This article reports on a systematic investigation of the electronic and optical properties of films fabricated using unbalanced magnetron sputtering. X-ray diffraction confirmed that the films formed a solid solution that corresponded to a rocksalt structure. Rutherford backscattering revealed the elemental composition of the films. Ultraviolet photoelectron spectroscopy was used to investigate the valence band electronic structure while vacuum ultraviolet spectroscopic ellipsometry (VUV–SE) was used to evaluate the strength and energy of their interband electronic excitations/transitions. The optical and electronic properties of these materials were simulated using density functional theory within the generalized gradient approximation. The calculated refractive indices and density of states were in good agreement with the VUV–SE data and the valence band photoelectron spectra. In addition, the computational results were instrumental in indicating the correlation between the measured optical and electronic properties to their bond strength and elemental composition.
Skip Nav Destination
Article navigation
July 2005
Research Article|
June 21 2005
Electronic and optical properties of films: Experimental and ab initio studies Available to Purchase
S. M. Aouadi;
S. M. Aouadi
a)
Department of Physics,
Southern Illinois University
, Carbondale, Illinois 62901-4401
Search for other works by this author on:
A. Bohnhoff;
A. Bohnhoff
Department of Physics,
Southern Illinois University
, Carbondale, Illinois 62901-4401
Search for other works by this author on:
T. Amriou;
T. Amriou
Université d’Artois
, Faculté Jean Perrin, SP18 Rue Jean Souvraz, 62307 Lens Cedex, France
Search for other works by this author on:
R. T. Haasch;
R. T. Haasch
Frederick Seitz Materials Research Laboratory
, University of Illinois, Urbana, Illinois 61801
Search for other works by this author on:
M. Williams;
M. Williams
Frederick Seitz Materials Research Laboratory
, University of Illinois, Urbana, Illinois 61801
Search for other works by this author on:
J. N. Hilfiker
J. N. Hilfiker
J. A. Woollam Co., Inc.
, 645 M Street, Suite 102, Lincoln, Nebraska 68508
Search for other works by this author on:
S. M. Aouadi
a)
Department of Physics,
Southern Illinois University
, Carbondale, Illinois 62901-4401
A. Bohnhoff
Department of Physics,
Southern Illinois University
, Carbondale, Illinois 62901-4401
T. Amriou
Université d’Artois
, Faculté Jean Perrin, SP18 Rue Jean Souvraz, 62307 Lens Cedex, France
R. T. Haasch
Frederick Seitz Materials Research Laboratory
, University of Illinois, Urbana, Illinois 61801
M. Williams
Frederick Seitz Materials Research Laboratory
, University of Illinois, Urbana, Illinois 61801
J. N. Hilfiker
J. A. Woollam Co., Inc.
, 645 M Street, Suite 102, Lincoln, Nebraska 68508a)
Electronic mail: [email protected]
J. Vac. Sci. Technol. A 23, 705–712 (2005)
Article history
Received:
February 08 2005
Accepted:
May 09 2005
Citation
S. M. Aouadi, A. Bohnhoff, T. Amriou, R. T. Haasch, M. Williams, J. N. Hilfiker; Electronic and optical properties of films: Experimental and ab initio studies. J. Vac. Sci. Technol. A 1 July 2005; 23 (4): 705–712. https://doi.org/10.1116/1.1946710
Download citation file:
Pay-Per-View Access
$40.00
Sign In
You could not be signed in. Please check your credentials and make sure you have an active account and try again.
Citing articles via
What more can be done with XPS? Highly informative but underused approaches to XPS data collection and analysis
Donald R. Baer, Merve Taner Camci, et al.
Low-resistivity molybdenum obtained by atomic layer deposition
Kees van der Zouw, Bernhard Y. van der Wel, et al.
Related Content
Structural and mechanical properties of TaZrN films: Experimental and ab initio studies
J. Appl. Phys. (March 2006)
Real time spectroscopic ellipsometry study during the growth of nanocrystalline nitride protective coatings
J. Vac. Sci. Technol. B (July 2004)
Upper critical field and vortex phase diagram of polycrystalline δ-Mo1-xZrxN thin films by sol-gel
J. Appl. Phys. (January 2014)
Optical properties of tantalum nitride films fabricated using reactive unbalanced magnetron sputtering
J. Vac. Sci. Technol. A (September 2004)
Mechanical properties and oxidation behavior of ZrNx thin films fabricated through high-power impulse magnetron sputtering deposition
J. Vac. Sci. Technol. A (February 2016)