Ion attachment mass spectrometry (IAMS) was used to analyze the species in cyclo-C4F8 plasma quantitatively. Not only stable neutral molecules but also less stable radicals were detected. Ions and species without a charge in the plasma were perfectly distinguishable. The measured dependence of the product distribution on the rf power shows that IAMS can be used to clarify and control the processes in the plasma.

1.
M. A.
Lieberman
and
A. J.
Lichtenberg
,
Principle of Plasma Discharges and Materials Proceeding
(
Wiley
,
New York
,
1994
).
2.
K.
Miyata
,
M.
Hori
, and
T.
Goto
,
J. Vac. Sci. Technol. A
14
,
2083
(
1996
).
3.
H.
Nakagawa
,
M.
Okigawa
,
S.
Morishita
,
S.
Noda
,
H.
Hayashi
,
K.
Ito
,
M.
Inoue
, and
M.
Sekine
,
Jpn. J. Appl. Phys., Part 1
41
,
319
(
2002
).
4.
T.
Nakano
and
K.
Yanagita
,
Jpn. J. Appl. Phys., Part 1
42
,
663
(
2003
).
5.
H.
Toyoda
,
H.
Kojima
, and
H.
Sugai
,
Appl. Phys. Lett.
54
,
1507
(
1989
).
6.
H.
Toyoda
,
M.
Ito
, and
H.
Sugai
,
Jpn. J. Appl. Phys., Part 1
36
,
3730
(
1997
).
7.
H.
Doh
and
Y.
Horiike
,
J. Vac. Sci. Technol. A
20
,
1420
(
2002
).
8.
E.
Stoffels
,
W. W.
Stoffels
, and
K.
Tachibana
,
Rev. Sci. Instrum.
69
,
116
(
1998
).
9.
W. W.
Stoffels
,
E.
Stoffels
, and
K.
Tachibana
,
J. Vac. Sci. Technol. A
16
,
87
(
1998
).
10.
T.
Fujii
,
M.
Ogura
, and
H.
Jimba
,
Anal. Chem.
61
,
1026
(
1989
).
12.
M.
Nakamura
,
K.
Hino
,
T.
Sasaki
,
Y.
Shiokawa
, and
T.
Fujii
,
J. Vac. Sci. Technol. A
19
,
1105
(
2001
).
13.
T.
Fujii
and
M.
Nakamura
,
J. Appl. Phys.
90
,
2180
(
2001
).
14.
K.
Iwase
,
M.
Nakamura
, and
T.
Fujii
,
J. Vac. Soc. Jpn.
44
,
39
(
2001
).
15.
T.
Fujii
,
S.
Arumozhiraja
,
M.
Nakamura
, and
Y.
Shiokawa
,
Anal. Chem.
73
,
2937
(
2001
).
16.
M.
Nakamura
,
K.
Hino
,
Y.
Shiokawa
,
T.
Fujii
,
M.
Takayanagi
, and
M.
Nakata
,
J. Vac. Soc. Jpn.
45
,
846
(
2002
).
17.
M.
Nakamura
,
Y.
Shiokawa
,
T.
Fujii
,
M.
Takayanagi
, and
M.
Nakata
,
J. Vac. Sci. Technol. A
22
,
2347
(
2004
).
18.
M.
Nakamura
, Ph.D. thesis,
Tokyo University of Agriculture and Technology
, Tokyo, Japan,
2005
.
19.
J. H.
Keller
,
J. C.
Forster
, and
M. S.
Barnes
,
J. Vac. Sci. Technol. A
11
,
2487
(
1993
).
20.
J. P.
Blewett
and
E. J.
Jones
,
Phys. Rev.
50
,
464
(
1936
).
21.
M. J.
Frisch
 et al., GAUSSIAN 98, Revision A. 11.4, Gaussian, Inc., Pittsburgh, PA,
2002
.
22.
M.
Kanoh
,
J.
Tonotani
,
K.
Aoki
, and
M.
Yamage
,
Jpn. J. Appl. Phys., Part 1
41
,
3963
(
2002
).
23.
C. Q.
Jiao
,
A.
Garascadden
, and
P. D.
Haaland
,
Chem. Phys. Lett.
297
,
121
(
1998
).
You do not currently have access to this content.