Methane (CH4) adsorption and isothermal hydrogen (H2) desorption kinetics on a C(001)–(1×1) surface have been investigated by observing the surface hydrogen coverage θH which is estimated from the electron‐stimulated desorption yield of H+ ions. The time evolution of θH under CH4 exposure, in pressure and temperature ranges of 1×10−8–5×10−7 Torr and 600–800 °C, reveals that the CH4 adsorption is a first‐order reaction. The isothermal H2 desorption is conducted in a temperature range of 1095–1270 °C. The time evolution of θH shows that the isothermal H2 desorption is also a first‐order reaction. From Arrhenius plots of the reaction coefficients, the activation energies of CH4 adsorption and H2 desorption are evaluated to be 7.3±1.7 and 21±4.9 kcal/mol, respectively. Atomistic kinetics model for CH4 adsorption and H2 desorption are discussed, especially in connection with a recent finding of gas source molecular beam epitaxy of diamond (001) with pure CH4 without any hydrogen or oxygen radicals.
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November 1995
Research Article|
November 01 1995
Methane adsorption and hydrogen isothermal desorption kinetics on a C(001)–(1×1) surface
Toshihiko Nishimori;
Toshihiko Nishimori
Advanced Technology Research Center, Mitsubishi Heavy Industries, Ltd., Kanazawa‐Ku, Yokohama 236, Japan
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Hitoshi Sakamoto;
Hitoshi Sakamoto
Advanced Technology Research Center, Mitsubishi Heavy Industries, Ltd., Kanazawa‐Ku, Yokohama 236, Japan
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Yuji Takakuwa;
Yuji Takakuwa
Research Institute for Scientific Measurements, Tohoku University, Katahira, Aoba‐ku, Sendai 980‐77, Japan
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Shozo Kono
Shozo Kono
Research Institute for Scientific Measurements, Tohoku University, Katahira, Aoba‐ku, Sendai 980‐77, Japan
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J. Vac. Sci. Technol. A 13, 2781–2786 (1995)
Article history
Received:
February 21 1995
Accepted:
August 05 1995
Citation
Toshihiko Nishimori, Hitoshi Sakamoto, Yuji Takakuwa, Shozo Kono; Methane adsorption and hydrogen isothermal desorption kinetics on a C(001)–(1×1) surface. J. Vac. Sci. Technol. A 1 November 1995; 13 (6): 2781–2786. https://doi.org/10.1116/1.579704
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