Ultrathin stoichiometric PbTiO3 films, 10–100 nm thick, were deposited on (001) SrTiO3 substrate at 600 °C by rf planar magnetron sputtering to understand the microstructure of initial film growth. The electron microscopy and x‐ray diffraction analysis suggested epitaxial growth of (001) PbTiO3/(001) SrTiO3 with three‐dimensional crystal orientation; however, the PbTiO3 films still included crystal boundaries. Miscut (001) SrTiO3 substrates reduced the crystal boundaries and provided continuous ultrathin films of single crystal PbTiO3. Rapid thermal annealing at 600 °C for 10 s further improved their crystallinity.
Microstructures of sputtered PbTiO3 thin films
Toshifumi Satoh, Kiyotaka Wasa, Kenji Tabata, Hideaki Adachi, Yo Ichikawa, Kentaro Setsune; Microstructures of sputtered PbTiO3 thin films. J. Vac. Sci. Technol. A 1 May 1995; 13 (3): 1022–1026. https://doi.org/10.1116/1.579577
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