Plasma deposition processes involve complex phenomena which make the design and optimization of industrial equipments difficult. In the particular case of silane‐ammonia plasmas to produce silicon nitride (at very low silane percentage), two flow arrangements, i.e., (i) a longitudinal flow reactor and (ii) an axisymmetric showerhead electrode reactor were studied by two‐dimensional modeling of momentum and mass transport. First, a kinetic scheme which enables us to reproduce experimental results for both reactor configurations was selected enlightening an unusual behavior of Si(NH2)3 radicals. Then, the way silane is consumed and its consequences on active species production was outlined as playing the leading parts in the processes. As silane concentration decreases along the flow direction, the modeling of the longitudinal flow reactor shows a steep decrease of the deposition rate and a significant composition variation of the deposit. In the axisymmetric reactor, the film thickness and composition uniformities considerably improve due to the distributed gas feed.

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