thin films were grown on substrates using an off-axis-sputtering configuration. Using a target with 100 h of sputtering runs, only medium quality films were obtained. However, a fresh target allowed us to obtain, at the same sputtering conditions, high quality films. The different film properties obtained as a function of the target age, gas pressure, and substrate position were discussed in the framework of a previous model of the angular distribution of oxygen ions which bombard and affect the growing film.
Influence of the sputtering variables in the ion bombardment during off-axis deposition of films
M. Acosta, O. Ares, Victor Sosa, C. Acosta, J. L. Peña; Influence of the sputtering variables in the ion bombardment during off-axis deposition of films. J. Vac. Sci. Technol. A 1 September 1999; 17 (5): 2879–2884. https://doi.org/10.1116/1.581954
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