Influence of the sputtering variables in the ion bombardment during off-axis deposition of $YBa2Cu3Ox$ films

$YBa2Cu3Ox$ thin films were grown on $SrTiO3$ substrates using an off-axis-sputtering configuration. Using a target with 100 h of sputtering runs, only medium quality films were obtained. However, a fresh target allowed us to obtain, at the same sputtering conditions, high quality films. The different film properties obtained as a function of the target age, gas pressure, and substrate position were discussed in the framework of a previous model of the angular distribution of oxygen ions which bombard and affect the growing film.