Highly oriented SrTiO3 thin film on Si deposited by magnetron sputtering

Wang, Y.; Chan, H. L. W.; Cheng, Y. L.; Choy, C. L.

doi:10.1116/1.1558551

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Letter| April 28 2003

Highly oriented ${SrTiO}_{3}$ thin film on Si deposited by magnetron sputtering

Y. Wang;

Y. Wang

Department of Applied Physics and Materials Research Center, The Hong Kong Polytechnic University, Hong Kong, China

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H. L. W. Chan;

H. L. W. Chan

Department of Applied Physics and Materials Research Center, The Hong Kong Polytechnic University, Hong Kong, China

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Y. L. Cheng;

Y. L. Cheng

Department of Applied Physics and Materials Research Center, The Hong Kong Polytechnic University, Hong Kong, China

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C. L. Choy

Department of Applied Physics and Materials Research Center, The Hong Kong Polytechnic University, Hong Kong, China

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J. Vac. Sci. Technol. A 21, 825–826 (2003)

https://doi.org/10.1116/1.1558551

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Highly oriented ${SrTiO}_{3}$ thin film on Si deposited by magnetron sputtering

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Highly oriented ${SrTiO}_{3}$ thin film on Si deposited by magnetron sputtering