Ultrathin stoichiometric PbTiO3 films, 10–100 nm thick, were deposited on (001) SrTiO3 substrate at 600 °C by rf planar magnetron sputtering to understand the microstructure of initial film growth. The electron microscopy and x‐ray diffraction analysis suggested epitaxial growth of (001) PbTiO3/(001) SrTiO3 with three‐dimensional crystal orientation; however, the PbTiO3 films still included crystal boundaries. Miscut (001) SrTiO3 substrates reduced the crystal boundaries and provided continuous ultrathin films of single crystal PbTiO3. Rapid thermal annealing at 600 °C for 10 s further improved their crystallinity.

This content is only available via PDF.
You do not currently have access to this content.