Thermal stability of sputter deposited nanomosaic rutile $TiO2$

A domain structure based on the rutile lattice with a large density of $12⟨011⟩{011}$-type stacking faults is found in sputter deposited $TiO2$ films [J. Vac. Sci. Technol. A 24, 2054 (2006)]. The thermal stability of nanomosaic rutile at moderate temperature is reported here. Films are annealed at $973K$ for $0.25–15h$⁠, characterized by x-ray diffraction. A Johnson–Mehl–Avrami–Kolmogorov analysis indicates impeded crystallite growth. A dislocation-locking mechanism is proposed for this behavior. Partial dislocations with $12⟨011⟩$ Burgers vectors that bound the stacking faults glide on intersecting {011} slip planes and react to produce sessile stair rod dislocations. Without the high temperature required for dislocation climb, $12⟨011⟩{011}$-type faults inherent to nanomosaic rutile provide thermal stability against massive crystallite growth.