Adsorption and reactions of tetrabutoxysilane on a Si(100) surface were investigated using temperature programmed desorption and x-ray photoelectron spectroscopy. Physisorbed tetrabutoxysilane undergoes C–O bond scission to form and butyl species on Si(100) at . It is observed that further C–O bond scission takes place sequentially in the temperature range of . Main desorption products are butene and hydrogen, which are desorbed at and , respectively. We propose that the production of butene takes place through -hydride elimination of the butyl group on Si(100).
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