Fluorination of and surfaces was investigated by irradiating high-density, helicon-wave and plasmas. The surface bombarded by high-flux positive ions of the plasma was fluorinated significantly. On contrast, was less fluorinated than when they were irradiated by the same plasma. The analysis of the surface irradiated by the plasma suggests that the fluorination is triggered by reactions between fluorocarbon deposit and Al–O bonding with the assistance of ion bombardment. On the other hand, irradiation of the plasma induced less significant fluorination on the surface. This suggests a lower reaction probability between sulfur fluoride deposit and Al–O bonding. The difference in the fluorination of the and surfaces induced by the irradiations of the and plasmas is understood by comparing the bonding energies of C–O, S–O, Al–O, and Y–O.
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Research Article| June 29 2009
Fluorination mechanisms of and surfaces irradiated by high-density and plasmas
Kazuhiro Miwa, Noriharu Takada, Koichi Sasaki; Fluorination mechanisms of and surfaces irradiated by high-density and plasmas. J. Vac. Sci. Technol. A 1 July 2009; 27 (4): 831–835. https://doi.org/10.1116/1.3112624
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