Thermal diffusivity of amorphous transparent conductive films, indium zinc oxide (IZO) films, with a thickness of has been analyzed quantitatively using a newly developed nanosecond thermoreflectance system. IZO films sandwiched by molybdenum (Mo) films were prepared on fused silica substrate by dc magnetron sputtering using an oxide ceramic IZO target ( and ZnO). The resistivity, carrier density, and Hall mobility of the IZO films ranged from , from , and from , respectively. The thermoreflectance signals were analyzed based on an analytical solution of the one dimensional heat flow across the three-layered film (Mo/IZO/Mo) system. The thermal diffusivity of the IZO films was , depending on the electrical resistivity. The thermal conductivity carried by free electrons was estimated using the Wiedemann-Franz law. The phonon contribution to the heat transfer in IZO films with various resistivities was found to be almost constant , which was about half of the one for polycrystalline indium tin oxide films.
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July 2007
Research Article|
July 03 2007
Effect of electrical properties on thermal diffusivity of amorphous indium zinc oxide films
T. Ashida;
T. Ashida
Graduate School of Science and Engineering,
Aoyama Gakuin University
, 5-10-1 Fuchinobe, Sagamihara, Kanagawa 229-8558, Japan
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A. Miyamura;
A. Miyamura
Graduate School of Science and Engineering,
Aoyama Gakuin University
, 5-10-1 Fuchinobe, Sagamihara, Kanagawa 229-8558, Japan
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Y. Sato;
Y. Sato
Graduate School of Science and Engineering,
Aoyama Gakuin University
, 5-10-1 Fuchinobe, Sagamihara, Kanagawa 229-8558, Japan
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T. Yagi;
T. Yagi
National Metrology Institute of Japan
, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 3, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8563, Japan
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N. Taketoshi;
N. Taketoshi
National Metrology Institute of Japan
, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 3, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8563, Japan
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T. Baba;
T. Baba
National Metrology Institute of Japan
, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba Central 3, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8563, Japan
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Y. Shigesato
Y. Shigesato
a)
Graduate School of Science and Engineering,
Aoyama Gakuin University
, 5-10-1 Fuchinobe, Sagamihara, Kanagawa 229-8558, Japan
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a)
Electronic mail: yuzo@chem.aoyama.ac.jp
J. Vac. Sci. Technol. A 25, 1178–1183 (2007)
Article history
Received:
October 26 2006
Accepted:
April 30 2007
Citation
T. Ashida, A. Miyamura, Y. Sato, T. Yagi, N. Taketoshi, T. Baba, Y. Shigesato; Effect of electrical properties on thermal diffusivity of amorphous indium zinc oxide films. J. Vac. Sci. Technol. A 1 July 2007; 25 (4): 1178–1183. https://doi.org/10.1116/1.2743644
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