Study of $Ni2–Mn–Ga$ phase formation by magnetron sputtering film deposition at low temperature onto Si substrates and $LaNiO3∕Pb(Ti,Zr)O3$ buffer Available to Purchase

Film deposition of $Ni2MnGa$ phaselike alloy by radio frequency (rf) magnetron sputtering was performed onto bare Si(100) substrates and $LaNiO3∕Pb(Ti,Zr)O3$ (LNO/PZT) ferroelectric buffer layer near room temperature. The prepared samples were characterized using conventional x-ray diffraction (XRD), superconducting quantum interference device, and electron dispersive x-ray spectroscopy from scanning electron microscope observations. The optimized films deposited under high rf power and low argon pressure present good surface quality and highly textured phase crystallization. The positioning distance between the substrate and the target-holder axis has some limited effect on the film’s composition due to the specific diffusion behavior of each element in the sputtering plasma. Extended four pole high resolution XRD analysis allowed one to discriminate the intended Ni–Mn–Ga tetragonal martensitic phase induced by the (100) LNO/PZT oriented buffer. This low temperature process appears to be very promising, allowing separate control of the functional layer’s properties, while trying to achieve high electromagnetoelastic coupling.