The diffusion coefficient of copper in amorphous germanium is estimated to be larger than and the solubility to be at 200 °C as determined from secondary mass spectrometry. The observed solubility limit is more than eight orders of magnitude greater than that in crystalline germanium and the enthalpy of a solution of copper in amorphous germanium is estimated to be as low as eV in the range of 20–200 °C. Copper is observed to diffuse more readily in amorphous germanium than in amorphous silicon, with an activation enthalpy as low as 0.5 eV in the range of 20–200 °C. Interstitial diffusion is assumed to prevail and the trapping enthalpy of defects retarding the motion is found to be significantly lower in amorphous germanium eV) compared to that in amorphous silicon 0.8 eV).
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Research Article| July 01 1998
Copper diffusion in amorphous germanium
J. P. Doyle;
A. Yu. Kuznetsov;
J. P. Doyle, A. Yu. Kuznetsov, B. G. Svensson; Copper diffusion in amorphous germanium. J. Vac. Sci. Technol. A 1 July 1998; 16 (4): 2604–2607. https://doi.org/10.1116/1.581389
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