Diode-laser-based atomic absorption (AA) sensors have been developed for direct measurement of atomic flux, based on both atomic density and velocity information, which is important for in situ monitoring and control of physical vapor deposition processes. Laser beam schemes based on the Doppler shift measurement have been designed for measuring the velocity component normal to the surface of a substrate. Experimental results on electron-beam evaporated barium and yttrium, which are components in YBCO superconductor, demonstrate measurements of true flux instead of simple density in the deposition processes. The flux measurement was confirmed at different pressures showing true flux measurement independent of background pressure. A model-independent flux measurement was achieved by using a cross-beam scheme. In addition, the AA sensor was also used for diagnosing and helping better understand the deposition physics such as sticking coefficient, velocity of the evaporated atoms, and the oxidation of the elements on the substrate. Discussion on practical issues of the AA sensor application is also presented.
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September 1999
Research Article|
September 01 1999
Atomic flux measurement by diode-laser-based atomic absorption spectroscopy Available to Purchase
Weizhi Wang;
Weizhi Wang
Edward L. Ginzton Laboratory, Stanford University, Stanford, California 94305
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R. H. Hammond;
R. H. Hammond
Edward L. Ginzton Laboratory, Stanford University, Stanford, California 94305
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M. M. Fejer;
M. M. Fejer
Edward L. Ginzton Laboratory, Stanford University, Stanford, California 94305
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M. R. Beasley
M. R. Beasley
Edward L. Ginzton Laboratory, Stanford University, Stanford, California 94305
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Weizhi Wang
Edward L. Ginzton Laboratory, Stanford University, Stanford, California 94305
R. H. Hammond
Edward L. Ginzton Laboratory, Stanford University, Stanford, California 94305
M. M. Fejer
Edward L. Ginzton Laboratory, Stanford University, Stanford, California 94305
M. R. Beasley
Edward L. Ginzton Laboratory, Stanford University, Stanford, California 94305
J. Vac. Sci. Technol. A 17, 2676–2684 (1999)
Article history
Received:
May 05 1999
Accepted:
June 06 1999
Citation
Weizhi Wang, R. H. Hammond, M. M. Fejer, M. R. Beasley; Atomic flux measurement by diode-laser-based atomic absorption spectroscopy. J. Vac. Sci. Technol. A 1 September 1999; 17 (5): 2676–2684. https://doi.org/10.1116/1.581929
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