic mail: [email protected]
J. Vac. Sci. Technol. A 30, 01A123 (2012)
Article history
Received:
August 16 2011
Accepted:
November 03 2011
Citation
Dawei Liu, Yanyi Liu, Stephanie L. Candelaria, Guozhong Cao, Jun Liu, Yoon-Ha Jeong; Atomic layer deposition of Al2O3 on V2O5 xerogel film for enhanced lithium-ion intercalation stability. J. Vac. Sci. Technol. A 1 January 2012; 30 (1): 01A123. https://doi.org/10.1116/1.3664115
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