Mass‐selected distributions of bombardment energies of O+ ions at the powered electrode of a reactive ion etcher are investigated under angles between ±10° with respect to the electrode normal. The energy distributions consist of split high‐energy peaks and continuous intensities between 50 eV and the maximal energy defined by the potential drop across the sheath. Ions found in the bimodal split high‐energy peaks show angular distributions with widths between 2° and 6° [full width at half‐maximum (FWHM)]. The continuous part of the ion energy distributions exhibit angular widths between 7° and 11° (FWHM). The observed phenomena in the ion energy and ion angular distributions are interpreted as combined effects of elastic scattering and dissociative collisions in the sheath.
Skip Nav Destination
Article navigation
September 1992
Research Article|
September 01 1992
Energy‐resolved angular distributions of O+ ions at the radio‐frequency‐powered electrode in reactive ion etching
Joachim Janes;
Joachim Janes
Fraunhofer Institut für Mikrostrukturtechnik, Dillenburgerstrasse 53 1000 Berlin 33, Germany
Search for other works by this author on:
Christoph Huth
Christoph Huth
Fraunhofer Institut für Mikrostrukturtechnik, Dillenburgerstrasse 53 1000 Berlin 33, Germany
Search for other works by this author on:
J. Vac. Sci. Technol. A 10, 3086–3091 (1992)
Article history
Received:
February 19 1992
Accepted:
June 13 1992
Citation
Joachim Janes, Christoph Huth; Energy‐resolved angular distributions of O+ ions at the radio‐frequency‐powered electrode in reactive ion etching. J. Vac. Sci. Technol. A 1 September 1992; 10 (5): 3086–3091. https://doi.org/10.1116/1.577869
Download citation file:
Sign in
Don't already have an account? Register
Sign In
You could not be signed in. Please check your credentials and make sure you have an active account and try again.
Sign in via your Institution
Sign in via your InstitutionPay-Per-View Access
$40.00
Citing articles via
Related Content
Measurement of ion impact energy and ion flux at the rf electrode of a parallel plate reactive ion etcher
Journal of Applied Physics (February 1991)
Mass‐selected ion angular impact energy distributions at the powered electrode in CF4 reactive‐ion etching
Journal of Applied Physics (July 1993)
Bombardment energies of O2+ in low pressure reactive ion etching
Appl. Phys. Lett. (July 1992)
Energy resolved angular distribution of argon ions at the substrate plane of a radio frequency plasma reactor
Journal of Vacuum Science & Technology A (November 1992)
Development of neutral‐beam‐assisted etcher
Journal of Vacuum Science & Technology A (May 1995)